公开(公告)号：KR1020070034802A

公开(公告)日：2007-03-29

申请号：KR1020050089365

申请日：2005-09-26

Applicant: 삼성전자주식회사

Inventor： 이명수 ,  전찬욱

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  B82Y10/00 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/7085 ,  G21K2201/061 ,  G21K2201/067 ,  H01L21/6831 ,  H02N13/00

Abstract: Disclosed is an electrostatic chuck with a temperature sensing unit, exposure equipment having the electrostatic chuck, and a method of detecting temperature on photomask surfaces. The temperature sensing unit and method of detecting temperature may include obtaining reflectance of a photomask using a multi-wavelength interferometer and determining a temperature on the photomask based on the reflectance.

Abstract translation: 公开了一种具有温度感测单元的静电吸盘，具有该静电吸盘的曝光设备以及检测光掩模表面上的温度的方法。 温度感测单元和检测温度的方法可以包括：使用多波长干涉仪获得光掩模的反射率，并基于反射率确定光掩模上的温度。

公开(公告)号：KR1020010066880A

公开(公告)日：2001-07-11

申请号：KR1020000035869

申请日：2000-06-28

Applicant: 에이에스엠엘 네델란즈 비.브이.

Inventor： 싱맨디프

IPC: G02B5/08

CPC classification number: B82Y10/00 ,  G02B5/0891 ,  G03F1/24 ,  G03F7/70058 ,  G03F7/70233 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/06 ,  G21K1/062 ,  G21K2201/061 ,  Y10S359/90 ,  Y10T428/24355

Abstract: PURPOSE: A multilayer mirror for extreme ultraviolet rays having an improved reflectance is provided to protect the mirror from pollution of environment and to allow a protection capping layer to enhance characteristic of reflection rate. CONSTITUTION: The multilayer mirror for extreme ultraviolet rays having an improved reflectance has a reflection material for radiation reflection in a desired wavelength range such as a laminated body comprising a first material and a second material alternately laminated. The first material has a real refractive index smaller than the second material in the desired wavelength range. In the mirror, at least one layer of a third material is sandwiched in the laminated body, while tire third material is selected from a group including Rb, RbCl, RbBr, Sr, Y, Zr, Ru, Rh, Tc, Pd, Nb and Be, and alloys and compounds of the materials. Preferably, one layer of the third material is sandwiched between each the pair of the layers of the first and second material, while at least one layer of a forth material is sandwiched in the laminated body. The forth material is selected from the group including Rb, RbCl, RbBr, Sr, Y, Zr, Ru, Rh, Tc, Pd, Nb and Be, and alloys and compounds of the materials.

Abstract translation: 目的：提供具有改善的反射率的用于极紫外线的多层反射镜，以保护镜子免受环境污染，并允许保护盖层增强反射率的特性。 构成：具有改善的反射率的用于极紫外线的多层反射镜具有用于期望波长范围内的放射线反射的反射材料，例如包括交替层叠的第一材料和第二材料的层压体。 第一材料具有比期望波长范围内的第二材料小的实际折射率。 在反射镜中，至少一层第三材料夹在层压体中，而轮胎第三材料选自包括Rb，RbCl，RbBr，Sr，Y，Zr，Ru，Rh，Tc，Pd，Nb 和Be，以及材料的合金和化合物。 优选地，一层第三材料夹在第一和第二材料的每一层之间，而至少一层第四材料层压在层压体中。 第四种材料选自Rb，RbCl，RbBr，Sr，Y，Zr，Ru，Rh，Tc，Pd，Nb和Be，以及材料的合金和化合物。

公开(公告)号：WO2012171674A1

公开(公告)日：2012-12-20

申请号：PCT/EP2012/055326

申请日：2012-03-26

Applicant: ASML NETHERLANDS B.V. ,  YAKUNIN, Andrei ,  SJMAENOK, Leonid ,  SALASHCHENKO, Nikolay ,  GLUSHKOV, Denis ,  POLKOVNIKOV, Vladimir, Nikolaevich

Inventor： YAKUNIN, Andrei ,  SJMAENOK, Leonid ,  SALASHCHENKO, Nikolay ,  GLUSHKOV, Denis ,  POLKOVNIKOV, Vladimir, Nikolaevich

IPC: G21K1/06 ,  G03F7/20 ,  G02B5/08

CPC classification number: G03F7/702 ,  B82Y10/00 ,  G02B5/0816 ,  G02B5/0875 ,  G02B5/0891 ,  G03F7/70866 ,  G03F7/70883 ,  G21K1/062 ,  G21K2201/061

Abstract: A multilayer mirror (1) for use in device lithography. The multilayer mirror configured to reflect and/or pattern radiation having a wavelength in the range of about 6.4nm to about 7.2nm. The multilayer mirror has a plurality of alternating layers (4, 6) of materials. The plurality of alternating layers of materials include first layers of materials and second layers of materials. The second layers have a higher refractive index for the radiation than the first layers. The materials of the first layers and the materials of the second layers are mutually chemically unreactive at an interface (7) therebetween at temperatures less than 300 °C. This may allow the mirrors to have a narrow boundary region of intermingled materials from alternating layers between the layers, for example of 0.5 nm or less in width, which may improve sharpness of the boundary region and improve reflectivity.

Abstract translation: 一种用于器件光刻的多层反射镜（1）。 多层反射镜被配置为反射和/或图案化波长在约6.4nm至约7.2nm范围内的辐射。 多层反射镜具有多个材料的交替层（4,6）。 多个交替的材料层包括第一层材料和第二层材料。 第二层对于辐射具有比第一层更高的折射率。 在低于300℃的温度下，第一层的材料和第二层的材料在其间的界面（7）处相互化学反应。 这可以允许反射镜具有来自层之间的交替层的混合材料的窄边界区域，例如宽度为0.5nm或更小，这可以提高边界区域的清晰度并提高反射率。

公开(公告)号：WO2012101884A1

公开(公告)日：2012-08-02

申请号：PCT/JP2011/074335

申请日：2011-10-21

Applicant: 浜松ホトニクス株式会社 ,  須山 敏康 ,  杉山 元胤

Inventor： 須山　敏康 ,  杉山　元胤

IPC: G21K4/00 ,  G01T1/20

CPC classification number: G21K4/00 ,  B82Y10/00 ,  G01N23/04 ,  G01T1/2008 ,  G01T3/06 ,  G21K2201/061

Abstract: 　このシンチレータプレート１は、対象物Ａを透過した放射線の入射に応じてシンチレーション光を放射させる平板状の部材であり、シンチレーション光を集光して撮像する画像取得装置に用いられるシンチレータプレートにおいて、放射線を透過する平面状の仕切板２と、仕切板２の一方の面２ａ上に配置され、放射線をシンチレーション光に変換する平板状のシンチレータ３と、仕切板２の他方の面２ｂ上に配置され、放射線をシンチレーション光に変換する平板状のシンチレータ４とを備える。

Abstract translation: 该闪烁体板（1）作为响应于通过物体（A）透射的辐射的入射而发射闪烁体光的平板状构件被用于通过收集闪烁光捕获图像的图像采集装置。 所述闪烁体板（1）设置有透射辐射的平面隔板（2），位于隔板（2）的一个表面（2a）上的平板状闪烁体（3）将辐射转换成闪烁光，以及 位于分隔板（2）的另一个表面（2b）上的平板状闪烁体（4）将辐射转换成闪烁光。

公开(公告)号：WO2012041697A1

公开(公告)日：2012-04-05

申请号：PCT/EP2011/065873

申请日：2011-09-13

Applicant: CARL ZEISS SMT GMBH ,  FREIMANN, Rolf ,  BAER, Norman ,  LIMBACH, Guido ,  BOEHM, Thure ,  WITTICH, Gero

Inventor： FREIMANN, Rolf ,  BAER, Norman ,  LIMBACH, Guido ,  BOEHM, Thure ,  WITTICH, Gero

IPC: G21K1/06

CPC classification number: G02B5/0891 ,  B82Y10/00 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061

Abstract: The invention relates to a mirror (la; la'; lb; lb'; lc; lc') comprising a substrate (S) and a layer arrangement, wherein the layer arrangement is designed in such a way that light (32) having a wavelength of less than 250 nm that is incident on the mirror (la; la'; lb; lb'; lc; lc') at at least an angle of incidence of between 0° and 30° is reflected with more than 20% of its intensity, and the layer arrangement comprises at least one surface layer system (Ρ"') consisting of a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) comprise two individual layers composed of different materials for a high refractive index layer (Η"') and a low refractive index layer (L'"), wherein the layer arrangement comprises at least one layer (G, SPL, B) composed of graphene. Furthermore, the invention relates to the use of graphene (G, SPL, B) on optical elements for reducing the surface roughness to less than 0.1 nm rms HSFR and/or for protecting the optical element in the EUV wavelength range against a radiation-induced irreversible change in volume of more than 1% and/or as a barrier layer for preventing interdiffusion between layers of so-called multilayer layer mirrors in the EUV wavelength range.

Abstract translation: 本发明涉及一种包括衬底（S）和层布置的反射镜（1a; 1a'; 1b; 1b; 1c; 1c），其中所述层布置被设计成使得具有 入射在反射镜（1a; 1a'; lb; lb'; lc; lc'）上的小于250nm的波长在0°至30°之间的入射角至少有20％以上 其强度和层布置包括由各层的至少两个周期（P3）的周期性序列组成的至少一个表层系统（“），其中周期（P3）包括由不同材料组成的两个单独层 对于高折射率层（α“'）和低折射率层（L'”），其中层布置包括由石墨烯组成的至少一层（G，SPL，B），此外，本发明涉及 在光学元件上使用石墨烯（G，SPL，B）将表面粗糙度降低到小于0.1nm rms HSFR和/或用于保护光学元件 EUV波长范围内的α元素相对于辐射诱发的不可逆体积变化大于1％和/或作为阻挡层用于防止EUV波长范围内所谓的多层反射镜层之间的相互扩散。

公开(公告)号：WO2012023853A1

公开(公告)日：2012-02-23

申请号：PCT/NL2011/050565

申请日：2011-08-16

Applicant: UNIVERSITEIT TWENTE ,  VAN GOOR, Frederik Albert ,  BIJKERK, Frederik ,  VAN DEN BOOGAARD, Antonius Johannes Ronald ,  VAN DER MEER, Robert

Inventor： VAN GOOR, Frederik Albert ,  BIJKERK, Frederik ,  VAN DEN BOOGAARD, Antonius Johannes Ronald ,  VAN DER MEER, Robert

IPC: G02B5/18 ,  G02B5/20 ,  G02B27/10 ,  G03F7/20 ,  H05G2/00

CPC classification number: G02B5/1876 ,  B82Y10/00 ,  G02B5/188 ,  G02B5/189 ,  G02B5/208 ,  G02B27/1006 ,  G02B27/141 ,  G02B27/142 ,  G03F7/70033 ,  G03F7/7015 ,  G03F7/70191 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/10 ,  G21K2201/061 ,  G21K2201/067

Abstract: Spectral filter for splitting the primary radiation from a generated beam with primary electromagnetic radiation having a wavelength in the extreme ultraviolet (EUV radiation) or soft X-ray (soft X) wavelength range and parasitic radiation having a wavelength in the infrared wavelength range (IR radiation) in an optical device, comprising a surface for reflecting electromagnetic radiation with a wavelength in the extreme ultraviolet wavelength range {EUV radiation), the surface being formed by an EUV radiation-reflecting multilayer structure, which multilayer structure has a pattern of at least one system of concentric grooves mutually separated by concentric rings, wherein the width and depth of the grooves and the width of the rings are selected such that the concentric grooves and rings form Fresnel zones for reflecting radiation with a wavelength in the infrared wavelength range (IR radiation) incident on these grooves and rings, and method for the manufacture thereof.

Abstract translation: 用于将来自所产生的光束的主要辐射与具有在极紫外（EUV辐射）或软X射线（软X）波长范围内的波长和具有红外波长范围（IR）的波长的寄生辐射的主要电磁辐射分离的光谱滤波器 辐射）在光学装置中，包括用于反射具有在极紫外波长范围（EUV辐射）的波长的电磁辐射的表面，该表面由EUV辐射反射多层结构形成，该多层结构至少具有图案 一个由同心环相互分离的同心凹槽的系统，其中槽的宽度和深度以及环的宽度被选择为使得同心凹槽和环形成菲涅尔区，用于反射红外波长范围内的波长（IR 辐射）及其制造方法。

公开(公告)号：WO2011149146A1

公开(公告)日：2011-12-01

申请号：PCT/KR2010/005024

申请日：2010-07-30

Applicant: 주식회사 나노포커스레이 ,  김경우 ,  김재희 ,  권영만 ,  유철우

Inventor： 김경우 ,  김재희 ,  권영만 ,  유철우

IPC: A61B6/00 ,  A61B6/08 ,  H05G1/02

CPC classification number: G21K1/062 ,  A61B6/08 ,  B82Y10/00 ,  G21K2201/061

Abstract: 본 발명은 모노크로매틱 엑스선 발생기용 다층박막거울 정렬장치 및 이를 이용한 엑스선 영상획득방법에 관한 것으로서, 정렬장치는 엑스선발생부(4)와 디텍터부(6) 사이에 배치되되, 다층박막거울(5)에 최적의 입사각을 부여하기 위해 이들을 정렬시키며 엑스선의 조사방향을 제한하는 콜리메이터부(8)를 포함하고, 또한 다층박막거울(5)이 직립 배치되도록 하는 베이스지그(10)와; 베이스지그(10)에 직립되어 있는 다층박막거울(5)의 일면을 탄성 지지하기 위한 탄성지지부(20); 및 탄성지지부(20)에 의해 일면이 탄성 지지되어 있는 다층박막거울(5)의 배면을 밀어 엑스선의 입사각을 조절할 수 있도록 하는 입사각조절부(30)를 포함하여 구성된다. 따라서, 기본적으로 사용자가 자유자재로 원하는 특정 에너지 대역의 에너지만을 선별적으로 결정할 수 있게 되어 이에 따라 측정하고자 하는 물질에 상응하는 최적의 모노크로매틱의 엑스선 영상을 얻을 수 있다.

Abstract translation: 本发明涉及一种用于单色X射线管的多层膜反射镜对准装置，以及用于获取使用其的X射线图像的方法。 对准装置包括：用于以直立方式布置多层膜反射镜（5）的基底夹具（10），所述基座夹具包括放置在X射线产生单元（4）和检测器（6）之间的准直器（8） 以使X射线发生器和检测器对准，并限制X射线的辐射方向，以向每个多层膜反射镜（5）提供最佳入射角; 弹性支撑件，用于弹性支撑直立在所述基座夹具上的所述多层膜反射镜的一侧; 以及用于通过推动多层膜反射镜（5）的后侧分别由弹性支撑件（20）在一侧弹性支撑来调节X射线入射角的入射角调整单元（30）。 因此，原则上，用户可以自由选择性地选择特定期望能带的能量，并且获得与待测材料对应的最佳单色X射线图像。

公开(公告)号：WO2011054814A1

公开(公告)日：2011-05-12

申请号：PCT/EP2010/066625

申请日：2010-11-02

Applicant: INSTITUT DE CIENCIES FOTONIQUES, FUNDACIO PRIVADA ,  INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS ,  PRUNERI, Valerio ,  GHOSH, Dhriti, Sundar ,  CHEN, Tong, Lai

Inventor： PRUNERI, Valerio ,  GHOSH, Dhriti, Sundar ,  CHEN, Tong, Lai

IPC: H01L31/0224 ,  H01L31/18 ,  G02F1/1343 ,  H01G9/20 ,  H05B33/28 ,  H01L51/52 ,  H01L51/44 ,  H01L33/42

CPC classification number: H01L31/022466 ,  B82Y10/00 ,  G02F1/13439 ,  G21K2201/061 ,  H01G9/2031 ,  H01J2211/225 ,  H01L31/1884 ,  H01L33/405 ,  H01L33/42 ,  H01L51/441 ,  H01L51/442 ,  H01L51/5215 ,  H01L51/5234 ,  H05B33/28 ,  Y02E10/50

Abstract: The invention relates to an electrode comprising a substrate (1) and a layered structure comprising an electrically conductive film (2) in contact with at least one ultra thin metal film (3), wherein the two films (2,3) are of different materials and - said electrically conductive film (2) is selected from Cu, Au, Ag, Al - said ultra thin metal film (3) is selected from Ni, Cr, Ti, Pt, Ag, Au, Al and their mixtures. The electrode is particularly useful for optoelectronic devices and shows good conductivity, transparency and stability.

Abstract translation: 本发明涉及一种包括基板（1）和包括与至少一个超薄金属膜（3）接触的导电膜（2）的层状结构的电极，其中两个膜（2,3）是不同的 材料和 - 所述导电膜（2）选自Cu，Au，Ag，Al-所述超薄金属膜（3）选自Ni，Cr，Ti，Pt，Ag，Au，Al及其混合物。 该电极对于光电器件特别有用，并且显示出良好的导电性，透明性和稳定性。

公开(公告)号：WO2010004482A1

公开(公告)日：2010-01-14

申请号：PCT/IB2009/052855

申请日：2009-07-01

Applicant: PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH ,  KONINKLIJKE PHILIPS ELECTRONICS N. V. ,  METZMACHER, Christof

Inventor： METZMACHER, Christof

IPC: G21K1/06

CPC classification number: G02B5/283 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/067

Abstract: The invention relates to an improved EUV reflecting element comprising a) a first layer essentially made out of a highly reflective material b) a second layer having a thickness of ≤5 nm and essentially made out of a material with a sputter resistance of ≤10nm per 10 8 shots and whereby the second layer is provided in the path of the incident and/or reflected EUV light.

Abstract translation: 本发明涉及一种改进的EUV反射元件，其包括：a）基本由高反射材料制成的第一层; b）第二层，其厚度= 5nm，基本上由溅射电阻= 10nm的材料制成 108次射击，由此第二层设置在入射和/或反射的EUV光的路径中。

公开(公告)号：WO2009095220A3

公开(公告)日：2009-11-26

申请号：PCT/EP2009000539

申请日：2009-01-28

Applicant: MEDIA LARIO SRL ,  WALLHEAD IAN ,  ZOCCHI FABIO

Inventor： WALLHEAD IAN ,  ZOCCHI FABIO

IPC: G03F7/20 ,  G21K1/06 ,  H05G2/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003

Abstract: A collector optical system for extreme ultraviolet (EUV) or X-ray applications, including lithography and imaging, for example at 13 5 nm, comprising a grazing incidence collector in combination with a laser produced plasma (LPP) source In one embodiment, one or more further optical elements act upon one or more laser beams used to generate the EUV or X-ray plasma source, whereby said laser beam(s) ?mpact(s) on the fuel target from a side thereof on which an intermediate focus is disposed Also disclosed is a collector for EUV and X-ray applications, in which radiation from a laser produced plasma source is reflected by the collector to an intermediate focus, the line joining the source and intermediate focus defining an optical axis, a first direction on the optical axis being defined from the source to the intermediate focus, characterised by the collector comprising one or more grazing incidence mirrors, and by the collector comprising one or more further optical elements for redirecting a received laser beam so as to be incident upon the source (a) in a second direction, opposite to said first direction, or (b) at an acute angle to said second direction The further optical elements may comprise plane or spherical mirrors and/or lenses, for example disposed on the optical axis Also disclosed is a collector for application at about 13 5 nm with Laser Produced Plasma sources, the collector comprising between 5 and 16 concentrically aligned mirrors, and preferably between 6 and 12 mirrors, that operate at grazing incidence such that the maximum grazing angle between the incident radiation and the reflective surface of the mirrors is about 30°, and more preferably about 25°, in order to allow a maximum collection angle from the source of about 40° to about 85°, and preferably about 45° to about 75° Also disclosed is an EUV lithography system comprising a radiation source, for example a LPP source, the collector, an optical condenser, and a reflective mask

Abstract translation: 用于极紫外（EUV）或X射线应用（包括光刻和成像，例如13 5nm）的集光器光学系统，包括与激光产生等离子体（LPP）源组合的掠入射收集器。在一个实施例中， 更多的光学元件作用于用于生成EUV或X射线等离子体源的一个或多个激光束，由此所述激光束从其上布置有中间焦点的一侧在燃料目标上形成一个或多个（一个或多个） 还公开了用于EUV和X射线应用的收集器，其中来自激光产生的等离子体源的辐射被收集器反射到中间焦点，连接源和中间焦点的线限定光轴，第一方向在 所述光轴由所述源限定到所述中间焦点，其特征在于，所述收集器包括一个或多个掠入射镜，并且所述收集器包括一个或多个用于重定向的其他光学元件 （a）在与所述第一方向相反的第二方向上入射在所述源（a）上，或者（b）与所述第二方向成锐角。所述另外的光学元件可以包括平面或球面镜，以及 /或透镜，例如设置在光轴上。还公开了一种用激光产生的等离子体源在约13.5nm处施加的集光器，该集光器包括5至16个同心对准的反射镜，并且优选地在6至12个反射镜之间， 在掠入射条件下，使得入射辐射与反射镜的反射表面之间的最大掠射角为约30°，并且更优选为约25°，以便允许从约40°至约85°的源的最大收集角 °，优选约45°至约75°。还公开了一种EUV光刻系统，其包括辐射源，例如LPP源，收集器，光学聚光器和反射掩模