Abstract:
The invention relates to gas-discharge high-vacuum devices. Said invention makes it possible to increase the efficiency of electron beam extraction and the gas and energy efficiency. The inventive plasma electron-emitting source comprises internal and external polepieces embodied in the form of a body of rotation provided with central holes, a source of magnetomotive force arranged between said polepieces, an arc apertured hollow cathode and a gas supply unit which are arranged in a hermetically sealed body. Said source also comprises intermediate and main anodes embodied in the form of a body of rotation provided with central holes and arranged between coaxial output holes of the cathode and the body. The intermediate anode, the internal polepiece, a ring collector, the main anode and the external polepiece are arranged in series between the output holes of the cathode and the body. The main anode is made of low-magnetic material and is disposed in such a way that not less than 30 % of the magnetic flow formed in space between the polepieces passes through the hole thereof. The internal and external polepieces are electrically connected to the cathode.
Abstract:
A large-area electron source (22) which can operate continuously, stably, and indefinitely in a poor vacuum (20) environment. The source includes a glow discharge cathode, appropriately positioned with respect to a target anode (30) and a fine-mesh grid (26) spaced from the cathode (22) by a distance less than the mean free path length of electrons leaving the cathode (22), the grid (26) being electrically biased to control the electron beam current over a wide range with only small grid voltage changes. An accelerating voltage (29) applied to the cathode (22) can be varied continuously from as low as a few hundred volts to 30 KeV or greater and the source will continue to operate satisfactorily. Further, the grid (26) is made of a fine mesh wire of sufficiently small dimensions as to not be resolvable in the target plane (30). A further refinement of the device utilizes scanning coils (34) to achieve additional uniformity of the incident beam at the target plane (30). The basic apparatus of the invention can be combined with other features, for use in shadow mask lithography, resist sensitivity measurement, lift off processing, and resist curing.
Abstract:
A linear plasma electron source (100) is provided. The linear plasma electron source includes a housing (112) acting as a first electrode, the housing having side walls (312), a slit opening (114) in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode (110) being arranged within the housing and having a first side (413) facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply (70) for providing a gas into the housing.
Abstract:
A linear plasma electron source (100) is provided. The linear plasma electron source includes a housing (112) acting as a first electrode, the housing having side walls (312), a slit opening (114) in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode (110) being arranged within the housing and having a first side (413) facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply (70) for providing a gas into the housing.
Abstract:
Field emission nanostructures (18) assist operation of a microdischarge device. The field emission nanostructures are integrated into the microdischarge device(s) or are situated near an electrode (14, 16, 36, 38) of the microdischarge device(s). The field emission nanostructures reduce operating and ignition voltages compared to otherwise identical device lacking the field emission nanostructures, while also increasing the radiative output of the microdischarge device(s).
Abstract:
Die Erfindung betrifft eine Quelle zur Erzeugung von gepulsten Ionen- und Elektronenstrahlen. Mit ihr wird ein in seinem Strahlquerschnitt großflächiger Strom geladener Teilchen erzeugt. Die Vakuum-Bogenplasmaquelle wird durch eine den Gesamtstrom bestimmende Last, die aus der Parallelschaltung eines ohmschen Widerstands mit einem Kondensator besteht, zur sichern Zündung geführt. Diese Last ist an den Innenwiderstand des Pulsspannungsgenerators leistungsangepaßt. Die Dimensionierung der elektrischen Bauteile an den Elektroden unter Berücksichtigung vorgegebener Schranken ermöglicht einen in seinem Strahlquerschnitt homogenen Strom geladener Teilchen, der aus ein und demselben Ladungsteilchen bei gleichen Zündelektroden oder aus einem strukturierten Strom unterschiedlicher Teilchensorten bei unterschiedlichem Zündelektrodenmaterial besteht.
Abstract:
In the preferred application for preionizing TE lasers, in particular excimer lasers, the plasma X-ray tube (ER), which can also be referred to as single-chamber ion tube, has an elongated, box-shaped housing (G) including in its inside an also elongated cylindrical cathode (K) of generally U-shaped cross-section, the open end of which faces the X-ray target in the form of a gastight film. An elongated wire-shaped initiating electrode (11) is arranged between X-ray target (1) and cylindrical cathode (K). An electrical field is generated around the initiating electrode (11) by applying thereto a positive voltage or voltage pulse. The field thus generated forces the electrons which are present because of the ambient radiation to form long spiral paths, thus ionising gas atoms. Electron avalanches develop and initiate the wire discharge. Ions (i+) are extracted from the low-pressure plasma (3) by applying to the cylindrical cathode (K) a beam potential of typically between 60 kV and a maximum of 120 kV, and accelerated against the cylindrical cathode (K). On impact of the ions from the cylindrical cathode (K), secondary electrons are emitted and accelerated in the opposite direction, thus forming the electron beam (E), which on striking the X-ray target (1) creates the X-ray bremsstrahlung (X). Said plasma X-ray tube is also basically suitable as an electron gun: for this application, the film used as an electron window covering the window opening in the target holding wall need only be designed so as to be accordingly radiolucent to electron beams.