PLASMA ELECTRON-EMITTING SOURCE
    81.
    发明申请
    PLASMA ELECTRON-EMITTING SOURCE 审中-公开
    等离子体电子发射源

    公开(公告)号:WO2003081965A1

    公开(公告)日:2003-10-02

    申请号:PCT/RU2003/000084

    申请日:2003-03-07

    CPC classification number: H01J3/025

    Abstract: The invention relates to gas-discharge high-vacuum devices. Said invention makes it possible to increase the efficiency of electron beam extraction and the gas and energy efficiency. The inventive plasma electron-emitting source comprises internal and external polepieces embodied in the form of a body of rotation provided with central holes, a source of magnetomotive force arranged between said polepieces, an arc apertured hollow cathode and a gas supply unit which are arranged in a hermetically sealed body. Said source also comprises intermediate and main anodes embodied in the form of a body of rotation provided with central holes and arranged between coaxial output holes of the cathode and the body. The intermediate anode, the internal polepiece, a ring collector, the main anode and the external polepiece are arranged in series between the output holes of the cathode and the body. The main anode is made of low-magnetic material and is disposed in such a way that not less than 30 % of the magnetic flow formed in space between the polepieces passes through the hole thereof. The internal and external polepieces are electrically connected to the cathode.

    Abstract translation: 本发明涉及气体放电高真空装置。 本发明使得提高电子束提取的效率和气体和能量效率成为可能。 本发明的等离子体电子发射源包括以设置有中心孔的旋转体的形式体现的内部和外部极点,设置在所述极柱之间的磁动势源,弧形空心阴极和气体供应单元,其布置在 一个气密的身体。 所述源还包括以设置有中心孔并且布置在阴极和主体的同轴输出孔之间的旋转体的形式体现的中间和主阳极。 中间阳极,内部极靴,环形收集器,主阳极和外部电杆串联布置在阴极和主体的输出孔之间。 主阳极由低磁性材料制成,并且以这样的方式设置,使得在极片之间的空间中形成的磁流的不少于30%通过其孔。 内部和外部极杆电连接到阴极。

    LARGE-AREA UNIFORM ELECTRON SOURCE
    82.
    发明申请
    LARGE-AREA UNIFORM ELECTRON SOURCE 审中-公开
    大面积均匀电子源

    公开(公告)号:WO1990005990A1

    公开(公告)日:1990-05-31

    申请号:PCT/US1989005252

    申请日:1989-11-14

    CPC classification number: H01J37/077 H01J3/025

    Abstract: A large-area electron source (22) which can operate continuously, stably, and indefinitely in a poor vacuum (20) environment. The source includes a glow discharge cathode, appropriately positioned with respect to a target anode (30) and a fine-mesh grid (26) spaced from the cathode (22) by a distance less than the mean free path length of electrons leaving the cathode (22), the grid (26) being electrically biased to control the electron beam current over a wide range with only small grid voltage changes. An accelerating voltage (29) applied to the cathode (22) can be varied continuously from as low as a few hundred volts to 30 KeV or greater and the source will continue to operate satisfactorily. Further, the grid (26) is made of a fine mesh wire of sufficiently small dimensions as to not be resolvable in the target plane (30). A further refinement of the device utilizes scanning coils (34) to achieve additional uniformity of the incident beam at the target plane (30). The basic apparatus of the invention can be combined with other features, for use in shadow mask lithography, resist sensitivity measurement, lift off processing, and resist curing.

    Linear electron source, evaporator using linear electron source, and applications of electron sources
    84.
    发明公开
    Linear electron source, evaporator using linear electron source, and applications of electron sources 审中-公开
    Lineare Elektronenquelle sowie Elektronenstrahlverdampfer mit linearer Elektronenquelle und deren Anwendungen

    公开(公告)号:EP2073243A1

    公开(公告)日:2009-06-24

    申请号:EP07024958.6

    申请日:2007-12-21

    CPC classification number: H01J37/077 H01J3/025 H01J37/3053

    Abstract: A linear plasma electron source (100) is provided. The linear plasma electron source includes a housing (112) acting as a first electrode, the housing having side walls (312), a slit opening (114) in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode (110) being arranged within the housing and having a first side (413) facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply (70) for providing a gas into the housing.

    Abstract translation: 提供线性等离子体电子源(100)。 线性等离子体电子源包括用作第一电极的壳体(112),壳体具有侧壁(312),壳体中用于侵入电子束的狭缝开口(114),缝隙开口限定长度方向 所述源极,第二电极(110)布置在所述壳体内并且具有面向所述狭缝开口的第一侧面(413),所述第一侧面与所述狭缝开口间隔开第一距离,其中所述电子源的长度在 长度方向为第一距离的至少5倍,以及用于将气体提供到壳体中的至少一个气体供应源(70)。

    Quelle zur Erzeugung von grossflächigen, gepulsten Ionen- und Elektronenstrahlen
    87.
    发明公开
    Quelle zur Erzeugung von grossflächigen, gepulsten Ionen- und Elektronenstrahlen 失效
    Quelle zur Erzeugung vongrossflächigen,gepulsten Ionen- und Elektronenstrahlen

    公开(公告)号:EP0810628A2

    公开(公告)日:1997-12-03

    申请号:EP97105519.9

    申请日:1997-04-03

    CPC classification number: H01J37/08 H01J3/025 H01J27/08 H01J37/077

    Abstract: Die Erfindung betrifft eine Quelle zur Erzeugung von gepulsten Ionen- und Elektronenstrahlen.
    Mit ihr wird ein in seinem Strahlquerschnitt großflächiger Strom geladener Teilchen erzeugt. Die Vakuum-Bogenplasmaquelle wird durch eine den Gesamtstrom bestimmende Last, die aus der Parallelschaltung eines ohmschen Widerstands mit einem Kondensator besteht, zur sichern Zündung geführt. Diese Last ist an den Innenwiderstand des Pulsspannungsgenerators leistungsangepaßt. Die Dimensionierung der elektrischen Bauteile an den Elektroden unter Berücksichtigung vorgegebener Schranken ermöglicht einen in seinem Strahlquerschnitt homogenen Strom geladener Teilchen, der aus ein und demselben Ladungsteilchen bei gleichen Zündelektroden oder aus einem strukturierten Strom unterschiedlicher Teilchensorten bei unterschiedlichem Zündelektrodenmaterial besteht.

    Abstract translation: 将源放置在具有四个高压馈通(F1-F4)的真空室(VC)中。 放电阳极(DE)具有孔的图案,电线(NE)从连接到集电器(K)的串联电阻(R0)突出。 阳极侧栅格(AG)具有围绕其边缘形成的聚焦电极(AFE)。 两个阴极侧栅格中的一个(CG1)具有类似的外围电极(CFE)。 从电容器(Ca)与电阻器(Ra)并联的电极和放电阳极之间产生电弧,限制了离子电流。

    PLASMA-RÖNTGENRÖHRE, INSBESONDERE ZUR RÖNTGEN-VORIONISIERUNG VON GASLASERN, UND VERWENDUNG ALS ELEKTRONENKANONE
    90.
    发明授权
    PLASMA-RÖNTGENRÖHRE, INSBESONDERE ZUR RÖNTGEN-VORIONISIERUNG VON GASLASERN, UND VERWENDUNG ALS ELEKTRONENKANONE 失效
    等离子X射线管,特别是用于X射线辐射气体激光,并用作电子枪

    公开(公告)号:EP0398995B1

    公开(公告)日:1993-06-23

    申请号:EP89904542.1

    申请日:1989-04-07

    CPC classification number: H05G2/003 H01J3/025 H01J17/40 H01J33/00 H01S3/09716

    Abstract: In the preferred application for preionizing TE lasers, in particular excimer lasers, the plasma X-ray tube (ER), which can also be referred to as single-chamber ion tube, has an elongated, box-shaped housing (G) including in its inside an also elongated cylindrical cathode (K) of generally U-shaped cross-section, the open end of which faces the X-ray target in the form of a gastight film. An elongated wire-shaped initiating electrode (11) is arranged between X-ray target (1) and cylindrical cathode (K). An electrical field is generated around the initiating electrode (11) by applying thereto a positive voltage or voltage pulse. The field thus generated forces the electrons which are present because of the ambient radiation to form long spiral paths, thus ionising gas atoms. Electron avalanches develop and initiate the wire discharge. Ions (i+) are extracted from the low-pressure plasma (3) by applying to the cylindrical cathode (K) a beam potential of typically between 60 kV and a maximum of 120 kV, and accelerated against the cylindrical cathode (K). On impact of the ions from the cylindrical cathode (K), secondary electrons are emitted and accelerated in the opposite direction, thus forming the electron beam (E), which on striking the X-ray target (1) creates the X-ray bremsstrahlung (X). Said plasma X-ray tube is also basically suitable as an electron gun: for this application, the film used as an electron window covering the window opening in the target holding wall need only be designed so as to be accordingly radiolucent to electron beams.

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