DIFFUSION BARRIERS FOR PHOTOVOLTAIC DEVICES BY LEACHING
    1.
    发明申请
    DIFFUSION BARRIERS FOR PHOTOVOLTAIC DEVICES BY LEACHING 审中-公开
    通过浸出进行光伏器件的扩散障碍

    公开(公告)号:WO2013082343A1

    公开(公告)日:2013-06-06

    申请号:PCT/US2012/067171

    申请日:2012-11-30

    Abstract: A method of leaching alkali ions from a glass substrate to form a glass substrate having an intrinsic alkali barrier layer including providing a glass substrate comprising alkali metal ions, alkaline earth metal ions, or a combination thereof and contacting the surfaces of the substrate with a solution comprising a hydrogen bearing species such that at least a portion of the hydrogen bearing species replaces at least a portion of the alkali metal ions, alkaline earth metal ions, or the combination thereof in the at least one surface to form the glass substrate having the intrinsic alkali barrier layer.

    Abstract translation: 一种从玻璃基板浸出碱离子以形成具有本征碱性阻挡层的玻璃基板的方法,该方法包括提供包括碱金属离子,碱土金属离子或其组合的玻璃基板,并使基板的表面与溶液接触 包括含氢物质,使得至少一部分含氢物质在至少一个表面中替换至少一部分碱金属离子,碱土金属离子或其组合,以形成具有本征态的玻璃基底 碱阻隔层。

    METHOD FOR PRODUCING EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES
    3.
    发明申请
    METHOD FOR PRODUCING EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES 审中-公开
    用于生产超极本超薄基板的方法

    公开(公告)号:WO2002088035A1

    公开(公告)日:2002-11-07

    申请号:PCT/US2002/009189

    申请日:2002-03-25

    Abstract: A method for forming EUV Lithography large dimension homogeneous glass body is disclosed which includes delivering a silica precursor (28) to a burner (16) and passing the silica precursor (16) through the flame (36) of the burner (16) to form silica particles (38), depositing the silica particles (38) on a planar surface (14) to form a flat porous EUV Lithography large dimension preform (40) and consolidating the flat porous EUV Lithography large dimension preform (40) into a flat dense EUV Lithography large dimension homogeneous glass body.

    Abstract translation: 公开了一种用于形成EUV平版印刷大尺寸均匀玻璃体的方法,其包括将二氧化硅前体(28)输送到燃烧器(16)并使二氧化硅前体(16)通过燃烧器(16)的火焰(36)形成 二氧化硅颗粒(38),将二氧化硅颗粒(38)沉积在平坦表面(14)上以形成平坦多孔EUV平版印刷大尺寸预制件(40),并将平面多孔EUV平版印刷大尺寸预成型件(40)固结成扁平密度 EUV平版印刷大尺寸均匀玻璃体。

    METHOD OF PRODUCING CONSTANCY OF COMPRESSIVE STRESS IN GLASS IN AN ION-EXCHANGE PROCESS
    7.
    发明申请
    METHOD OF PRODUCING CONSTANCY OF COMPRESSIVE STRESS IN GLASS IN AN ION-EXCHANGE PROCESS 审中-公开
    在离子交换过程中生产玻璃中压缩应力的常数的方法

    公开(公告)号:WO2013116420A1

    公开(公告)日:2013-08-08

    申请号:PCT/US2013/023980

    申请日:2013-01-31

    CPC classification number: C03C21/002

    Abstract: The present disclosure is directed to a method for producing constancy of the ion-exchanged product stress profile through adjustment of ion-exchange conditions by taking account of the influence of salt bath poisoning on the baths useful lifetime. The present disclosure is directed to a method of ion-exchange in which the salt bath temperature and salt bath time are adjusted as a function of the amount of alkali metal ions that exchange in the bath. That is, temperature and time are adjusted as a function of salt bath poisoning. Temperature is set to its highest value and time to its shortest value in the starting un-poisoned salt bath, those values chosen to hit target values of surface compressive stress and exchange depth of layer. Temperature is then reduced and time lengthened as salt bath poisoning proceeds, those changes chosen to maintain the same surface compressive stress and exchange depth of layer.

    Abstract translation: 本公开涉及一种通过考虑盐浴中毒对浴的使用寿命的影响来调节离子交换条件来产生离子交换产物应力分布的恒定性的方法。 本公开涉及一种离子交换方法,其中盐浴温度和盐浴时间作为在浴中交换的碱金属离子的量的函数来调节。 也就是说,温度和时间被调整为盐浴中毒的功能。 在起始的无毒盐浴中将温度设定为其最小值和时间到其最短值,这些值被选择以达到表面压应力的目标值和层的交换深度。 随着盐浴中毒的进行,温度降低,时间延长,这些变化被选择为保持相同的表面压应力和层的交换深度。

    SYNTHETIC SILICA GLASS OPTICAL MATERIAL AND METHOD OF PRODUCING IT
    10.
    发明申请
    SYNTHETIC SILICA GLASS OPTICAL MATERIAL AND METHOD OF PRODUCING IT 审中-公开
    合成二氧化硅玻璃光学材料及其生产方法

    公开(公告)号:WO2005082800A1

    公开(公告)日:2005-09-09

    申请号:PCT/US2005/005709

    申请日:2005-02-23

    Abstract: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633nm, of between about -1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70µJ/cm 2 . The synthetic silica glass optical material of the present invention comprises OH concentration levels less than about 600ppm, preferably less than 200ppm, and H 2 concentration levels less than about 5.0x10 17 molecules/cm 3 , and preferably less than about 2.0x10 17 molecules/cm 3 . A method of producing a synthetic silica glass optical material is also claimed.

    Abstract translation: 公开了一种合成石英玻璃光学材料,其特征在于波长小于约250nm,特别是具有低激光诱导波前失真的紫外线波长范围内具有高抗紫外线辐射的光学损伤。 具体地,当经受在约193nm的操作的激光器和约70μJ/ cm 2的通量时,在633nm处测量的激光诱导波前失真在约-1.0和1.0nm / cm之间。 本发明的合成二氧化硅玻璃光学材料包括OH浓度水平低于约600ppm,优选小于200ppm,H 2浓度水平低于约5.0×10 17分子/ cm 3,优选小于约2.0×10 3 17分子/ cm 3。 还要求生产合成石英玻璃光学材料的方法。

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