Abstract:
A method of leaching alkali ions from a glass substrate to form a glass substrate having an intrinsic alkali barrier layer including providing a glass substrate comprising alkali metal ions, alkaline earth metal ions, or a combination thereof and contacting the surfaces of the substrate with a solution comprising a hydrogen bearing species such that at least a portion of the hydrogen bearing species replaces at least a portion of the alkali metal ions, alkaline earth metal ions, or the combination thereof in the at least one surface to form the glass substrate having the intrinsic alkali barrier layer.
Abstract:
A fused silica glass and a fused silica article having a combined concentration of at least one of OH and OD of up to about 50 ppm. The fused silica glass is formed by drying a fused silica soot blank or preform in an inert atmosphere containing a drying agent, followed by removal of residual drying agent from the dried soot blank by heating the dried soot blank in an atmosphere comprising an inert gas and of oxygen.
Abstract:
A method for forming EUV Lithography large dimension homogeneous glass body is disclosed which includes delivering a silica precursor (28) to a burner (16) and passing the silica precursor (16) through the flame (36) of the burner (16) to form silica particles (38), depositing the silica particles (38) on a planar surface (14) to form a flat porous EUV Lithography large dimension preform (40) and consolidating the flat porous EUV Lithography large dimension preform (40) into a flat dense EUV Lithography large dimension homogeneous glass body.
Abstract:
Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.
Abstract:
Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.
Abstract:
A system is provided for sintering thin, wide, and/or long tape materials such as in a roll to roll process. The system is arranged to control sintering and limit deformation of the tape during sintering to produce sintered material.
Abstract:
The present disclosure is directed to a method for producing constancy of the ion-exchanged product stress profile through adjustment of ion-exchange conditions by taking account of the influence of salt bath poisoning on the baths useful lifetime. The present disclosure is directed to a method of ion-exchange in which the salt bath temperature and salt bath time are adjusted as a function of the amount of alkali metal ions that exchange in the bath. That is, temperature and time are adjusted as a function of salt bath poisoning. Temperature is set to its highest value and time to its shortest value in the starting un-poisoned salt bath, those values chosen to hit target values of surface compressive stress and exchange depth of layer. Temperature is then reduced and time lengthened as salt bath poisoning proceeds, those changes chosen to maintain the same surface compressive stress and exchange depth of layer.
Abstract:
The disclosure relates to vessels configured to contain molten semiconducting materials. The vessels include a high purity fused silica lining having a base and sidewalls that define an interior volume, and a fused silica backing proximate the external surfaces of the lining.
Abstract:
A low expansion glass substrate includes titania and silica and has a thermal expansivity with an average gradient less than 1 ppb/°C /°C in a temperature range of 19°C to 25°C.
Abstract:
Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633nm, of between about -1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70µJ/cm 2 . The synthetic silica glass optical material of the present invention comprises OH concentration levels less than about 600ppm, preferably less than 200ppm, and H 2 concentration levels less than about 5.0x10 17 molecules/cm 3 , and preferably less than about 2.0x10 17 molecules/cm 3 . A method of producing a synthetic silica glass optical material is also claimed.
Abstract translation:公开了一种合成石英玻璃光学材料,其特征在于波长小于约250nm,特别是具有低激光诱导波前失真的紫外线波长范围内具有高抗紫外线辐射的光学损伤。 具体地,当经受在约193nm的操作的激光器和约70μJ/ cm 2的通量时,在633nm处测量的激光诱导波前失真在约-1.0和1.0nm / cm之间。 本发明的合成二氧化硅玻璃光学材料包括OH浓度水平低于约600ppm,优选小于200ppm,H 2浓度水平低于约5.0×10 17分子/ cm 3,优选小于约2.0×10 3 17分子/ cm 3。 还要求生产合成石英玻璃光学材料的方法。