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    SPECTROMETER
    1.
    发明授权
    SPECTROMETER 有权
    光谱仪

    公开(公告)号：EP1144965B1

    公开(公告)日：2004-11-24

    申请号：EP00900491.2

    申请日：2000-01-07

    Applicant: Ibsen Photonics A/S

    Inventor： IBSEN, Per, Eld ,  ROSE, Bjarke ,  RASMUSSEN, Michael

    IPC: G01J3/18 ,  G01J3/28 ,  G01J3/02

    CPC classification number: G01J3/00 ,  G01J3/0256 ,  G01J3/0259 ,  G01J3/0278 ,  G01J3/0294 ,  G01J3/18 ,  G01J3/2803

    Abstract: A method and apparatus for measuring spectral information of light from at least one object (15); said apparatus comprising at least one light detecting means (34); and at least one transparent body (31) having a front side (F) including: an entrance surface (311) having positioned in or near thereof an entrance aperture means (30), and at least one reflecting surface (312); and said transparent body further having a back side (B) including: at least one reflecting surface (313) for reflecting light received from said entrance aperture means, and an exit surface (314); said detecting means being positioned in or near said exit surface; said first reflecting surface, said second reflecting surface, or both, having at least one diffractive optical element (32) and/or at least one focusing means (33). Such apparatus comprising more spectral channels, and such apparatus comprising distance sensing means.

    Abstract translation: 用于测量来自至少一个物体的光的光谱信息的方法和装置包括至少一个光检测器和至少一个透明体。 透明体具有前侧，具有入口孔和至少一个反射面。 透明体还具有包括至少一个反射表面和出射表面的背面。 检测器位于出口表面附近。 前反射表面和后反射表面中的至少一个包括衍射光学元件，其被布置成接收来自孔的发散光。 聚焦元件将衍射光聚焦到出射表面。 该装置可以包括多个通道，并且还可以包括用于测量到物体的距离的装置。

    METHOD AND APPARATUS FOR DIFFRACTIVE TRANSFER OF A MASK GRATING
    2.
    发明公开
    METHOD AND APPARATUS FOR DIFFRACTIVE TRANSFER OF A MASK GRATING 审中-公开
    方法和设备转让口罩衍射网格的

    公开(公告)号：EP1430348A2

    公开(公告)日：2004-06-23

    申请号：EP02784880.3

    申请日：2002-05-21

    Applicant: Ibsen Photonics A/S

    Inventor： HANSEN, Poul-Erik ,  IBSEN, Per, Eld

    IPC: G02B27/00 ,  G03B27/52 ,  G03F9/00

    CPC classification number: G03F7/7035

    Abstract: An improved technique of exposing a photoresist through a grating mask reduces the occurrence of overlapping gratings and also avoids distortions in the exposed mask when there is a gap between the contact mask and the photoresist layer. The technique is particularly well suited to forming Bragg gratings on semiconductors and other materials that are used for wavelength selection in, for example, optical communications applications. The technique employs a phase grating held close to, but out of contact with, the photoresist layer. Amongst the advantages provided by the present invention is that the requirements of the permissible thickness of the photoresist layer suitable for writing high visibility gratings are relaxed, thus reducing the complexity and costs for processing the substrate.

    ALIGNMENT OF MULTI-CHANNEL DIFFRACTIVE WDM DEVICE
    4.
    发明申请
    ALIGNMENT OF MULTI-CHANNEL DIFFRACTIVE WDM DEVICE 审中-公开
    多通道衍射波分复用器件的对准

    公开(公告)号：WO2003016970A1

    公开(公告)日：2003-02-27

    申请号：PCT/EP2002/008875

    申请日：2002-08-08

    Applicant: IBSEN PHOTONICS A/S ,  KHALFAOUI, Chaker ,  THEODOR, Keld ,  BASTUE, Jens ,  ROSE, Bjarke

    Inventor： KHALFAOUI, Chaker ,  THEODOR, Keld ,  BASTUE, Jens ,  ROSE, Bjarke

    IPC: G02B6/34

    CPC classification number: G02B6/27 ,  G02B6/2706 ,  G02B6/29311 ,  G02B6/29313 ,  G02B6/2938 ,  G02B6/29383 ,  G02B6/29385

    Abstract: A method and apparatus are presented for aligning a diffractive WDM device that includes i) a multi-channel, light handling device having a selected channel spacing and ii) a multi-channel signal input unit. The method includes adjusting a direction of incidence of an optical signal from the input unit on at least a first diffracting element of the WDM device so as to set an actual optical channel spacing at an output region of the WDM device to be approximately equal to the selected channel spacing of the multi-channel, light handling device. In the apparatus, the orientation of the light input unit is adjustable in a direction parallel to a diffraction plane of the diffractive WDM device so as to select an actual channel spacing at the multi-channel, light handling device that is approximately equal to the selected channel spacing.

    Abstract translation: 提供了一种用于对准衍射波分复用器件的方法和设备，该衍射波分复用器件包括：i）具有选定信道间隔的多信道光处理设备，以及ii）多信道信号输入单元。 该方法包括在WDM设备的至少第一衍射元件上调整来自输入单元的光信号的入射方向，以便将WDM设备的输出区域处的实际光信道间隔设置为近似等于 选定的多通道灯光处理装置的通道间隔。 在该设备中，光输入单元的取向可在与衍射WDM设备的衍射平面平行的方向上调节，以便在多通道，光处理设备处选择大致等于所选光线的实际通道间隔 频道间隔。

    METHOD AND APPARATUS FOR DIFFRACTIVE TRANSFER OF A MASK GRATING
    5.
    发明申请
    METHOD AND APPARATUS FOR DIFFRACTIVE TRANSFER OF A MASK GRATING 审中-公开

    公开(公告)号：WO2003007075A3

    公开(公告)日：2003-01-23

    申请号：PCT/IB2002/003099

    申请日：2002-05-21

    Applicant: IBSEN PHOTONICS A/S ,  HANSEN, Poul-Erik

    Inventor： HANSEN, Poul-Erik ,  IBSEN, Per, Eld

    IPC: G02B27/00

    Abstract: An improved technique of exposing a photoresist through a grating mask reduces the occurrence of overlapping gratings and also avoids distortions in the exposed mask when there is a gap between the contact mask and the photoresist layer. The technique is particularly well suited to forming Bragg gratings on semiconductors and other materials that are used for wavelength selection in, for example, optical communications applications. The technique employs a phase grating held close to, but out of contact with, the photoresist layer. Amongst the advantages provided by the present invention is that the requirements of the permissible thickness of the photoresist layer suitable for writing high visibility gratings are relaxed, thus reducing the complexity and costs for processing the substrate.

    METHOD AND APPARATUS FOR DIFFRACTIVE TRANSFER OF A MASK GRATING
    6.
    发明申请
    METHOD AND APPARATUS FOR DIFFRACTIVE TRANSFER OF A MASK GRATING 审中-公开
    用于掩模蚀刻的差异转移的方法和装置

    公开(公告)号：WO2003007075A2

    公开(公告)日：2003-01-23

    申请号：PCT/IB2002/003099

    申请日：2002-05-21

    Applicant: IBSEN PHOTONICS A/S ,  HANSEN, Poul-Erik

    Inventor： HANSEN, Poul-Erik ,  IBSEN, Per, Eld

    IPC: G03F

    CPC classification number: G03F7/7035

    Abstract: An improved technique of exposing a photoresist through a grating mask reduces the occurrence of overlapping gratings and also avoids distortions in the exposed mask when there is a gap between the contact mask and the photoresist layer. The technique is particularly well suited to forming Bragg gratings on semiconductors and other materials that are used for wavelength selection in, for example, optical communications applications. The technique employs a phase grating held close to, but out of contact with, the photoresist layer. Amongst the advantages provided by the present invention is that the requirements of the permissible thickness of the photoresist layer suitable for writing high visibility gratings are relaxed, thus reducing the complexity and costs for processing the substrate.

    Abstract translation: 通过光栅掩模曝光光致抗蚀剂的改进技术减少了重叠光栅的出现，并且在接触掩模和光致抗蚀剂层之间存在间隙时也避免了曝光掩模中的失真。 该技术特别适用于在例如光通信应用中用于波长选择的半导体和其它材料上形成布拉格光栅。 该技术采用保持接近但不与光致抗蚀剂层接触的相位光栅。 本发明提供的优点在于，适用于写入高可见度光栅的光致抗蚀剂层的允许厚度的要求被放宽，从而降低了处理衬底的复杂性和成本。

    STACKED PLANAR INTEGRATED OPTICS AND TOOL FOR FABRICATING SAME
    7.
    发明申请
    STACKED PLANAR INTEGRATED OPTICS AND TOOL FOR FABRICATING SAME 审中-公开
    堆叠平面集成光学和工具制作

    公开(公告)号：WO2002079811A2

    公开(公告)日：2002-10-10

    申请号：PCT/IB2002/002204

    申请日：2002-03-28

    Applicant: IBSEN PHOTONICS A/S ,  LASSE, Wengel, Christoffersen

    Inventor： LASSE, Wengel, Christoffersen ,  BJARKE, Rose ,  IBSEN, Per, Eld

    IPC: G02B

    CPC classification number: G02B6/4215 ,  G02B5/1852 ,  G02B6/1221 ,  G02B6/29307 ,  G02B6/2931 ,  G02B6/29311 ,  G02B6/4224 ,  G02B6/423 ,  G02B6/4249 ,  G02B6/43 ,  G02B2006/12176

    Abstract: In a method of making a replication tool, replication parts for both two dimensional optical elements, such as are fabricated using micro-forming techniques, and three dimensional optical elements, that are typically formed using cutting techniques are present on the replication tool. A method of manufacturing a replication tool for a planar optical sheet includes mounting at least one optical element part on a bse to form a master part and forming a conductive metal layer over the master part. The method also comprises electrochemically depositing over the conductive metal layer to form an electrochemically deposited layer, separating the electrochemically deposited layer from the master part. The invention also relates to the replication tool itself and optical circuits formed using the replication tool.

    Abstract translation: 在制作复制工具的方法中，复制工具上存在通常使用切割技术形成的二维光学元件的复制部件，例如使用微成形技术制造的三维光学元件和三维光学元件。 一种制造用于平面光学片的复制工具的方法包括在bse上安装至少一个光学元件部分以形成母模部分，并在主部件上形成导电金属层。 该方法还包括电化学沉积在导电金属层上以形成电化学沉积层，将电化学沉积层与主要部分分离。 本发明还涉及使用复制工具形成的复制工具本身和光学电路。

    TRANSMISSION SPECTROMETER WITH REDUCED STRAY LIGHT AND THERMAL DRIFT
    8.
    发明申请
    TRANSMISSION SPECTROMETER WITH REDUCED STRAY LIGHT AND THERMAL DRIFT 审中-公开
    传输光谱仪具有减少的光线和热量

    公开(公告)号：WO2005005939A1

    公开(公告)日：2005-01-20

    申请号：PCT/IB2004/002226

    申请日：2004-07-06

    Applicant: IBSEN PHOTONICS A/S ,  BASTUE, Jens ,  HERHOLD-RASMUSSEN, Nicolai ,  RASMUSSEN, Michael ,  JESPERSEN, Ole

    Inventor： BASTUE, Jens ,  HERHOLD-RASMUSSEN, Nicolai ,  RASMUSSEN, Michael ,  JESPERSEN, Ole

    IPC: G01J3/18

    CPC classification number: G01J3/02 ,  G01J3/0286 ,  G01J3/18

    Abstract: Transmission spectrometers require low levels of background light so that the signal to noise ratio is increased, and also require stable performance over wide temperature ranges. Light reflected by the transmission grating can result in increased background levels. One approach to reducing the background level is to orient the transmissive diffraction grating so that light reflected by the grating is reflected out of the diffraction plane. The temperature-induced wavelength drift of a transmission spectrometer can be due to the frame upon which the transmission grating is mounted. The wavelength drift is reduced by allowing the thermal expansion of the grating to be independent of the frame.

    Abstract translation: 透射光谱仪需要低水平的背景光，从而增加信噪比，并且在宽温度范围内也需要稳定的性能。 由透射光栅反射的光可导致背景增加。 降低背景水平的一种方法是使透射衍射光栅定向，使得由光栅反射的光被反射出衍射平面。 透射光谱仪的温度感应波长漂移可能是由于安装透射光栅的框架。 通过允许光栅的热膨胀独立于框架来减小波长漂移。

    STACKED OPTICAL SHEETS AND TOOL FOR FABRICATING SAME
    10.
    发明申请
    STACKED OPTICAL SHEETS AND TOOL FOR FABRICATING SAME 审中-公开

    公开(公告)号：WO2002079811A3

    公开(公告)日：2002-10-10

    申请号：PCT/IB2002/002204

    申请日：2002-03-28

    Applicant: IBSEN PHOTONICS A/S ,  CHRISTOFFERSEN, Lasse, Wengel ,  ROSE, Bjarke ,  IBSEN, Per, Eld

    Inventor： CHRISTOFFERSEN, Lasse, Wengel ,  ROSE, Bjarke ,  IBSEN, Per, Eld

    IPC: G02B6/12

    Abstract: In a method of making a replication tool, replication parts for both two dimensional optical elements, such as are fabricated using micro-forming techniques, and three dimensional optical elements, that are typically formed using cutting techniques are present on the replication tool. A method of manufacturing a replication tool for a planar optical sheet includes mounting at least one optical element part on a bse to form a master part and forming a conductive metal layer over the master part. The method also comprises electrochemically depositing over the conductive metal layer to form an electrochemically deposited layer, separating the electrochemically deposited layer from the master part. The invention also relates to the replication tool itself and optical circuits formed using the replication tool.

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