公开(公告)号：KR1020120064039A

公开(公告)日：2012-06-18

申请号：KR1020110130208

申请日：2011-12-07

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사다데쯔야 ,  고또오히데아끼 ,  나가따아쯔시 ,  후지와라마사끼

IPC: H01L21/027 ,  G03F7/30

CPC classification number: G03F7/3064 ,  G03F7/32 ,  G03F7/70916 ,  H01L21/0274

Abstract: PURPOSE: A developing method, a developing apparatus, and a coating and developing processing system including the same are provided to obtain a uniform photo-resist pattern by controlling substrate returning speed when supplying a developing solution and eliminating the developing solution. CONSTITUTION: A first transferring device returns a substrate. An exposed photo-resist film is formed on the surface of the substrate. A blow unit(30D) has a blow nozzle(51) and a third transferring device. The blow nozzle eliminates a developing solution covering the surface of the substrate by discharging gas. The third transferring device returns the substrate toward the blow nozzle. A controller controls the first transferring device and the third transferring device. A rinse unit has a rinse solution supplying nozzle. The rinse solution supplying nozzle supplies a rinse solution to the surface of the substrate in which the developing solution is eliminate.

Abstract translation: 目的：提供一种显影方法，显影装置以及包含该显影方法的涂布显影处理系统，以在提供显影液时控制基板返回速度并除去显影液，以获得均匀的光致抗蚀剂图案。 构成：第一个传送装置返回一个基板。 在基板的表面上形成曝光的光刻胶膜。 吹塑单元（30D）具有吹塑喷嘴（51）和第三转印装置。 喷嘴通过排出气体而消除了覆盖基板表面的显影液。 第三传送装置将基板朝向吹塑喷嘴返回。 控制器控制第一传送装置和第三传送装置。 冲洗单元具有冲洗溶液供应喷嘴。 冲洗溶液供应喷嘴将冲洗溶液提供到其中消除显影液的基底表面。