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公开(公告)号：KR1020100096023A
公开(公告)日：2010-09-01
申请号：KR1020100015604
申请日：2010-02-22
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: B05C11/10 , B05D1/38 , H01L21/027 , G03F7/16
CPC classification number: G03F7/16 , B05C11/1002 , B05D1/38 , G03F7/70933 , H01L21/67023 , H01L21/67028
Abstract: PURPOSE: An apparatus and a method for treating a substrate are provided to prevent the generation of development stains by efficiently performing an operation of collecting a first treatment liquid and substituting the first treatment liquid with a second treatment liquid. CONSTITUTION: An apparatus for treating a substrate comprises: a substrate returning channel(2) for returning a treated substrate(G); a first treatment liquid supply unit for supplying the first treatment liquid to the treated substrate; a gas supply unit(21) for spraying gas steam to the vertical direction or the returning direction of the substrate; a first rinse liquid supply unit(22) for supplying a second treatment liquid to the returned substrate; and a second rinse liquid supply unit(23) for supplying the second treatment liquid to the substrate at a high speed.
Abstract translation: 目的：提供一种用于处理基板的装置和方法，以通过有效地执行收集第一处理液体的操作并用第二处理液代替第一处理液体来防止发生污渍的产生。 构成：用于处理衬底的设备包括：用于使经处理的衬底（G）返回的衬底返回通道（2）; 第一处理液体供应单元，用于将第一处理液体供应到经处理的基板; 用于将气体蒸汽喷射到基板的垂直方向或返回方向的气体供给单元（21） 第一冲洗液体供应单元（22），用于将第二处理液体供应到返回的基板; 以及用于将第二处理液体高速供给到基板的第二冲洗液供给部（23）。
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公开(公告)号：KR1020120064039A
公开(公告)日：2012-06-18
申请号：KR1020110130208
申请日：2011-12-07
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027 , G03F7/30
CPC classification number: G03F7/3064 , G03F7/32 , G03F7/70916 , H01L21/0274
Abstract: PURPOSE: A developing method, a developing apparatus, and a coating and developing processing system including the same are provided to obtain a uniform photo-resist pattern by controlling substrate returning speed when supplying a developing solution and eliminating the developing solution. CONSTITUTION: A first transferring device returns a substrate. An exposed photo-resist film is formed on the surface of the substrate. A blow unit(30D) has a blow nozzle(51) and a third transferring device. The blow nozzle eliminates a developing solution covering the surface of the substrate by discharging gas. The third transferring device returns the substrate toward the blow nozzle. A controller controls the first transferring device and the third transferring device. A rinse unit has a rinse solution supplying nozzle. The rinse solution supplying nozzle supplies a rinse solution to the surface of the substrate in which the developing solution is eliminate.
Abstract translation: 目的：提供一种显影方法，显影装置以及包含该显影方法的涂布显影处理系统，以在提供显影液时控制基板返回速度并除去显影液，以获得均匀的光致抗蚀剂图案。 构成：第一个传送装置返回一个基板。 在基板的表面上形成曝光的光刻胶膜。 吹塑单元（30D）具有吹塑喷嘴（51）和第三转印装置。 喷嘴通过排出气体而消除了覆盖基板表面的显影液。 第三传送装置将基板朝向吹塑喷嘴返回。 控制器控制第一传送装置和第三传送装置。 冲洗单元具有冲洗溶液供应喷嘴。 冲洗溶液供应喷嘴将冲洗溶液提供到其中消除显影液的基底表面。
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公开(公告)号：KR100549879B1
公开(公告)日：2006-02-06
申请号：KR1020050005393
申请日：2005-01-20
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: G02F1/13
Abstract: 본 발명은 물체가 처리되는 경우 외부로 유동하거나 외부로 비산하는 처리액을 회수하기 위한 용기와, 세정액을 상기 용기내로 공급함으로써 용기의 내부 벽 표면을 세정하기 위한 세정 수단과, 용기의 내부 벽 표면이 세정 수단에 의해 세정되는 경우 용기로부터 배출된 액체를 회수하고, 회수된 액체를 세정 수단으로 공급하기 위한 순환 시스템을 포함하는 처리 장치를 제공한다.
Abstract translation: 清洁装置技术领域本发明涉及一种清洁装置，用于在处理物体时通过将清洁液供应到容器中来清洁容器的内壁表面， 还有一种循环系统，用于当清洁装置清洁容器时回收从容器中排出的液体并将回收的液体供应到清洁装置。
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公开(公告)号：KR1020130036700A
公开(公告)日：2013-04-12
申请号：KR1020120080534
申请日：2012-07-24
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/302
CPC classification number: G03F7/3057 , H01L21/67051
Abstract: PURPOSE: An apparatus and method for processing a substrate are provided to prevent a developer from being undulated by separately collecting a first processing solution and smoothly substituting the first processing solution for a second processing solution. CONSTITUTION: A first processing solution supply unit supplies a first processing solution to a substrate(G). A gas supply unit(21) supplies a preset gas to the surface of the substrate in which the first processing solution is collected. A second rinse nozzle discharges a second processing solution to the surface of the substrate. A first rinse nozzle(22) discharges the second processing solution to the surface of the substrate to which the gas is supplied. A solution collecting unit(27) forms a solution collected part extended in a width direction of the substrate on a substrate transfer path by the second processing solution supplied by the first rinse nozzle.
Abstract translation: 目的：提供一种用于处理基板的装置和方法，以通过分开收集第一处理溶液并平滑地将第一处理溶液代替第二处理溶液来防止显影剂波动。 构成：第一处理溶液供应单元向基板（G）提供第一处理溶液。 气体供给单元（21）将预先设定的气体供给到收集第一处理液的基板的表面。 第二冲洗喷嘴将第二处理溶液排出到基板的表面。 第一冲洗喷嘴（22）将第二处理溶液排放到供给气体的基板的表面。 溶液收集单元（27）通过由第一冲洗喷嘴提供的第二处理溶液在基板输送路径上形成在基板的宽度方向上延伸的溶液收集部分。
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Patent Agency Ranking
公开(公告)号：KR1020110025121A
公开(公告)日：2011-03-09
申请号：KR1020100084777
申请日：2010-08-31
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: H01L21/0274 , G03F7/2041 , G03F7/70975
Abstract: PURPOSE: A developing device and a developing method are provided to reduce non-uniformity in a developing process by setting a transfer speed of a substrate with a discharge timing of developers from a second development nozzle. CONSTITUTION: A first development nozzle coats developers from the front to the rear of a substrate transferred on a transfer path. A substrate information obtaining unit(20) obtains information about a substrate process. A second development nozzle(13) moves along the transfer path of the lower side of the first development nozzle. A nozzle moving unit moves the second development nozzle. A control unit(25) controls the driving of the nozzle moving unit and the second development nozzle.
Abstract translation: 目的：提供显影装置和显影方法，以通过从第二显影喷嘴设置显影剂的排出时间来设置基板的转印速度来减少显影过程中的不均匀性。 构成：第一个开发喷嘴将显影剂从传输路径上转移的基板的前面到后面涂覆。 基板信息获取单元（20）获得关于基板处理的信息。 第二显影喷嘴（13）沿着第一显影喷嘴的下侧的传送路径移动。 喷嘴移动单元移动第二显影喷嘴。 控制单元（25）控制喷嘴移动单元和第二显影喷嘴的驱动。
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公开(公告)号：KR1019980024865A
公开(公告)日：1998-07-06
申请号：KR1019970048207
申请日：1997-09-23
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/304
Abstract: 본 발명은 물체가 처리되는 경우 외부로 유동하거나 외부로 비산하는 처리액을 회수하기 위한 용기와, 세정액을 상기 용기내로 공급함으로써 용기의 내부 벽 표면을 세정하기 위한 세정 수단과, 용기의 내부 벽 표면이 세정 수단에 의해 세정되는 경우 용기로부터 배출된 액체를 회수하고, 회수된 액체를 세정 수단으로 공급하기 위한 순환 시스템을 포함하는 처리 장치를 제공한다.
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公开(公告)号：KR101677288B1
公开(公告)日：2016-11-17
申请号：KR1020100015604
申请日：2010-02-22
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: B05C11/10 , B05D1/38 , H01L21/027 , G03F7/16
Abstract: 본발명의과제는평류의반송라인상에서피처리기판에공급한제1 처리액을분별회수하여제2 처리액으로치환하는동작을효율적으로원활하게행하여, 현상얼룩의발생을억제하는것이다. 피처리기판(G)을평류반송하는기판반송로(2)와, 상기기판반송로를반송되는피처리기판에제1 처리액을공급하는제1 처리액공급수단(9)과, 상기기판반송로를반송되어, 상기제1 처리액이공급된상기피처리기판에대해, 소정의가스류를연직방향내지반송방향하류측중 어느한쪽을향해분사하는기체공급수단(21)과, 상기기체공급수단에의해가스류가분사되어, 상기기판반송로를반송되는상기피처리기판에대해, 소정의유속으로제2 처리액을공급하는제1 린스액공급수단(22)과, 상기제2 처리액이공급되어, 상기기판반송로를반송되는상기피처리기판에대해, 상기제1 린스액공급수단보다도고유속으로상기제2 처리액을공급하는제2 린스액공급수단(23)을구비한다.
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公开(公告)号：KR1020080032608A
公开(公告)日：2008-04-15
申请号：KR1020070101298
申请日：2007-10-09
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/027
CPC classification number: H01L21/6715 , B05B1/005 , H01L21/67028 , H01L21/67248 , H01L21/68742
Abstract: A developing processing method and a developing processing apparatus are provided to reduce temperature change of a roller when the developing process of the apparatus is resumed, by jetting temperature control solution to at least one roller for keeping the roller at a temperature lower than ambient temperature, before a successive developing process of the apparatus is resumed. A developing processing method in which a developing process is carried out in such a manner that a target substrate after being exposed to the light is developed one after another at a predetermined tact time on a transfer passage(120) comprising a plurality of rollers(190) installed in horizontal direction at a predetermined pitch, the method is characterized by that at least one of the rollers on the transfer passage is jetted by temperature control solution for a predetermined time interval constantly or intermittently, so that the roller maintains its temperature lower than ambient temperature, before successive developing process is resumed for a group of substrates.
Abstract translation: 提供了一种显影处理方法和显影处理装置，用于当恢复装置的显影过程时，通过将温度控制溶液喷射到至少一个辊来保持辊的温度低于环境温度，以减少辊的温度变化， 在该装置的连续显影处理被恢复之前。 一种显影处理方法，其中以这样的方式进行显影处理，即在暴露于光之后的目标基板在预定的时间间隔一个接一个地显现在包括多个辊（190）的传送通道（120）上 ），其特征在于，传送通道中的至少一个辊子由温度控制溶液持续或间歇地预定的时间间隔喷射，使辊保持其温度低于 在一组基板恢复连续显影处理之前的环境温度。
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公开(公告)号：KR100508575B1
公开(公告)日：2005-10-21
申请号：KR1019970048207
申请日：1997-09-23
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/304
Abstract: 본 발명은 물체가 처리되는 경우 외부로 유동하거나 외부로 비산하는 처리액을 회수하기 위한 용기와, 세정액을 상기 용기내로 공급함으로써 용기의 내부 벽 표면을 세정하기 위한 세정 수단과, 용기의 내부 벽 표면이 세정 수단에 의해 세정되는 경우 용기로부터 배출된 액체를 회수하고, 회수된 액체를 세정 수단으로 공급하기 위한 순환 시스템을 포함하는 처리 장치를 제공한다.
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