公开(公告)号：KR1020100096023A

公开(公告)日：2010-09-01

申请号：KR1020100015604

申请日：2010-02-22

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 후지와라마사끼 ,  나가따아쯔시 ,  사다데쯔야

IPC: B05C11/10 ,  B05D1/38 ,  H01L21/027 ,  G03F7/16

CPC classification number: G03F7/16 ,  B05C11/1002 ,  B05D1/38 ,  G03F7/70933 ,  H01L21/67023 ,  H01L21/67028

Abstract: PURPOSE: An apparatus and a method for treating a substrate are provided to prevent the generation of development stains by efficiently performing an operation of collecting a first treatment liquid and substituting the first treatment liquid with a second treatment liquid. CONSTITUTION: An apparatus for treating a substrate comprises: a substrate returning channel(2) for returning a treated substrate(G); a first treatment liquid supply unit for supplying the first treatment liquid to the treated substrate; a gas supply unit(21) for spraying gas steam to the vertical direction or the returning direction of the substrate; a first rinse liquid supply unit(22) for supplying a second treatment liquid to the returned substrate; and a second rinse liquid supply unit(23) for supplying the second treatment liquid to the substrate at a high speed.

Abstract translation: 目的：提供一种用于处理基板的装置和方法，以通过有效地执行收集第一处理液体的操作并用第二处理液代替第一处理液体来防止发生污渍的产生。 构成：用于处理衬底的设备包括：用于使经处理的衬底（G）返回的衬底返回通道（2）; 第一处理液体供应单元，用于将第一处理液体供应到经处理的基板; 用于将气体蒸汽喷射到基板的垂直方向或返回方向的气体供给单元（21） 第一冲洗液体供应单元（22），用于将第二处理液体供应到返回的基板; 以及用于将第二处理液体高速供给到基板的第二冲洗液供给部（23）。

公开(公告)号：KR101677288B1

公开(公告)日：2016-11-17

申请号：KR1020100015604

申请日：2010-02-22

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 후지와라마사끼 ,  나가따아쯔시 ,  사다데쯔야

IPC: B05C11/10 ,  B05D1/38 ,  H01L21/027 ,  G03F7/16

Abstract: 본발명의과제는평류의반송라인상에서피처리기판에공급한제1 처리액을분별회수하여제2 처리액으로치환하는동작을효율적으로원활하게행하여, 현상얼룩의발생을억제하는것이다. 피처리기판(G)을평류반송하는기판반송로(2)와, 상기기판반송로를반송되는피처리기판에제1 처리액을공급하는제1 처리액공급수단(9)과, 상기기판반송로를반송되어, 상기제1 처리액이공급된상기피처리기판에대해, 소정의가스류를연직방향내지반송방향하류측중 어느한쪽을향해분사하는기체공급수단(21)과, 상기기체공급수단에의해가스류가분사되어, 상기기판반송로를반송되는상기피처리기판에대해, 소정의유속으로제2 처리액을공급하는제1 린스액공급수단(22)과, 상기제2 처리액이공급되어, 상기기판반송로를반송되는상기피처리기판에대해, 상기제1 린스액공급수단보다도고유속으로상기제2 처리액을공급하는제2 린스액공급수단(23)을구비한다.

公开(公告)号：KR1020120064039A

公开(公告)日：2012-06-18

申请号：KR1020110130208

申请日：2011-12-07

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사다데쯔야 ,  고또오히데아끼 ,  나가따아쯔시 ,  후지와라마사끼

IPC: H01L21/027 ,  G03F7/30

CPC classification number: G03F7/3064 ,  G03F7/32 ,  G03F7/70916 ,  H01L21/0274

Abstract: PURPOSE: A developing method, a developing apparatus, and a coating and developing processing system including the same are provided to obtain a uniform photo-resist pattern by controlling substrate returning speed when supplying a developing solution and eliminating the developing solution. CONSTITUTION: A first transferring device returns a substrate. An exposed photo-resist film is formed on the surface of the substrate. A blow unit(30D) has a blow nozzle(51) and a third transferring device. The blow nozzle eliminates a developing solution covering the surface of the substrate by discharging gas. The third transferring device returns the substrate toward the blow nozzle. A controller controls the first transferring device and the third transferring device. A rinse unit has a rinse solution supplying nozzle. The rinse solution supplying nozzle supplies a rinse solution to the surface of the substrate in which the developing solution is eliminate.

Abstract translation: 目的：提供一种显影方法，显影装置以及包含该显影方法的涂布显影处理系统，以在提供显影液时控制基板返回速度并除去显影液，以获得均匀的光致抗蚀剂图案。 构成：第一个传送装置返回一个基板。 在基板的表面上形成曝光的光刻胶膜。 吹塑单元（30D）具有吹塑喷嘴（51）和第三转印装置。 喷嘴通过排出气体而消除了覆盖基板表面的显影液。 第三传送装置将基板朝向吹塑喷嘴返回。 控制器控制第一传送装置和第三传送装置。 冲洗单元具有冲洗溶液供应喷嘴。 冲洗溶液供应喷嘴将冲洗溶液提供到其中消除显影液的基底表面。