公开(公告)号：KR1020050113671A

公开(公告)日：2005-12-02

申请号：KR1020057018490

申请日：2004-03-17

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 에스처게리 ,  알렌마크에이 ,  구도야스히사

IPC: H01L21/205

CPC classification number: H01L21/67069 ,  C23C16/4404 ,  H01J37/32477 ,  H01L21/68757

Abstract: Two or more coatings applied to processing elements of a plasma processing system are treated with protective barriers or coatings. A method is described for adjoining two or more coatings on the processing element. Having applied a first protective barrier (520), a portion of the first protective barrier is treated (530). A second protective barrier is then applied over at least a portion of a region to which the first protective barrier was applied (540).

Abstract translation: 涂覆在等离子体处理系统的处理元件上的两个或多个涂层用保护性屏障或涂层处理。 描述了用于邻接处理元件上的两个或更多个涂层的方法。 施加第一保护屏障（520）后，处理第一保护屏障的一部分（530）。 然后在施加第一保护屏障的区域的至少一部分上施加第二保护屏障（540）。

公开(公告)号：KR1020140094475A

公开(公告)日：2014-07-30

申请号：KR1020140007914

申请日：2014-01-22

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 야마구치신 ,  하야시다이스케 ,  구도야스히사

IPC: H01L21/683 ,  H01L21/3065

CPC classification number: H01L21/68742 ,  H01J37/32715 ,  H01J37/32733 ,  H01L21/6831 ,  Y10T279/23

Abstract: The present invention provides a mounting table capable of preventing discharge and a plasma processing apparatus having the mounting table. According to the present invention, the mounting table comprises: an electrostatic chuck having a mounting side on which a processed material is mounted and the other side facing the mounting side having a first through hole in the mounting side; a base combined with the other side of the electrostatic chuck having a second through hole connected to the first through hole; and a lifter pin accommodated in the first through hole and the second through hole, vertically moving to be able to appear and disappear on the mounting side, and supporting the processed material on the mounting side. The upper end of the first through hole has the form whose diameter becomes smaller towards the lower end, and the upper end of the lifter pin has the form whose diameter becomes smaller towards the lower end to correspond to the form of the upper end of the first through hole. The lifter pin surface-contacts the upper end of the first through hole when the lifter pin is accommodated in the first through hole and the second through hole.

Abstract translation: 本发明提供一种能够防止放电的安装台和具有安装台的等离子体处理装置。 根据本发明，安装台包括：静电卡盘，其具有安装侧的安装侧，并且安装侧的另一侧在安装侧具有第一通孔; 与静电卡盘的另一侧结合的底座具有连接到第一通孔的第二通孔; 以及容纳在所述第一通孔和所述第二通孔中的升降器销，其垂直移动以能够在所述安装侧出现并消失，并且将所述处理材料支撑在所述安装侧。 第一通孔的上端具有朝向下端的直径变小的形式，并且提升销的上端具有朝向下端的直径变小的形状，以对应于下端的形状 第一通孔。 当升降器销被容纳在第一通孔和第二通孔中时，升降器销表面接触第一通孔的上端。

公开(公告)号：KR100918528B1

公开(公告)日：2009-09-21

申请号：KR1020057018490

申请日：2004-03-17

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 에스처게리 ,  알렌마크에이 ,  구도야스히사

IPC: H01L21/205

CPC classification number: H01L21/67069 ,  C23C16/4404 ,  H01J37/32477 ,  H01L21/68757

Abstract: 플라즈마 처리시스템의 처리부재들에 행해지는 둘 이상의 코팅은, 보호배리어 또는 보호코팅으로 처리된다. 상기 처리부재 상에 둘 이상의 코팅을 결합하는 방법이 기술된다. 제1보호 배리어가 적용된 후, 상기 제1보호배리어의 일부가 처리된다. 이후, 상기 제1보호배리어가 적용된 영역의 적어도 일부상에 제2보호배리어가 적용된다.