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公开(公告)号:KR101116914B1
公开(公告)日:2012-03-09
申请号:KR1020080033541
申请日:2008-04-11
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/66 , H01L21/324
CPC classification number: G05D23/1935 , H01L21/67109 , H01L21/67248
Abstract: 열처리장치는반응용기와, 반응용기내에설치되어처리분위기를가열하는가열수단과, 처리분위기의온도를검출하는온도검출부와, 가열수단을 PID 제어에의해제어하는제어부를구비하고있다. 제어부는, 처리분위기를목표값까지승온할때의온도특성항목의예측변화량과 PID 상수의변경율을대응시켜작성된룰 테이블과, 온도검출부의온도검출값에기초하여온도프로파일을취득하여이 온도프로파일에기초하여온도특성항목의실측값과목표값의차분을구하는스텝과, 이차분이허용범위로부터벗어나고또한규정값보다도클 때에룰 테이블을참조하여, 차분에따른온도특성항목의예측변화량에대응하는변경율에의해 PID 상수를변경하여재설정하는스텝을차분이허용범위내로될 때까지반복해실시하는실행수단을갖고있다. 제어부는, 온도특성항목의실측변화량과 1회전의사이클에서예측한당해온도특성항목의예측변화량사이에차가있을때에는, 상기실측변화량에기초하여룰 테이블에서의 PID 상수와당해온도특성항목의예측변화량의대응관계를갱신하는갱신수단도갖고있다.
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公开(公告)号:KR1020080092861A
公开(公告)日:2008-10-16
申请号:KR1020080033541
申请日:2008-04-11
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/66 , H01L21/324
CPC classification number: G05D23/1935 , H01L21/67109 , H01L21/67248
Abstract: A heat treatment apparatus and auto-tuning method for a control constant, and a storage medium are provided to tune a PID constant by resetting the PID constant with reference to a temperature profile. A reaction chamber(2) contains a process atmosphere and a target. Heaters(41,42,43,44) are installed in the reaction chamber to heat the process atmosphere. Temperature detectors(TC1,TC2,TC3,TC4) detect the process atmosphere which is heated by the heaters. A controller(7) controls the heaters through a PID control. The controller includes a rule table, an execution unit, and an updating unit. The rule table is prepared by matching an estimated variation amount and a variation rate of a PID constant. The execution unit acquires a temperature profile based on temperature detection values from the temperature detector and repeats a process for obtaining a difference between a measured value and a target value based on the temperature profile and a process for resetting the PID constant a variation rate corresponding to the estimated variation amount, until the difference satisfies a permissible range.
Abstract translation: 提供一种用于控制常数的热处理装置和自动调谐方法以及存储介质,以通过参考温度曲线复位PID常数来调节PID常数。 反应室(2)包含处理气氛和目标物。 加热器(41,42,43,44)安装在反应室中以加热工艺气氛。 温度检测器(TC1,TC2,TC3,TC4)检测加热器加热的工艺气氛。 控制器(7)通过PID控制来控制加热器。 控制器包括规则表,执行单元和更新单元。 通过匹配PID常数的估计变化量和变化率来准备规则表。 执行单元基于来自温度检测器的温度检测值获取温度曲线,并且基于温度曲线重复获得测量值和目标值之间的差异的处理以及用于将PID常数复位的处理与对应于 估计的变化量,直到差异满足允许范围。
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