公开(公告)号：KR1020080044179A

公开(公告)日：2008-05-20

申请号：KR1020070115937

申请日：2007-11-14

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사까모또다까히로 ,  사까이미쯔히로 ,  야히로슌이찌

IPC: G02F1/13 ,  H01L21/027

CPC classification number: G03F7/70858 ,  G02F1/13 ,  H01L21/67207 ,  H01L21/68742

Abstract: A reduced-pressure drying apparatus is provided to inhibit the production of the transfer traces of a substrate contact portion at a coating layer on a substrate minimally. A chamber(106) of a reduced-pressure drying unit(46) is formed by a comparatively flat rectangular body. A space is formed at the inside of the chamber so that a substrate(G) is received. In the carry-in and out direction of the chamber, inlet(110) and outlet(112) with a slit shape are formed at a pair of opposite sidewalls of the chamber. The substrate passes through the inlet and outlet horizontally and narrowly. Gate members(114,116) are attached at the outer wall of the chamber and open and close the inlet and outlet. The upper portion or upper cover of the chamber is removable. Each gate member includes a cover for closing tightly the inlet and outlet with a slit shape.

Abstract translation: 提供减压干燥装置以最小限度地抑制基板接触部分在基板上的涂层上的转印迹线的产生。 减压干燥单元（46）的室（106）由相对扁平的矩形体形成。 在室的内部形成空间，从而接收基板（G）。 在室的进入和离开方向，具有狭缝形状的入口（110）和出口（112）形成在室的一对相对的侧壁处。 基板水平和狭窄地穿过入口和出口。 门构件（114,116）附接在室的外壁处，并打开和关闭入口和出口。 室的上部或上部盖是可拆卸的。 每个门构件包括用于以狭缝形状紧密地封闭入口和出口的盖。