公开(公告)号：KR1020080058227A

公开(公告)日：2008-06-25

申请号：KR1020070134201

申请日：2007-12-20

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사까이미쯔히로 ,  야히로슌이찌 ,  가와우찌다꾸오 ,  고미야히로시

IPC: H01L21/304

CPC classification number: H01L21/67028 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/67706

Abstract: An apparatus for treating a substrate is provided to effectively perform a cleaning process and to realize the cost reduction by preventing attachment of impurities to the substrate. An apparatus for treating a substrate includes a conveying means(111) and a cleaning nozzle(116). A substrate(G) to be processed is loaded on a convey passage(32). The conveying means conveys a substrate to be processed to a predetermined direction through the convey passage. The cleaning nozzle supplies cleaning solution to an upper surface of the substrate to be processed. The convey passage includes a horizontal portion conveying the substrate to be process in a horizontal state and an oblique portion forms an upward slope of a predetermined angle from the horizontal portion. The cleaning nozzle is disposed in an upward direction of the oblique portion.

Abstract translation: 提供了一种用于处理基板的设备，以有效地执行清洁处理，并且通过防止杂质附着到基板来实现成本降低。 一种用于处理基板的设备包括输送装置（111）和清洁喷嘴（116）。 待处理的基板（G）被装载在输送通道（32）上。 输送装置通过输送通道将要处理的基板输送到预定方向。 清洗喷嘴将清洗液供给到被处理基板的上表面。 输送通道包括水平部分，其以水平状态传送要处理的基板，并且倾斜部分形成与水平部分预定角度的向上倾斜。 清洁喷嘴沿倾斜部分的向上方向设置。

公开(公告)号：KR101237126B1

公开(公告)日：2013-02-25

申请号：KR1020060063665

申请日：2006-07-07

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사까이미쯔히로

IPC: H01L21/68 ,  H01L21/027 ,  H01L21/02

Abstract: 본 발명의 과제는 유착 처리에 있어서 처리량 내지 택트의 향상, HMDS 소비량의 절감, 장치 구성의 간이화, 저비용화 및 파티클의 해소를 실현 내지 달성하는 것이다.
이 열적 처리부(26)는 프로세스 라인(A)과 평행한 수평 방향(X 방향)으로 평류 반송로(32)를 마련하고, 이 반송로(32)를 따라서 상류측으로부터 차례로 탈수 베이크 유닛(DHP)(38), 유착 유닛(AD)(40) 및 냉각 유닛(COL)(42)을 설치하고 있다. 유착 유닛(AD)(40)은 유닛 입구 부근에 설치되는 긴형의 HMDS 노즐(98)과, 이 노즐(98)의 하단부 부근의 위치로부터 유닛 출구 부근의 위치까지 반송로(32) 상의 기판(G)과 소정의 갭을 두고 연장되는 상부 커버(100)와, 이들 HMDS 노즐(98) 및 상부 커버(100)와 마주 보고 반송로(32)의 아래로 연장되는 하부 커버(102)를 갖고 있다.
기판 처리 장치, 평류 반송로, 유착 유닛, 탈수 베이크 유닛, HMDS 노즐

Abstract translation: 本发明的目的在于实现或实现吞吐量和生产节拍的改善，HMDS消耗量的减少，设备结构的简化，成本的降低以及粘附过程中颗粒的消除。

公开(公告)号：KR1020080060165A

公开(公告)日：2008-07-01

申请号：KR1020070136193

申请日：2007-12-24

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사까이미쯔히로 ,  데라다다까시 ,  소오마야스따까

IPC: H01L21/677 ,  H01L21/027

CPC classification number: H01L21/677 ,  H01L21/67098 ,  H01L21/67248

Abstract: A substrate processing apparatus is provided to improve throughput and reduce foot print of a dehydration bake processing section by performing the dehydration bake processing in a shorter transfer path than the conventional hydration bake unit using a heat plate heater. A substrate processing apparatus, which performs a hydrophobic process to a processed substrate(G), comprises a transfer unit(80), a dehydration bake unit(38) and an adhesion processing unit(98). The dehydration bake unit dehydrates the surface of the substrate, and heats the substrate by irradiating infrared rays from a heating element(84). The adhesion processing unit hydrates the substrate as hydrophobic by exposing the processed surface of the processed substrate.

Abstract translation: 提供了一种基板处理装置，通过在比使用热板加热器的传统水化烘烤单元更短的传送路径中进行脱水烘烤处理来提高脱水烘烤处理部的生产量和减少脚印。 对处理过的基板（G）进行疏水处理的基板处理装置具有转印单元（80），脱水烘焙单元（38）和粘合处理单元（98）。 脱水烘烤单元使基板的表面脱水，并且通过从加热元件（84）照射红外线来加热基板。 粘合处理单元通过使经处理的基板的经处理的表面曝光而将基板水解成疏水性。

公开(公告)号：KR1020130044172A

公开(公告)日：2013-05-02

申请号：KR1020120116530

申请日：2012-10-19

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가와구찌요시히로 ,  사까이미쯔히로

IPC: H01L21/027

CPC classification number: H01L21/0274 ,  G03F7/2043

Abstract: PURPOSE: A coating processing apparatus is provided to reduce the stay time of an object substrate and the tack time of a process operation. CONSTITUTION: A nozzle(31) includes an outlet extended in the width direction of an object substrate(G). The nozzle discharges a process solution from the outlet to the object substrate. A nozzle transfer unit(32) moves the nozzle upwardly or downwardly. A nozzle maintenance unit(35) is installed in the lower part of a substrate transfer path(4) and controls the outlet of the nozzle. A space formation unit(21,22,23A,23B,30) forms an empty space in the upper and the lower part of a process stage. [Reference numerals] (32) Nozzle transfer unit

Abstract translation: 目的：提供涂布处理装置，以减少对象基板的停留时间和处理操作的粘着时间。 构成：喷嘴（31）包括沿对象基板（G）的宽度方向延伸的出口。 喷嘴将处理液从出口排出到对象基板。 喷嘴传送单元（32）使喷嘴向上或向下移动。 喷嘴维护单元（35）安装在基板输送路径（4）的下部，并控制喷嘴的出口。 空间形成单元（21,22,23A，23B，30）在处理台的上部和下部形成空的空间。 （附图标记）（32）喷嘴转印单元

公开(公告)号：KR1020080044179A

公开(公告)日：2008-05-20

申请号：KR1020070115937

申请日：2007-11-14

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사까모또다까히로 ,  사까이미쯔히로 ,  야히로슌이찌

IPC: G02F1/13 ,  H01L21/027

CPC classification number: G03F7/70858 ,  G02F1/13 ,  H01L21/67207 ,  H01L21/68742

Abstract: A reduced-pressure drying apparatus is provided to inhibit the production of the transfer traces of a substrate contact portion at a coating layer on a substrate minimally. A chamber(106) of a reduced-pressure drying unit(46) is formed by a comparatively flat rectangular body. A space is formed at the inside of the chamber so that a substrate(G) is received. In the carry-in and out direction of the chamber, inlet(110) and outlet(112) with a slit shape are formed at a pair of opposite sidewalls of the chamber. The substrate passes through the inlet and outlet horizontally and narrowly. Gate members(114,116) are attached at the outer wall of the chamber and open and close the inlet and outlet. The upper portion or upper cover of the chamber is removable. Each gate member includes a cover for closing tightly the inlet and outlet with a slit shape.

Abstract translation: 提供减压干燥装置以最小限度地抑制基板接触部分在基板上的涂层上的转印迹线的产生。 减压干燥单元（46）的室（106）由相对扁平的矩形体形成。 在室的内部形成空间，从而接收基板（G）。 在室的进入和离开方向，具有狭缝形状的入口（110）和出口（112）形成在室的一对相对的侧壁处。 基板水平和狭窄地穿过入口和出口。 门构件（114,116）附接在室的外壁处，并打开和关闭入口和出口。 室的上部或上部盖是可拆卸的。 每个门构件包括用于以狭缝形状紧密地封闭入口和出口的盖。

公开(公告)号：KR101891349B1

公开(公告)日：2018-08-24

申请号：KR1020120116530

申请日：2012-10-19

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가와구찌요시히로 ,  사까이미쯔히로

IPC: H01L21/027

Abstract: 처리동작의택트타임을단축할수 있고, 또한노즐의메인터넌스처리에기인하는피처리기판의오염을방지한다. 피처리기판(G)의폭방향으로연장되는토출구를갖고, 상기처리스테이지상의상기기판의상방을기판반송방향을따라이동되는동시에, 상기토출구로부터상기기판상에처리액을토출하는노즐(31)과, 상기노즐을승강이동가능하며, 상기노즐을기판반송방향상류측또는하류측을향해서이동가능한노즐이동수단(32)과, 기판반송로(4)의하방에설치되고, 상기노즐의토출구의상태를조정하는노즐메인터넌스수단(35)과, 상기기판반송로에있어서상기처리스테이지의상류측또는하류측에소정길이의빈 구간(d)을출몰가능하게형성가능한빈 구간형성수단(21, 22, 23A, 23B, 30)을구비한다.

公开(公告)号：KR1020130039696A

公开(公告)日：2013-04-22

申请号：KR1020120112933

申请日：2012-10-11

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사까이미쯔히로 ,  가와구찌요시히로

IPC: H01L31/18 ,  H01L31/04

CPC classification number: Y02E10/50 ,  Y02P70/521 ,  H01L31/18 ,  H01L31/04

Abstract: PURPOSE: An apparatus and a method for forming a film are provided to reduce a footprint and the length of a process line at the same time and to improve productivity. CONSTITUTION: A coat process unit(6) horizontally transfers a substrate(G) and sprays a coating solution at the same time. The coating solution is discharged from a nozzle having a long outlet to the substrate. A first thermal unit(11) heats the substrate including a coating layer with a first heating temperature. A second thermal unit(12) heats the substrate with a second heating temperature. A drying buffer unit(7) sprays gas to the coating layer in order to evaporate a solvent formed on the coating film.

Abstract translation: 目的：提供一种用于形成薄膜的设备和方法，以同时缩短生产线的覆盖面和长度，并提高生产率。 构成：涂层处理单元（6）水平传送基板（G）并同时喷涂涂层溶液。 涂布溶液从具有长出口的喷嘴排出到基板。 第一热单元（11）加热包括具有第一加热温度的涂层的基板。 第二热单元（12）以第二加热温度加热基板。 干燥缓冲单元（7）将气体喷射到涂层以便蒸发涂膜上形成的溶剂。

公开(公告)号：KR1020070093845A

公开(公告)日：2007-09-19

申请号：KR1020070024367

申请日：2007-03-13

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가지와라히로노부 ,  사까이미쯔히로 ,  가끼노아끼라

IPC: B65G49/06 ,  H01L21/68 ,  H01L21/67

Abstract: A substrate buffer device, a method of buffering a substrate, a substrate processing apparatus, and a computer readable storage medium are provided to prevent the dispersion of particles and to improve a throughput. A substrate buffer device includes a shelf portion(5), an elevator, a controller, a conveyor, and a detector(105). The shelf portion is moved to a conveying line. The shelf portion includes plural loading frames for loading a substrate to the conveying line. The elevator elevates the shelf portion to move one of the plural loading frames to the conveying line. The controller controls an elevation of the shelf portion by the elevator based on a detection signal of the detector. The conveyor conveys the substrate along a conveying direction when the plural loading frames are moved to the conveying line. The detector is provided at an upstream of the conveying direction to be spaced apart from the loading frames, and detects the substrate conveyed to the conveying line.

Abstract translation: 提供衬底缓冲装置，缓冲衬底的方法，衬底处理装置和计算机可读存储介质，以防止颗粒的分散并提高生产量。 衬底缓冲装置包括搁架部分（5），电梯，控制器，传送器和检测器（105）。 搁板部分移动到输送线。 搁架部分包括用于将基板装载到输送线的多个装载框架。 电梯提升架子部分，使多个装载框架中的一个移动到传送线。 控制器基于检测器的检测信号控制电梯的货架部分的高度。 当多个装载架移动到输送线时，输送机沿输送方向输送基板。 检测器设置在输送方向的上游，与装载框架间隔开，并且检测输送到输送线的基板。

公开(公告)号：KR101268261B1

公开(公告)日：2013-05-31

申请号：KR1020070024367

申请日：2007-03-13

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가지와라히로노부 ,  사까이미쯔히로 ,  가끼노아끼라

IPC: B65G49/06 ,  H01L21/68 ,  H01L21/67

Abstract: 기판버퍼장치(36)는반송라인(A)에진출가능하고, 또한반송라인(A)을반송된기판(G)을적재가능한적재대(5a 내지 5f)를상하로복수단갖는선반부(5)와, 선반부(5)를승강시켜적재대(5a 내지 5f) 중어느하나를반송라인(A)에진출시키는승강기구(6)를구비하고, 각적재대(5a 내지 5f)는반송라인(A)에진출하였을때에, 기판(G)을반송방향을따라반송하는컨베이어기구(50a 내지 50f)를갖고반송라인(A)의일부로서기능하고, 반송라인(A)에진출하고있는적재대(5a)에반송라인(A)을반송되어온 기판(G)을적재하고, 승강기구(6)에의해선반부(5)가승강되어기판(G)을적재대(5a)와함께반송라인(A)으로부터퇴피시킨다.

公开(公告)号：KR1020130044171A

公开(公告)日：2013-05-02

申请号：KR1020120116526

申请日：2012-10-19

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가와구찌요시히로 ,  사까이미쯔히로 ,  다나까겐사꾸 ,  가나모리하루또

IPC: H01L21/677 ,  G02F1/13 ,  H01L21/027 ,  B05C5/00

CPC classification number: H01L21/67721 ,  B05C5/004 ,  G02F1/1303 ,  H01L21/0273 ,  H01L21/67748

Abstract: PURPOSE: A processing stage apparatus and a coating processing apparatus using the same are provided to prevent the contamination of an object substrate due to the maintenance process of a nozzle. CONSTITUTION: A substrate receiving part(2) includes a first substrate transfer unit(5B) which horizontally moves a substrate(G), and a first reciprocation unit(10). A first reciprocation unit moves the first substrate transfer unit in a substrate transfer direction. A substrate process unit includes a stage(15), a second substrate transfer unit(16), and a second reciprocation unit(24,25). A second substrate transfer unit moves up and down on the loading surface of a stage. A second reciprocation unit elevates the second substrate transfer unit on the loading surface of the stage. A substrate discharging unit includes a third substrate transfer part(29) and a third reciprocation unit(30).

Abstract translation: 目的：提供一种处理台装置和使用其的涂布处理装置，以防止由于喷嘴的维护过程而导致的对象基板的污染。 构成：基板收纳部（2）具有水平移动基板（G）的第一基板搬送单元（5B）和第一往复运动单元（10）。 第一往复运动单元使基板传送单元沿基板传送方向移动。 基板处理单元包括台（15），第二基板转印单元（16）和第二往复单元（24,25）。 第二基板传送单元在载物台的载荷表面上上下移动。 第二往复运动单元将第二基板输送单元提升在载物台的载荷表面上。 基板排出单元包括第三基板转印部（29）和第三往复运动单元（30）。