公开(公告)号：KR1020110025121A

公开(公告)日：2011-03-09

申请号：KR1020100084777

申请日：2010-08-31

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 야히로슌이찌 ,  사다데쯔야 ,  구보마꼬또

IPC: H01L21/027

CPC classification number: H01L21/0274 ,  G03F7/2041 ,  G03F7/70975

Abstract: PURPOSE: A developing device and a developing method are provided to reduce non-uniformity in a developing process by setting a transfer speed of a substrate with a discharge timing of developers from a second development nozzle. CONSTITUTION: A first development nozzle coats developers from the front to the rear of a substrate transferred on a transfer path. A substrate information obtaining unit(20) obtains information about a substrate process. A second development nozzle(13) moves along the transfer path of the lower side of the first development nozzle. A nozzle moving unit moves the second development nozzle. A control unit(25) controls the driving of the nozzle moving unit and the second development nozzle.

Abstract translation: 目的：提供显影装置和显影方法，以通过从第二显影喷嘴设置显影剂的排出时间来设置基板的转印速度来减少显影过程中的不均匀性。 构成：第一个开发喷嘴将显影剂从传输路径上转移的基板的前面到后面涂覆。 基板信息获取单元（20）获得关于基板处理的信息。 第二显影喷嘴（13）沿着第一显影喷嘴的下侧的传送路径移动。 喷嘴移动单元移动第二显影喷嘴。 控制单元（25）控制喷嘴移动单元和第二显影喷嘴的驱动。

公开(公告)号：KR1020080044179A

公开(公告)日：2008-05-20

申请号：KR1020070115937

申请日：2007-11-14

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사까모또다까히로 ,  사까이미쯔히로 ,  야히로슌이찌

IPC: G02F1/13 ,  H01L21/027

CPC classification number: G03F7/70858 ,  G02F1/13 ,  H01L21/67207 ,  H01L21/68742

Abstract: A reduced-pressure drying apparatus is provided to inhibit the production of the transfer traces of a substrate contact portion at a coating layer on a substrate minimally. A chamber(106) of a reduced-pressure drying unit(46) is formed by a comparatively flat rectangular body. A space is formed at the inside of the chamber so that a substrate(G) is received. In the carry-in and out direction of the chamber, inlet(110) and outlet(112) with a slit shape are formed at a pair of opposite sidewalls of the chamber. The substrate passes through the inlet and outlet horizontally and narrowly. Gate members(114,116) are attached at the outer wall of the chamber and open and close the inlet and outlet. The upper portion or upper cover of the chamber is removable. Each gate member includes a cover for closing tightly the inlet and outlet with a slit shape.

Abstract translation: 提供减压干燥装置以最小限度地抑制基板接触部分在基板上的涂层上的转印迹线的产生。 减压干燥单元（46）的室（106）由相对扁平的矩形体形成。 在室的内部形成空间，从而接收基板（G）。 在室的进入和离开方向，具有狭缝形状的入口（110）和出口（112）形成在室的一对相对的侧壁处。 基板水平和狭窄地穿过入口和出口。 门构件（114,116）附接在室的外壁处，并打开和关闭入口和出口。 室的上部或上部盖是可拆卸的。 每个门构件包括用于以狭缝形状紧密地封闭入口和出口的盖。

公开(公告)号：KR1020110132995A

公开(公告)日：2011-12-09

申请号：KR1020110053168

申请日：2011-06-02

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가와구찌요시히로 ,  사따께마사노리 ,  야히로슌이찌

IPC: H01L21/027

CPC classification number: H01L21/0274 ,  G03F1/60 ,  G03F7/202

Abstract: PURPOSE: A thermal processing device, a thermal processing method, and a recording medium are provided to suppress a change of a thermal processing temperature and make the line width of a wiring pattern between substrates uniform. CONSTITUTION: A substrate returning path(2) transfers a substrate(G) in X direction. The substrate returning path includes a cylindrical roller(20) which is expanded in Y direction. A chamber(8) forms a thermal processing space. The chamber includes a first chamber for forming a thermal processing space of a pre-heating unit(4) and a second chamber for forming a thermal processing space of a main heater unit. An outlet has a slit shape. The outlet is placed on the rear wall of the chamber.

Abstract translation: 目的：提供热处理装置，热处理方法和记录介质，以抑制热处理温度的变化，并使基板之间的布线图案的线宽均匀。 构成：基板返回路径（2）在X方向上传送基板（G）。 基板返回路径包括在Y方向上扩展的圆筒滚子（20）。 室（8）形成热处理空间。 该室包括用于形成预热单元（4）的热处理空间的第一室和用于形成主加热器单元的热处理空间的第二室。 出口具有狭缝形状。 出口被放置在室的后壁上。

公开(公告)号：KR1020110065310A

公开(公告)日：2011-06-15

申请号：KR1020100101606

申请日：2010-10-19

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 오오따요시하루 ,  모또다기미오 ,  야히로슌이찌 ,  가와우찌다꾸오

IPC: G02F1/13 ,  H01L21/02

CPC classification number: G02F1/1303 ,  H01L21/67034 ,  H01L21/6715 ,  H01L21/67703

Abstract: PURPOSE: A substrate processing device, a substrate processing method, and program for executing the substrate processing method are provided not to increase a device cost and to prevent occurrence of an evenness of film thickness of a spraying film which is formed by a dry processing. CONSTITUTION: A substrate processing device includes as follows. A carrier way carries the substrate to one direction in one state which processed surface of the substrate to be faced up. A flotation stage(110) dry processes the substrate. A first supply source supplies the gas to the discharge hole.

Abstract translation: 目的：提供一种用于执行基板处理方法的基板处理装置，基板处理方法和程序，其不会增加装置成本，并且防止通过干式加工形成的喷涂膜的膜厚的均匀性。 构成：基板处理装置包括如下。 承载方式将衬底沿一个方向运送到一个状态，该状态处理衬底面朝上的表面。 漂浮阶段（110）干燥处理基材。 第一供应源将气体供应到排放孔。

公开(公告)号：KR1020080058227A

公开(公告)日：2008-06-25

申请号：KR1020070134201

申请日：2007-12-20

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사까이미쯔히로 ,  야히로슌이찌 ,  가와우찌다꾸오 ,  고미야히로시

IPC: H01L21/304

CPC classification number: H01L21/67028 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/67706

Abstract: An apparatus for treating a substrate is provided to effectively perform a cleaning process and to realize the cost reduction by preventing attachment of impurities to the substrate. An apparatus for treating a substrate includes a conveying means(111) and a cleaning nozzle(116). A substrate(G) to be processed is loaded on a convey passage(32). The conveying means conveys a substrate to be processed to a predetermined direction through the convey passage. The cleaning nozzle supplies cleaning solution to an upper surface of the substrate to be processed. The convey passage includes a horizontal portion conveying the substrate to be process in a horizontal state and an oblique portion forms an upward slope of a predetermined angle from the horizontal portion. The cleaning nozzle is disposed in an upward direction of the oblique portion.

Abstract translation: 提供了一种用于处理基板的设备，以有效地执行清洁处理，并且通过防止杂质附着到基板来实现成本降低。 一种用于处理基板的设备包括输送装置（111）和清洁喷嘴（116）。 待处理的基板（G）被装载在输送通道（32）上。 输送装置通过输送通道将要处理的基板输送到预定方向。 清洗喷嘴将清洗液供给到被处理基板的上表面。 输送通道包括水平部分，其以水平状态传送要处理的基板，并且倾斜部分形成与水平部分预定角度的向上倾斜。 清洁喷嘴沿倾斜部分的向上方向设置。