公开(公告)号：KR1020080068581A

公开(公告)日：2008-07-23

申请号：KR1020080005483

申请日：2008-01-18

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사까이미쯔히로 ,  미야자끼가즈히또 ,  시오자끼겐지 ,  고메다히로시

IPC: H01L21/677

CPC classification number: H01L21/67706 ,  B65G39/02 ,  B65G49/063 ,  H01L21/67736 ,  H01L21/68714 ,  H01L21/68742

Abstract: A substrate conveying apparatus is provided to improve through-put of substrate processing by using a small substrate conveyer. A substrate conveyer receives a substrate from an arm supporting the substrate, and conveys the substrate to a processing device. The substrate conveyer includes roller conveyers(120) and an elevator(118). The roller conveyers convey a substrate in a horizontal direction, and are disposed in two stages. The elevator elevates the roller conveyers of the two stages. A vessel(110) receives the roller conveyers of the two stages and the elevator. Carry holes(111,115) are formed in a side surface of the vessel, and carries the substrate. Discharge hole(112,116) discharge the substrate. An inner temperature of the processing device is greater than that of the vessel. An exhaust hole(113) is formed in a lower side of the vessel, and exhausts atmosphere in the vessel.

Abstract translation: 提供基板输送装置，以通过使用小的基板输送器来改善基板处理的通过。 基板输送机从支撑基板的臂接收基板，并将基板输送到处理装置。 基板输送机包括辊式输送机（120）和电梯（118）。 辊式输送机在水平方向上输送基板，分两个阶段布置。 电梯提升了两级的辊式输送机。 容器（110）容纳两级的辊式输送机和电梯。 携带孔（111,115）形成在容器的侧面，并承载基板。 放电孔（112,116）放电衬底。 处理装置的内部温度大于容器的内部温度。 在容器的下侧形成排气孔（113），排出容器内的气氛。