公开(公告)号：KR1020110020731A

公开(公告)日：2011-03-03

申请号：KR1020100077208

申请日：2010-08-11

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 심무라사토시 ,  후쿠오카테츠오 ,  키타노타카히로

IPC: H01L21/027

CPC classification number: C23C16/24 ,  C23C16/4485 ,  H01L21/0274

Abstract: PURPOSE: A hydrophobicizing apparatus, a hydrophobicizing method, and a storage medium are provided to supply high concentration hydrophobic gases to a substrate by increasing the efficiency of evaporating a liquid medicine. CONSTITUTION: In a hydrophobicizing apparatus, a hydrophobicizing method, and a storage medium, an evaporation surface heating portion(62) heats an evaporation surface shaping region(65). A medicine liquid supply port(58) supplies a hydrophobic medicine liquid to the surface of the substrate of the evaporation surface shaping region. A gas inlet port introduces carrier gases within a vaporization chamber. An outlet port(68) extracts hydrophobic gases from the vaporization chamber. A processing container performs hydrophobolic process by using extracted hydrophobic gases.

Abstract translation: 目的：提供疏水化装置，疏水化方法和储存介质，以通过提高蒸发液体药物的效率将高浓度疏水性气体提供给基底。 构成：在疏水化装置中，疏水化方法和储存介质，蒸发表面加热部分（62）加热蒸发表面成形区域（65）。 药液供给口（58）向蒸发面成形区域的基板的表面供给疏水性药液。 气体入口在气化室内引入载气。 出口端口（68）从蒸发室提取疏水性气体。 处理容器通过使用提取的疏水性气体进行疏水过程。

公开(公告)号：KR101656333B1

公开(公告)日：2016-09-09

申请号：KR1020100077208

申请日：2010-08-11

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 심무라사토시 ,  후쿠오카테츠오 ,  키타노타카히로

IPC: H01L21/027

CPC classification number: C23C16/24 ,  C23C16/4485

Abstract: 약액의기화효율이높아고농도의소수화가스를기판으로공급할수 있고, 또한약액의열화를억제할수 있는소수화처리장치를제공한다. 기화실내에표면이위치하는기화면형성부와, 이기화면형성부를가열하기위한기화면가열수단과, 상기기화면형성부의표면에소수화처리용의약액을공급하기위한약액공급포트와, 캐리어가스를상기기화실내로도입하기위한가스도입포트와, 소수화가스를취출하기위한취출포트와, 상기취출포트로부터공급된소수화가스를기판으로공급하는처리용기를구비하도록소수화처리장치를구성한다. 이구성에의해기판으로고농도의소수화가스를공급할수 있고, 처리를행하지않을때에는저장된약액이캐리어가스에접촉하는일이없으므로, 약액의열화가억제된다.