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公开(公告)号:KR1020030078936A
公开(公告)日:2003-10-08
申请号:KR1020037011125
申请日:2002-03-20
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: C23C16/46
Abstract: 열처리 장치의 처리 용기(1) 내에 배치되는 열전대(42)의 표면에 반사 방지 막(50)을 설치하고, 열전대(42)의 과도적 응답 특성을 개선한다. 전형적인 실시예에 있어서는, 열전대(42)는 백금 소선(43A) 및 백금 로듐 합금 소선(43B)을 결합하여 구성되고, 반사 방지막(50)은 실리콘 니트라이드층(50C), 실리콘층(50B) 및 실리콘 니트라이드층(50A)을 차례로 적층하여 구성된다.
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公开(公告)号:KR1020050091691A
公开(公告)日:2005-09-15
申请号:KR1020057001826
申请日:2002-09-27
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/205 , H01L21/324
Abstract: A heat treatment method comprising a step of accommodating a holder with a plurality of works placed in multiple stage in the vertical direction in a treatment vessel and a step of performing a predetermined heat treatment by performing heating by a heating means. A specific target amount of heat generated by the heating means for performing the heat treatment of the works is determined in advance. A heat treatment device has the heat treatment vessel and a control temperature and a correction temperature sensor which are provided in the heat treatment vessel. The correction temperature sensor comprises a protective pipe body part extending in the vertical direction and a plurality of branch pipe parts extending in the horizontal direction from the protective pipe body part. A thermocouple is disposed on each branch pipe part, and the branch pipe parts are inserted between the works in height positions different from each other.
Abstract translation: 一种热处理方法,包括在处理容器中容纳具有沿垂直方向放置在多级中的多个工件的保持器的步骤,以及通过由加热装置进行加热来执行预定热处理的步骤。 预先确定由用于进行工件的热处理的加热装置产生的特定目标热量。 热处理装置具有设置在热处理容器内的热处理容器和控制温度和校正温度传感器。 校正温度传感器包括沿垂直方向延伸的保护管体部分和从保护管体部分沿水平方向延伸的多个分支管部分。 在每个支管部分上设置热电偶,并且将分支管部分插入在工件之间彼此不同的高度位置。
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