公开(公告)号：KR1020090131251A

公开(公告)日：2009-12-28

申请号：KR1020090052392

申请日：2009-06-12

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 사다데츠야 ,  오가타즈네모토 ,  나가타아츠시

IPC: H01L21/302 ,  H01L21/677 ,  H01L21/304

CPC classification number: H01L21/67017 ,  H01L21/302 ,  H01L21/67706 ,  H01L21/67715 ,  H01L21/67736

Abstract: PURPOSE: A substrate processing apparatus and a substrate processing method are provided to suppress a development mark by efficiently changing a first processing liquid provided to a substrate to be processed with a second processing liquid. CONSTITUTION: In a device, a conveying line(2) includes a first return section(M1), a second return section(M2), and a third return section(M3). A return driving unit operates a roller to transfer a substrate on a conveying line. A first processing liquid supplies a first processing solution to the substrate within the first return section. A second processing solution supply unit(13) supplies a second processing solution to the substrate within the third return section. An elevating unit forms an inclined convey line which is continued from the first return section by transferring the roller installed at the second return section.

Abstract translation: 目的：提供一种基板处理装置和基板处理方法，通过用第二处理液有效地改变设置在待处理基板上的第一处理液来抑制显影标记。 构成：在装置中，传送线（2）包括第一返回部分（M1），第二返回部分（M2）和第三返回部分（M3）。 返回驱动单元操作辊子以在输送线路上传送基板。 第一处理液体将第一处理溶液供应到第一返回部分内的基板。 第二处理溶液供应单元（13）将第二处理溶液供应到第三返回部分内的基板。 升降单元形成倾斜的输送线，该输送线通过传送安装在第二返回部分的滚子而从第一返回部分继续。