측정 장치, 기판 처리 시스템 및 측정 방법
    2.
    发明公开
    측정 장치, 기판 처리 시스템 및 측정 방법 审中-实审
    测量装置,基板处理系统和测量方法

    公开(公告)号:KR1020150029545A

    公开(公告)日:2015-03-18

    申请号:KR1020140111396

    申请日:2014-08-26

    Abstract: The present invention relates to a measuring apparatus, a substrate processing system, and a measuring method which promotes light weight and is not expensive. The measuring apparatus according to an embodiment includes a transfer unit, an imaging unit, and a measuring unit. The transfer unit transfers a substrate formed with a pattern, the imaging unit is positioned above the transfer unit, and takes an image of the pattern on the substrate. The measuring unit measures the shape of the pattern on the basis of the image information of the pattern taken by the imaging unit.

    Abstract translation: 本发明涉及促进重量轻并且不昂贵的测量装置,基板处理系统和测量方法。 根据实施例的测量装置包括传送单元,成像单元和测量单元。 转印单元传送形成有图案的基板,成像单元位于转印单元上方,并将图案的图像作为基板。 测量单元基于由成像单元拍摄的图案的图像信息来测量图案的形状。

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