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公开(公告)号：KR1020150029545A
公开(公告)日：2015-03-18
申请号：KR1020140111396
申请日：2014-08-26
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: G01N21/956 , G01B11/24 , G06T7/60
Abstract: The present invention relates to a measuring apparatus, a substrate processing system, and a measuring method which promotes light weight and is not expensive. The measuring apparatus according to an embodiment includes a transfer unit, an imaging unit, and a measuring unit. The transfer unit transfers a substrate formed with a pattern, the imaging unit is positioned above the transfer unit, and takes an image of the pattern on the substrate. The measuring unit measures the shape of the pattern on the basis of the image information of the pattern taken by the imaging unit.
Abstract translation: 本发明涉及促进重量轻并且不昂贵的测量装置，基板处理系统和测量方法。 根据实施例的测量装置包括传送单元，成像单元和测量单元。 转印单元传送形成有图案的基板，成像单元位于转印单元上方，并将图案的图像作为基板。 测量单元基于由成像单元拍摄的图案的图像信息来测量图案的形状。
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公开(公告)号：KR1020130036700A
公开(公告)日：2013-04-12
申请号：KR1020120080534
申请日：2012-07-24
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/302
CPC classification number: G03F7/3057 , H01L21/67051
Abstract: PURPOSE: An apparatus and method for processing a substrate are provided to prevent a developer from being undulated by separately collecting a first processing solution and smoothly substituting the first processing solution for a second processing solution. CONSTITUTION: A first processing solution supply unit supplies a first processing solution to a substrate(G). A gas supply unit(21) supplies a preset gas to the surface of the substrate in which the first processing solution is collected. A second rinse nozzle discharges a second processing solution to the surface of the substrate. A first rinse nozzle(22) discharges the second processing solution to the surface of the substrate to which the gas is supplied. A solution collecting unit(27) forms a solution collected part extended in a width direction of the substrate on a substrate transfer path by the second processing solution supplied by the first rinse nozzle.
Abstract translation: 目的：提供一种用于处理基板的装置和方法，以通过分开收集第一处理溶液并平滑地将第一处理溶液代替第二处理溶液来防止显影剂波动。 构成：第一处理溶液供应单元向基板（G）提供第一处理溶液。 气体供给单元（21）将预先设定的气体供给到收集第一处理液的基板的表面。 第二冲洗喷嘴将第二处理溶液排出到基板的表面。 第一冲洗喷嘴（22）将第二处理溶液排放到供给气体的基板的表面。 溶液收集单元（27）通过由第一冲洗喷嘴提供的第二处理溶液在基板输送路径上形成在基板的宽度方向上延伸的溶液收集部分。
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公开(公告)号：KR102206500B1
公开(公告)日：2021-01-21
申请号：KR1020140111396
申请日：2014-08-26
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: G01N21/956 , G06T7/00 , G01B11/24
Abstract: 본발명은경량화를도모할수 있고, 저렴한측정장치, 기판처리시스템및 측정방법을제공하는것을목적으로한다. 실시형태의일 형태에따른측정장치는, 반송부와, 촬상부와, 측정부를구비한다. 반송부는패턴이형성된기판을반송한다. 촬상부는반송부의상방에배치되며, 반송부에배치된기판의패턴을촬상한다. 또한, 측정부는촬상부에의해촬상된패턴의화상정보에기초하여패턴의형상을측정한다.
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