현상 장치 및 현상 방법
    2.
    发明公开
    현상 장치 및 현상 방법 有权
    开发设备和开发方法

    公开(公告)号:KR1020070007262A

    公开(公告)日:2007-01-15

    申请号:KR1020067012793

    申请日:2004-12-24

    Abstract: A development liquid nozzle is moved from an outer edge of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a development liquid is being discharged from the development liquid nozzle, and this way the development liquid is supplied to the surface of the wafer, the development nozzle having a slit-like discharge opening whose longitudinal direction is oriented to the direction perpendicular to the radial direction of the wafer. The movement speed of the nozzle is higher than a case where a nozzle with a small-diameter circular nozzle is used, and this enables a development time to be reduced. Further, the thickness of a development liquid on a substrate can be reduced, so that the development liquid can be saved. ® KIPO & WIPO 2007

    Abstract translation: 显影液喷嘴从晶片的外边缘向中心部分移动,同时保持在旋转卡盘处的暴露的基板绕垂直轴线旋转并且显影液体从显影液喷嘴排出,并且以这种方式 显影液被供给到晶片的表面,显影喷嘴具有狭缝状排出口,其纵向方向取向于与晶片的径向垂直的方向。 喷嘴的移动速度高于使用具有小直径圆形喷嘴的喷嘴的情况,这使得能够减少显影时间。 此外,可以减少基板上的显影液的厚度,从而可以节省显影液。 ®KIPO&WIPO 2007

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