公开(公告)号：KR1020080048917A

公开(公告)日：2008-06-03

申请号：KR1020070101991

申请日：2007-10-10

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 야마모토타로 ,  다카구치야스시 ,  후지모토아키히로 ,  교우다히데하루 ,  기타노준이치 ,  미야하라오사무 ,  츠츠미겐지

IPC: H01L21/027 ,  H01L21/31 ,  H01L21/304 ,  G03F7/16

CPC classification number: H01L21/6715 ,  H01L21/67178 ,  H01L21/67276 ,  G03F7/16 ,  G03F7/7085 ,  H01L21/67046 ,  H01L21/67098

Abstract: A coating film forming apparatus and a coating film forming method are provided to prevent defocus due to particles on a rear surface of a substrate by inspecting a state of the particles on the rear surface and an edge of a substrate. A processing unit includes one or more coating units for applying a resist film or applying the resist film and an additional film on a substrate, and one or more thermally processing units for performing a thermal process necessary for forming the coating film on the substrate. A pre-coating cleaning unit cleans at least a rear surface and an edge of the substrate before transferring the substrate into the processing unit. A pre-coating check unit checks a state of a rear surface and an edge of the substrate before transferring the substrate into the processing unit. A control unit(20) inspects the substrate before the coating process, determines a state of particles in the rear surface and the edge of the substrate on the basis of the inspected results, and transfers the substrate according to the determined results.

Abstract translation: 提供一种涂膜形成装置和涂膜形成方法，用于通过检查基板的后表面和边缘上的颗粒的状态来防止由于颗粒在基板的后表面上的散焦。 处理单元包括用于施加抗蚀剂膜或将抗蚀剂膜和附加膜施加在基板上的一个或多个涂覆单元和用于进行在基板上形成涂膜所需的热处理的一个或多个热处理单元。 在将基板转移到处理单元之前，预涂层清洁单元至少清洁基板的后表面和边缘。 在将基板转移到处理单元之前，预涂层检查单元检查基板的后表面和边缘的状态。 控制单元（20）在涂布处理前检查基板，根据检查结果确定基板的后表面和边缘中的颗粒的状态，并根据确定的结果传送基板。

公开(公告)号：KR101070342B1

公开(公告)日：2011-10-06

申请号：KR1020070101991

申请日：2007-10-10

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 야마모토타로 ,  다카구치야스시 ,  후지모토아키히로 ,  교우다히데하루 ,  기타노준이치 ,  미야하라오사무 ,  츠츠미겐지

IPC: H01L21/027 ,  H01L21/31 ,  H01L21/304 ,  G03F7/16

CPC classification number: H01L21/6715 ,  H01L21/67178 ,  H01L21/67276

Abstract: 레지스트막노광전에기판에대하여레지스트막등으로이루어지는도포막을형성하는도포막형성장치는, 기판(W)에도포처리등을행하는처리부와, 기판을처리부에반입하기전에적어도기판의이면및 에지부를세정하는도포전 세정유닛과, 기판을처리부에반입하기전에기판(W)의이면및 에지부의상태를검사하는검사유닛과, 세정후, 검사유닛에서기판의검사를행하고, 그검사결과에기초하여기판의이면및 에지부에서의파티클상태가허용범위인지여부를판단하여, 허용범위였던경우에상기처리부에의기판의반입을허용하고, 허용범위로부터벗어난경우에상기도포전 세정유닛에서기판의세정을행하고나서처리부에의기판의반입을허용하는제어부를갖는다.