公开(公告)号：KR1020100120975A

公开(公告)日：2010-11-17

申请号：KR1020090039887

申请日：2009-05-07

Applicant: 삼성모바일디스플레이주식회사

Inventor： 강태욱 ,  김우현 ,  지창순 ,  조현래 ,  안성국 ,  이정열 ,  박재목

IPC: H01J37/32 ,  H01L51/56 ,  H05B33/26

CPC classification number: H01L51/0029 ,  H01J37/20 ,  H01J37/32091 ,  H01J37/32568 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/20235

Abstract: PURPOSE: An apparatus for processing plasma is provided to constantly etch the surface of a substrate by maintaining the uniformity of plasma in a chamber. CONSTITUTION: A substrate is arranged in a chamber. A first electrode(104) is arranged in the chamber and is spaced apart from the lower side of the substrate. A second electrode(105) is arranged in the chamber and is spaced apart from the upper side of the substrate. A gap regulating unit(102) regulates a gap between the first electrode and the substrate or a gap between the second electrode and the substrate.

Abstract translation: 目的：提供一种用于处理等离子体的装置，以通过维持室中的等离子体的均匀性来恒定地蚀刻基板的表面。 构成：衬底布置在腔室中。 第一电极（104）布置在腔室中并与衬底的下侧隔开。 第二电极（105）布置在腔室中并与衬底的上侧隔开。 间隙调节单元（102）调节第一电极和衬底之间的间隙或第二电极和衬底之间的间隙。

公开(公告)号：KR101050463B1

公开(公告)日：2011-07-20

申请号：KR1020090039887

申请日：2009-05-07

Applicant: 삼성모바일디스플레이주식회사

Inventor： 강태욱 ,  김우현 ,  지창순 ,  조현래 ,  안성국 ,  이정열 ,  박재목

IPC: H01J37/32 ,  H01L51/56 ,  H05B33/26

CPC classification number: H01L51/0029 ,  H01J37/20 ,  H01J37/32091 ,  H01J37/32568 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/20235

Abstract: A substrate plasma-processing apparatus for plasma-processing a surface of an electrode of an organic light emitting device. The substrate plasma-processing apparatus may adjust the distance between a first electrode and a substrate and adjust the distance between a second electrode and the substrate.