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公开(公告)号：KR1020130142281A
公开(公告)日：2013-12-30
申请号：KR1020120065357
申请日：2012-06-19
Applicant: 삼성전자주식회사
CPC classification number: F24C15/322 , F24C15/006 , F24C15/2007
Abstract: Disclosed is an electronic part chamber cooling structure of an oven capable of increasing the space of a kitchen by lowering the height of an electronic part chamber. According to an embodiment of the present invention, the electronic part chamber cooling structure comprises a fan which forces to circulate air in an electronic part chamber; a motor which operates the fan; an exhaust duct which guides the air in the electronic part chamber to the front side of an oven; and a supporting bracket which is to install the motor at an inlet of the exhaust duct. The supporting bracket comprises a base unit which is supported to the exhaust duct around the inlet; a motor combination unit where the core or the motor is put and supported; and a bridge unit which connects the base unit and the motor combination unit. The bottom of the motor combination unit has the same height as the top of the exhaust duct or lower.
Abstract translation: 公开了一种能够通过降低电子部件室的高度来增加厨房空间的烤箱的电子部件室冷却结构。 根据本发明的一个实施例，电子部件室冷却结构包括一个迫使气流循环在电子部件室中的风扇; 操作风扇的电机; 将电子部件室内的空气引导到烤箱前侧的排气管道; 以及将马达安装在排气管的入口处的支撑托架。 所述支撑托架包括基座单元，所述基座单元被支撑在所述入口周围的所述排气管道上; 一个电机组合单元，其中放置和支撑铁芯或电机; 以及连接基座单元和电动机组合单元的桥接单元。 电机组合单元的底部具有与排气管道顶部相同的高度或较低的高度。
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2.发明公开인접한 부유게이트들 사이의 갭 영역들을 채우는 금속막을 구비하는 제어게이트 전극을 갖는 반도체 소자들 및 그 제조방법들 无效具有控制栅电极的半导体器件，包括在相邻浮动栅之间填充间隙的金属层及其制造方法
公开(公告)号：KR1020120047119A
公开(公告)日：2012-05-11
申请号：KR1020100108825
申请日：2010-11-03
Applicant: 삼성전자주식회사
IPC: H01L27/115 , H01L21/8247
CPC classification number: H01L27/11521 , H01L21/28273 , H01L27/11526 , H01L29/42324 , H01L29/66825
Abstract: PURPOSE: Semiconductor devices having a control gate electrode including a metal layer filling a gap region between adjacent floating gates and fabricating methods thereof are provided to improve a program characteristic and an erasing characteristic by preventing a depletion layer from being formed in a lowermost metal layer of a control gate electrode. CONSTITUTION: An element isolation layer(11a) limiting a plurality of active regions(1a) is formed on a fixed region of a semiconductor substrate(1). A control gate electrode(30) chooses a metal layer as a lowermost layer. A floating gate(17a) is arranged between the active region and the control gate electrode. Floating gates provide a gap region on an element isolation film between the floating gates. A gate interlayer insulation layer(24) is formed between the floating gates and the control gate electrode.
Abstract translation: 目的：提供具有包括填充相邻浮动栅极之间的间隙区域的金属层的控制栅电极及其制造方法的半导体器件，以通过防止在最下层金属层中形成耗尽层来改善程序特性和擦除特性 控制栅电极。 构成：在半导体衬底（1）的固定区域上形成限制多个有源区（1a）的元件隔离层（11a）。 控制栅电极（30）选择金属层作为最下层。 在有源区和控制栅电极之间布置有浮栅（17a）。 浮动栅极在浮动栅极之间的元件隔离膜上提供间隙区域。 在浮置栅极和控制栅电极之间形成栅极层间绝缘层（24）。
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公开(公告)号：KR101085901B1
公开(公告)日：2011-11-23
申请号：KR1020060094956
申请日：2006-09-28
Applicant: 삼성전자주식회사
CPC classification number: F24C15/022 , E05F1/1276 , E05F5/02 , E05F5/08 , E05Y2201/21 , E05Y2201/22 , E05Y2201/408 , E05Y2201/47 , E05Y2900/308 , F24C7/085 , Y10T16/2796 , Y10T16/287 , Y10T16/304 , Y10T16/585
Abstract: 본 발명은 가열조리기에 관한 것으로서, 사용자가 도어를 직접 당기지 않고도 도어의 자동개방이 가능함으로써 사용자의 편리성을 제고할 수 있는 가열조리기를 제공하는데 그 목적이 있다.
이러한 목적을 달성하기 위한 본 발명은 조리실이 마련된 본체와; 상기 조리실을 개폐하도록 상기 본체에 회동가능하게 마련된 도어와; 상기 도어의 조리실 밀폐상태를 유지시키기 위하여 상기 도어를 지지할 수 있도록 상기 본체에 마련되는 도어지지부와; 상기 도어와 상기 본체를 연결하며 상기 도어지지부의 도어 지지상태가 해제되는 경우 상기 도어가 자동적으로 개방되도록 도어의 회동운동을 안내하는 힌지부를 포함하는 것을 특징으로 하는 가열조리기를 제공하고 있다.-
公开(公告)号：KR100834440B1
公开(公告)日：2008-06-04
申请号：KR1020060111181
申请日：2006-11-10
Applicant: 삼성전자주식회사
IPC: H01L21/336 , H01L29/78 , H01L21/3213 , H01L21/28
CPC classification number: H01L21/3086 , H01L21/3088 , H01L21/823437 , H01L27/105 , H01L29/66621
Abstract: 반도체 소자의 형성방법이 제공된다. 상기 반도체 소자의 형성방법은 셀 영역과 주변 영역을 포함하는 반도체 기판을 준비하는 것, 상기 반도체 기판 상에 제 1 마스크막을 형성하는 것, 상기 셀 영역의 상기 제 1 마스크막 상에, 상기 제 1 마스크막을 노출하는 제 1 하드 마스크 패턴들을 형성하는 것, 상기 제 1 하드 마스크 패턴들을 콘포멀하게 덮는 제 2 마스크막을 형성하는 것, 상기 제 1 하드 마스크 패턴들 사이에, 상기 제 2 마스크막의 측면과 접하는 제 2 하드 마스크 패턴을 형성하는 것, 상기 제 1 하드 마스크 패턴들과 상기 제 2 하드 마스크 패턴 사이의 제 2 마스크막을 제거하는 것 그리고 상기 제 1 하드 마스크 패턴들과 상기 제 2 하드 마스크 패턴을 마스크로 식각 공정을 진행하여 상기 셀 영역의 상기 반도체 기판에 트렌치들을 형성하는 것을 포함한다.
마스크막, 트렌치, 게이트 전극Abstract translation: 提供了一种形成半导体器件的方法。 一种形成半导体器件的方法包括：准备包括单元区域和外围区域的半导体衬底;在半导体衬底上形成第一掩模膜;在单元区域中的第一掩模膜上， 形成共形地覆盖第一硬掩模图案的第二掩模膜;在第二掩模膜和第二硬掩模图案的侧表面之间形成第二掩模膜， 去除第一硬掩模图案和第二硬掩模图案之间的第二掩模膜并去除第一硬掩模图案和第二硬掩模图案， 并且利用掩模进行蚀刻工艺以在单元区域中的半导体衬底中形成沟槽。
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公开(公告)号：KR100825801B1
公开(公告)日：2008-04-29
申请号：KR1020070015086
申请日：2007-02-13
Applicant: 삼성전자주식회사
IPC: H01L21/3213 , H01L21/027
CPC classification number: H01L21/31144 , H01L21/0337 , H01L21/0338 , Y10S438/942 , Y10S438/946 , Y10S438/947 , H01L21/0332
Abstract: A method for manufacturing a semiconductor device is provided to form accurately fine patterns by performing a double patterning method. A first material layer having a first thickness is formed on a target layer. A second material layer having a second thickness is formed on the first material layer. A first pattern of a third material layer having line and space patterns is formed on the second material layer. A first pattern of the second material layer is formed by etching the second material layer. A first pattern of the first material layer is formed by etching the exposed first material layer. A second pattern of the second material layer having a fourth thickness and a fifth thickness is formed on the first pattern of the first material layer and the first pattern of the second material layer. A second pattern of the third material layer is formed on the second pattern(40b) of the second material layer. A third pattern of the second material layer is formed by etching the second pattern of the second material layer and the first pattern of the second material layer. A second pattern(3b) of the first material layer is formed by etching the first pattern of the first material layer. The target layer exposed by the etch mask including the second pattern of the first material layer is etched.
Abstract translation: 提供一种制造半导体器件的方法，通过进行双重图案化方法来精确地形成精细图案。 在目标层上形成具有第一厚度的第一材料层。 在第一材料层上形成具有第二厚度的第二材料层。 在第二材料层上形成具有线和间隔图案的第三材料层的第一图案。 通过蚀刻第二材料层形成第二材料层的第一图案。 通过蚀刻暴露的第一材料层来形成第一材料层的第一图案。 具有第四厚度和第五厚度的第二材料层的第二图案形成在第一材料层的第一图案和第二材料层的第一图案上。 在第二材料层的第二图案（40b）上形成第三材料层的第二图案。 通过蚀刻第二材料层的第二图案和第二材料层的第一图案来形成第二材料层的第三图案。 通过蚀刻第一材料层的第一图案来形成第一材料层的第二图案（3b）。 蚀刻由包括第一材料层的第二图案的蚀刻掩模暴露的目标层。
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Patent Agency Ranking
公开(公告)号：KR1020080029728A
公开(公告)日：2008-04-03
申请号：KR1020070011856
申请日：2007-02-05
Applicant: 삼성전자주식회사
Abstract: A cooking apparatus and a control method thereof are provided to allow temperature of a heating unit to be easily recognized through a temperature display apparatus by installing the temperature display apparatus above the heating unit. A cooking apparatus comprises a body(104) provided with heating units(110-113). A control panel(116) is installed at the upper portion of the body. A temperature display unit(152) is provided at the control panel to display the temperature of the heating units by changing a color of the temperature display unit. The temperature display unit displays a temperature section of preset temperature sections, to which the present temperature of the heating units belongs, by changing the color of the temperature display unit. The preset temperature sections belong to a maximum heating temperature range of the heating units.
Abstract translation: 提供一种烹调设备及其控制方法，通过将温度显示装置安装在加热单元的上方，通过温度显示装置容易地识别加热单元的温度。 烹饪设备包括设置有加热单元（110-113）的主体（104）。 控制面板（116）安装在身体的上部。 温度显示单元（152）设置在控制面板处，通过改变温度显示单元的颜色来显示加热单元的温度。 温度显示单元通过改变温度显示单元的颜色来显示加热单元的当前温度所属的预设温度段的温度段。 预设温度段属于加热单元的最大加热温度范围。
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公开(公告)号：KR1020080029202A
公开(公告)日：2008-04-03
申请号：KR1020060094956
申请日：2006-09-28
Applicant: 삼성전자주식회사
CPC classification number: F24C15/022 , E05F1/1276 , E05F5/02 , E05F5/08 , E05Y2201/21 , E05Y2201/22 , E05Y2201/408 , E05Y2201/47 , E05Y2900/308 , F24C7/085 , Y10T16/2796 , Y10T16/287 , Y10T16/304 , Y10T16/585 , F24C15/023 , E05D11/10 , F24C7/043 , F24C7/082 , F24C15/027 , F24C15/028
Abstract: A heating cooker is provided to allow a door to be automatically opened while a support operation of a door support is being released through a one-touch operation when a user puts foods into a cooking chamber or takes the foods out of the cooking chamber. A heating cooker comprises a body(1) having a cooking chamber(3). A door(11) rotates in the body such that the cooking chamber is opened and closed. A door support(17) is provided at the body to support the door such that a sealing state of the cooking chamber is maintained. A hinge section(13) connects the door with the body, and guides angular motion of the door such that the door is automatically opened when a door support state of the door support is released. The door support includes a locking hook and a driving motor for moving the locking hook. A locking groove is formed in the door for locking with the locking groove.
Abstract translation: 当用户将食物放入烹饪室或将食物从烹饪室中取出时，提供加热烹调器以允许门被自动打开，同时通过一触式操作来释放门支架的支撑操作。 一种加热烹调器包括具有烹饪室（3）的主体（1）。 门（11）在主体中旋转，使得烹饪室被打开和关闭。 门体支撑件（17）设置在主体处以支撑门，从而保持烹饪室的密封状态。 铰链部分（13）将门与主体连接，并且引导门的角运动，使得当门支撑件的门支撑状态被释放时门自动打开。 门支撑件包括锁定钩和用于移动锁定钩的驱动电机。 在门中形成有用于与锁定槽锁定的锁定槽。
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公开(公告)号：KR100780351B1
公开(公告)日：2007-11-30
申请号：KR1020060094443
申请日：2006-09-27
Applicant: 삼성전자주식회사
Abstract: A cooker is provided to prevent erroneous operation of the cooker by preventing a touch glass from moving even over long period of use. A cooker includes a main body and an electrical component unit(60). The electrical component unit includes an electrical component unit frame(61), a printed circuit board unit(70), a touch glass(80), a control panel(63), a support rib(74), and a touch glass bracket(90). The electrical component unit frame is mounted to one side of the main body. The printed circuit board unit is arranged in the electrical component unit frame. The touch glass is arranged in front of the printed circuit board unit. The control panel is arranged in front of the touch glass. The support rib is mounted on a front surface of the electrical component unit frame so as to support a rear surface and top and bottom surfaces of the touch glass. The touch glass bracket tightens the touch glass onto the electrical component unit frame.
Abstract translation: 提供炊具以通过防止触摸玻璃在长时间使用中移动来防止炊具的错误操作。 炊具包括主体和电气部件单元（60）。 电气部件单元包括电气部件单元框架（61），印刷电路板单元（70），触摸玻璃（80），控制面板（63），支撑肋（74）和触摸玻璃支架 90）。 电气部件单元框架安装在主体的一侧。 印刷电路板单元布置在电气部件单元框架中。 触摸玻璃布置在印刷电路板单元的前面。 控制面板布置在触摸玻璃的前面。 支撑肋安装在电气部件单元框架的前表面上，以支撑触摸玻璃的后表面和顶表面和底表面。 触摸玻璃支架将触摸玻璃板拧紧到电气元件单元框架上。
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公开(公告)号：KR100771891B1
公开(公告)日：2007-11-01
申请号：KR1020060111225
申请日：2006-11-10
Applicant: 삼성전자주식회사
IPC: H01L21/027
CPC classification number: H01L21/0337 , H01L21/0338 , H01L21/31144 , H01L21/76816 , H01L21/76897 , G03F7/70466 , H01L21/32139 , H01L21/76802
Abstract: A method of forming fine patterns in a semiconductor device is provided to form contact patterns in good CD(Critical Dimension) uniformity by using a double patterning process, and to determine freely a shape and a position of first hard mask patterns, second hard mask patterns and mask patterns. Plural first hard mask patterns(130) are formed on a layer to be etched on a semiconductor substrate(100), and extend in a first direction. Each of second hard mask patterns(150a) is formed between adjacent first hard mask patterns, and is spaced apart from the hard mask pattern by a buffer layer(140). Plural mask patterns(160) extend over the first and second hard mask patterns in a second direction. An exposed buffer layer is etched to form a hole exposing the layer to be etched, and then the exposed layer is etched to form plural contact holes on the layer.
Abstract translation: 提供了一种在半导体器件中形成精细图案的方法，以通过使用双重图案化工艺形成良好的CD（临界尺寸）均匀性的接触图案，并且自由地确定第一硬掩模图案的形状和位置，第二硬掩模图案 和掩模图案。 多个第一硬掩模图案（130）形成在半导体衬底（100）上待蚀刻的层上，并沿第一方向延伸。 第二硬掩模图案（150a）中的每一个形成在相邻的第一硬掩模图案之间，并且通过缓冲层（140）与硬掩模图案间隔开。 多个掩模图案（160）在第二方向上在第一和第二硬掩模图案上延伸。 蚀刻暴露的缓冲层以形成暴露待蚀刻层的孔，然后蚀刻暴露层以在该层上形成多个接触孔。
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公开(公告)号：KR1020060129126A
公开(公告)日：2006-12-15
申请号：KR1020050049766
申请日：2005-06-10
Applicant: 삼성전자주식회사
IPC: F24C7/04
Abstract: A steam generating apparatus and an oven including the apparatus are provided to promptly generate steam by heating water filled in a water tank in an induction heating method. A steam generating apparatus includes a water tank(20), an induction coil(40), first and second induction heating plates(41,42), a barrier(50), and a cover(60). The first and second induction heating plates are adjacent to side surfaces of insertion grooves of the water tank to be induction-heated by the induction coil. The barrier is disposed in the interior of the water tank so that only some of the water can be directly heated by the first and second induction heating plates. The cover closes an upper portion of the water tank.
Abstract translation: 提供包括该装置的蒸汽发生装置和烘箱，以通过以感应加热方法加热填充在水箱中的水来迅速产生蒸汽。 蒸汽发生装置包括水箱（20），感应线圈（40），第一和第二感应加热板（41,42），屏障（50）和盖（60）。 第一感应加热板和第二感应加热板与水箱的插入槽的侧面相邻，由感应线圈进行感应加热。 隔壁设置在水箱的内部，使得只有一些水可以被第一和第二感应加热板直接加热。 盖子关闭水箱的上部。
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