公开(公告)号：KR1020080006090A

公开(公告)日：2008-01-16

申请号：KR1020060064792

申请日：2006-07-11

Applicant: 삼성전자주식회사

Inventor： 김진성 ,  김대현 ,  김자현 ,  문석훈 ,  백홍주 ,  이재혁

IPC: H01L21/02

CPC classification number: H01L21/02282 ,  H01L21/56 ,  H01L21/6715

Abstract: A guide cup of an apparatus for coating a wafer is provided to prevent or suppress an NRD(Negative Resist Developer) solution from being dropped to a surface of the wafer. A guide cup(100) of an apparatus for coating a wafer is provided in a standard cup. The standard cup is used for coating the wafer by injecting chemicals to a top part of the wafer. An inclination angle between an inner periphery(132) and an outer periphery(134) is substantially 68 degrees. The guide cup of the apparatus for coating the wafer is cut so that the inclination angle between the inner periphery and the outer periphery is larger than 60 degrees. A diameter of the inner periphery of the cup guide is formed larger than 205.6cm. The diameter of the inner periphery is substantially 215.6cm. A height of the guide cup is substantially 24.8cm.

Abstract translation: 提供了一种用于涂覆晶片的装置的引导杯，以防止或抑制NRD（阴性抗蚀剂显影剂）溶液滴落到晶片的表面。 用于涂覆晶片的装置的引导杯（100）设置在标准杯中。 标准杯用于通过将化学品注入到晶片的顶部来涂覆晶片。 内周（132）与外周（134）之间的倾斜角大致为68度。 切割用于涂覆晶片的装置的引导杯，使得内周和外周之间的倾斜角度大于60度。 杯形引导件的内周的直径形成为大于205.6cm。 内周的直径大致为215.6cm。 引导杯的高度基本上为24.8cm。

公开(公告)号：KR1020030060522A

公开(公告)日：2003-07-16

申请号：KR1020020001256

申请日：2002-01-09

Applicant: 삼성전자주식회사

Inventor： 문석훈

IPC: H01L21/02

Abstract: PURPOSE: A gas supply device for semiconductor fabrication equipment is provided to prevent change of gas supply by forming equally each diameter of gas supply tubes installed between a gas storage tank and a plurality of process chambers. CONSTITUTION: A gas supply device for semiconductor fabrication equipment includes a gas storage tank(125), a gas bombe box(120), and a plurality of gas supply tubes(130). The gas storage tank is used for storing process gases. The gas bombe is used for providing the process gases to a plurality of process chambers(110-116) by keeping the gas storage tank and controlling the pressure and the flow rate of the process gases. The gas supply tubes are used for connecting the gas storage tank to the process chambers in order to supply the process gases to the process chambers. The gas supply tubes have the same diameter.

Abstract translation: 目的：提供一种用于半导体制造设备的气体供应装置，用于通过形成安装在储气罐和多个处理室之间的气体供应管等同的每个直径来防止气体供应的变化。 构成：用于半导体制造设备的气体供应装置包括气体储存箱（125），气体保护箱（120）和多个气体供给管（130）。 储气罐用于储存工艺气体。 气体炸弹用于通过保持储气罐并控制工艺气体的压力和流速来将处理气体提供给多个处理室（110-116）。 气体供应管用于将气体储存罐连接到处理室，以将处理气体供应到处理室。 气体供应管具有相同的直径。

公开(公告)号：KR1020020016072A

公开(公告)日：2002-03-04

申请号：KR1020000049199

申请日：2000-08-24

Applicant: 삼성전자주식회사

Inventor： 문석훈

IPC: H01L21/68

Abstract: PURPOSE: A loadlock chamber of equipment for fabricating a semiconductor is provided to prevent a wafer protruded from a wafer cassette from colliding against an inlet of a slot valve, by making two sensing units sense the wafer protruded from the wafer cassette. CONSTITUTION: A cassette elevator(110) has a load stage on which the wafer cassette(10) is placed. The sensing unit(130) senses the semiconductor wafer(12) slided and protruded from the wafer cassette. The semiconductor wafer separated or protruded from the wafer cassette placed on the wafer cassette is prevented from being damaged.

Abstract translation: 目的：提供一种用于制造半导体的设备的装载室，以通过使两个感测单元感测从晶片盒突出的晶片来防止从晶片盒突出的晶片与槽阀的入口碰撞。 构成：盒式电梯（110）具有装载台，放置晶片盒（10）。 感测单元（130）感测从晶片盒滑动并突出的半导体晶片（12）。 防止从放置在晶片盒上的晶片盒分离或突出的半导体晶片被损坏。

公开(公告)号：KR1020010010806A

公开(公告)日：2001-02-15

申请号：KR1019990029891

申请日：1999-07-23

Applicant: 삼성전자주식회사

Inventor： 문석훈

IPC: B01D53/00

CPC classification number: B01D47/00 ,  B01D53/78 ,  B04C9/00

Abstract: PURPOSE: Devised is the prevention method on accumulation of solid sate material in the rear zone of the gas scrubber. CONSTITUTION: The exhaust system for accumulation prevention of solid state material comprises the following parts: blower (21') having a large scale in order to reduce the accumulation of the material in rear area of line; two vessels (15') for storage of the solid material; valve (17') that connects with cyclone (13') and vessel for changing of the vessel.

Abstract translation: 目的：设计在气体洗涤器后区积聚固体物质的预防方法。 构成：用于固态材料积聚防止排气系统包括以下部件：具有大规模的鼓风机（21'），以减少材料在后部区域中的积聚; 用于储存固体材料的两个容器（15'）; 与旋风分离器（13'）连接的阀（17'）和用于改变容器的容器。