公开(公告)号：KR1020080037353A

公开(公告)日：2008-04-30

申请号：KR1020060104333

申请日：2006-10-26

Applicant: 삼성전자주식회사

Inventor： 최봉 ,  우창우 ,  윤해근 ,  장유석 ,  최재훈

IPC: H01L21/304

Abstract: A method for dispensing slurry of a CMP and an apparatus thereof are provided to maximize the use efficiency of slurry by widely diffusing the slurry in a polishing pad while making it to a fine particle. A method for dispensing slurry of a CMP supplies the slurry between friction surfaces of a wafer and a polishing pad(20), the wafer is pressed in one side of the polishing pad at a predetermined pressure by a polishing head(30). The slurry is widely supplied between friction surfaces of the polishing pad and the wafer by widely dispensing the slurry from an upper surface of the polishing pad to a center portion thereof, the wafer is pressed to the polishing pad. The slurry is dispensed from the polishing pad to one side of the polishing pad within the same diameter as that of the wafer in a radial direction.

Abstract translation: 提供一种用于分配CMP的浆料的方法及其装置，以通过在抛光垫中将浆料广泛地分散在细颗粒中来使浆料的使用效率最大化。 用于分配CMP的浆料的方法在晶片的摩擦表面和抛光垫（20）之间提供浆料，通过抛光头（30）以预定的压力将晶片压在抛光垫的一侧。 通过从抛光垫的上表面广泛分配浆料到其中心部分，将浆料广泛地供应在抛光垫的摩擦表面和晶片之间，将晶片压到抛光垫。 将浆料从抛光垫分配到抛光垫的一侧，其直径与晶片的径向相同。

公开(公告)号：KR1020080063945A

公开(公告)日：2008-07-08

申请号：KR1020070000578

申请日：2007-01-03

Applicant: 삼성전자주식회사

Inventor： 이상열 ,  최봉 ,  우창우 ,  윤해근

IPC: H01L21/68

CPC classification number: G01N21/9505 ,  H01L22/12

Abstract: An apparatus for inspecting semiconductor wafers is provided to prevent productivity reduction due to the damage of wafers by selecting wafers having chipping defects using sensor and light emitting units. An apparatus for inspecting semiconductor wafers includes a main body(110), a rotation roller(120), a sensor unit(130), and a light emitting unit. The main body includes a wafer cassette for mounting wafers. The rotation roller installed at the main body to contact with a periphery of the wafers rotates the wafers. The sensor unit adjacent to the rotation roller detects chipping which is formed in the respective wafers. The light emitting unit adjacent to the sensor unit radiates beams to the respective wafers with an angle.

Abstract translation: 提供了用于检查半导体晶片的装置，以通过使用传感器和发光单元选择具有切屑缺陷的晶片来防止由于晶片的损坏而导致的生产率降低。 用于检查半导体晶片的装置包括主体（110），旋转辊（120），传感器单元（130）和发光单元。 主体包括用于安装晶片的晶片盒。 安装在主体上以与晶片的周边接触的旋转辊旋转晶片。 与旋转辊相邻的传感器单元检测形成在各个晶片中的碎裂。 与传感器单元相邻的发光单元以一定角度将光束辐射到相应的晶片。

公开(公告)号：KR1020030047278A

公开(公告)日：2003-06-18

申请号：KR1020010077728

申请日：2001-12-10

Applicant: 삼성전자주식회사

Inventor： 윤해근 ,  양윤식 ,  최지영

IPC: H01L21/203

Abstract: PURPOSE: A sputtering apparatus is provided to be capable of preventing the contamination of a semiconductor substrate due to the generation of foreign substance by uniformly conserving the temperature of a quartz window by using a halogen lamp. CONSTITUTION: A layer is formed on a substrate(900) by a sputtering process in a sputtering chamber(200). A plate(202) for loading the substrate(900) is located opposite to the front surface of a target(204) in the sputtering chamber(200). A quartz window(208) is installed on the upper portion of the sputtering chamber. An induction coil(210) is installed to surround the quartz window for supplying electric field into the sputtering chamber through the quartz window. A heating part is installed at the upper portion of the sputtering chamber for uniformly conserving the temperature of the quartz window which is non-uniformly heated by RF(Radio Frequency) power supplied from the induction coil. Preferably, the heating part is provided with a halogen lamp(218) and a reflecting plate(220) for reflecting the beam irradiated from the halogen lamp to the quartz window.

Abstract translation: 目的：提供一种溅射装置，通过使用卤素灯均匀地保持石英窗的温度，能够防止由于异物的产生而导致的半导体衬底的污染。 构成：通过溅射工艺在溅射室（200）中在衬底（900）上形成层。 用于装载基板（900）的板（202）位于溅射室（200）中与靶（204）的前表面相对的位置。 在溅射室的上部安装有石英窗（208）。 感应线圈（210）安装成围绕石英窗，用于通过石英窗提供溅射室中的电场。 在溅射室的上部设有加热部，用于均匀地保持由感应线圈供给的RF（射频）功率不均匀地加热的石英窗的温度。 优选地，加热部分设置有用于将从卤素灯照射的光束反射到石英窗的卤素灯（218）和反射板（220）。

公开(公告)号：KR1020030046607A

公开(公告)日：2003-06-18

申请号：KR1020010076800

申请日：2001-12-06

Applicant: 삼성전자주식회사

Inventor： 윤해근 ,  이창락

IPC: H01L21/00

Abstract: PURPOSE: An alarm device for semiconductor fabrication process is provided to indicate rapidly processing states and processing errors of semiconductor fabrication apparatuses to workers by using an alarm panel including alarm lamps, LEDs, and buzzers. CONSTITUTION: A plurality of fabrication apparatuses(202) are installed within a working area(200) in order to fabricate semiconductor devices. An alarm panel(214) is connected to a plurality of alarm signal generation portions(204) in order to generate alarm signals according to processing errors. An alarm portion(206) is installed at the alarm panel in order to indicate processing states and the processing errors of the fabrication apparatuses according to the alarm signal. The alarm portion includes a plurality of alarm lamps or LEDs(216) and a plurality of buzzers(218) connected to the alarm signal generation portion. A signal converter(212) is used for converting the alarm signals to driving signals.

Abstract translation: 目的：提供一种用于半导体制造工艺的报警装置，通过使用包括报警灯，LED和蜂鸣器的报警面板来向工人指示半导体制造装置的快速处理状态和处理错误。 构成：为了制造半导体器件，在工作区域（200）内安装多个制造装置（202）。 报警面板（214）连接到多个报警信号产生部分（204），以便根据处理错误产生报警信号。 在报警面板上安装报警部分（206），以便根据报警信号指示制造装置的处理状态和处理错误。 报警部分包括多个报警灯或LED（216）和连接到报警信号产生部分的多个蜂鸣器（218）。 信号转换器（212）用于将报警信号转换为驱动信号。

公开(公告)号：KR1020010064306A

公开(公告)日：2001-07-09

申请号：KR1019990064474

申请日：1999-12-29

Applicant: 삼성전자주식회사

Inventor： 윤해근 ,  윤명식 ,  박용우

IPC: H01L21/68

Abstract: PURPOSE: Semiconductor equipment for preventing damage to a loaded/unloaded wafer is provided to stops closing a door, by making a Solenoid valve for switching the door stop operating in a direction for closing the door of a process chamber when the wafer is not in a stand-by position for loading/unloading. CONSTITUTION: Semiconductor equipment has a process chamber, a wafer detecting sensor and a control unit. The process chamber has a switching door, coping with a wafer by an arbitrary process. Wafer detecting sensors are respectively installed in the switching doors. The control unit detects whether the sensor is located in a stand-by position of the wafer, and stops closing the door to prevent damage to the wafer if the wafer is not in the stand-by position.

Abstract translation: 目的：提供用于防止对装载/卸载晶片造成损坏的半导体设备，以通过制造用于切换门停止的电磁阀在用于关闭处理室的门的方向上操作的电磁阀，当晶片不在 待机/卸载的备用位置。 构成：半导体设备具有处理室，晶片检测传感器和控制单元。 处理室具有开关门，通过任意处理与晶片对应。 晶圆检测传感器分别安装在开关门中。 控制单元检测传感器是否位于晶片的待机位置，并且如果晶片不处于待机位置，则停止关闭门以防止损坏晶片。

公开(公告)号：KR1020080059715A

公开(公告)日：2008-07-01

申请号：KR1020060133361

申请日：2006-12-26

Applicant: 삼성전자주식회사

Inventor： 윤해근

IPC: H01L21/68

Abstract: An apparatus for detecting an error of a wafer mapping sensor of a semiconductor manufacturing system is provided to prevent a malfunction in a mapping process by detecting a fixed state of the wafer mapping sensor correctly. A mapping sensor(102) is installed at one side of a main body(100). The mapping sensor includes a plurality of protrusions having a comb shape in order to sense mapping states of plural wafers in a carrier simultaneously. A plurality of test links(106) are moved in a vertical direction to be positioned across a gap between the protrusions of the mapping sensor. A plurality of hinges(108) are attached to the main body in order to hinge the test links. A test link driving bar(118) drives the test links. An LED driver is formed to drive a plurality of LEDs(112) according to a mapping sense signal of the mapping sensor.

Abstract translation: 提供一种用于检测半导体制造系统的晶片映射传感器的误差的装置，以通过正确地检测晶片映射传感器的固定状态来防止映射处理中的故障。 映射传感器（102）安装在主体（100）的一侧。 映射传感器包括具有梳状形状的多个突起，以便同时检测载体中的多个晶片的映射状态。 多个测试链路（106）在垂直方向上移动以跨越映射传感器的突起之间的间隙。 多个铰链（108）附接到主体以铰接测试连杆。 测试链路驱动杆（118）驱动测试链路。 形成LED驱动器，以根据映射传感器的映射感测信号驱动多个LED（112）。

公开(公告)号：KR1020030092157A

公开(公告)日：2003-12-06

申请号：KR1020020029347

申请日：2002-05-27

Applicant: 삼성전자주식회사

Inventor： 윤해근 ,  서영호

IPC: H01L21/02

Abstract: PURPOSE: A fluid supply apparatus is provided to be capable of detecting the switching state of a valve of a fluid supply line. CONSTITUTION: A fluid supply apparatus is provided with a process fluid supply line(214) for supplying process fluid to a process chamber(230), the first valve(216) installed at the process fluid supply line for switching the process fluid supply line, an operation fluid supply line(224) connected with the first valve for supplying operation fluid to the first valve, and the second valve(226) installed at the operation fluid supply line for switching the operation fluid supply line. The fluid supply apparatus further includes a detecting part(260) connected with the first and second valve for detecting the switching state of the first valve according to the switching state of the second valve. Preferably, the fluid supply apparatus further includes an alarming part(270) for generating an alarming signal according to the detection result of the detecting part.

Abstract translation: 目的：提供一种能够检测流体供应管线的阀的切换状态的流体供应装置。 构成：流体供应装置设置有用于向处理室（230）供应过程流体的过程流体供应管线（214），安装在过程流体供应管线处用于切换过程流体供应管线的第一阀门（216） 与第一阀连接的用于向第一阀供应运行流体的操作流体供给管线（224），以及安装在操作流体供给管线处的用于切换操作流体供给管线的第二阀（226）。 流体供给装置还包括与第一阀和第二阀连接的检测部（260），用于根据第二阀的切换状态检测第一阀的开关状态。 优选地，所述流体供给装置还包括用于根据所述检测部的检测结果生成报警信号的报警部（270）。

公开(公告)号：KR100422900B1

公开(公告)日：2004-03-12

申请号：KR1020010025554

申请日：2001-05-10

Applicant: 삼성전자주식회사

Inventor： 금경수 ,  양윤식 ,  홍형식 ,  안금찬 ,  윤해근 ,  정병식 ,  최기철

IPC: G01B5/004

CPC classification number: H01L21/68 ,  H01J2237/20292 ,  H01J2237/31701

Abstract: An apparatus for use in orienting an object at a reference angle includes a pin gauge having at least two projections located at an end of the body of the apparatus. The projections are located at certain X Y coordinates of an X, Y Z Cartesian coordinate system. A horizontal support supports the body so as to be movable horizontally in the longitudinal direction of the projections. A mechanical drive member is operable to move the body mechanically in the horizontal direction. The apparatus may also include a vertical support and vertical drive member. The pin gauge is mechanically moved into contact with a surface of an object to provide a reference angle for the object. Then the object is pivoted, if necessary, to bring the surface into point contact with all of the projections of the pin gauge, whereupon the object is oriented at the reference angle. Process errors in aligning the object using the reference angle are reduced because the orienting of the object at the reference angle is accomplished using mechanical elements.

Abstract translation: 用于以参考角度定向物体的设备包括具有至少两个位于设备主体端部的凸起的销规。 投影位于X，Y Z笛卡尔坐标系的某些X Y坐标处。 水平支撑件支撑主体以便在突起的纵向方向上水平移动。 机械驱动构件可操作以在水平方向上机械地移动主体。 该设备还可以包括垂直支撑和垂直驱动构件。 销规机械地移动到与物体的表面接触以提供物体的参考角度。 然后，如果需要的话，将物体转动以使表面与销规的所有突出物点接触，于是物体以参考角度定向。 使用参考角度对准对象时的处理误差减小，因为在参考角度处的对象的定向是使用机械元件完成的。

公开(公告)号：KR1020020085980A

公开(公告)日：2002-11-18

申请号：KR1020010025554

申请日：2001-05-10

Applicant: 삼성전자주식회사

Inventor： 금경수 ,  양윤식 ,  홍형식 ,  안금찬 ,  윤해근 ,  정병식 ,  최기철

IPC: G01B5/004

CPC classification number: H01L21/68 ,  H01J2237/20292 ,  H01J2237/31701

Abstract: PURPOSE: A reference angle supply apparatus is provided to minimize process error caused due to the movement of the apparatus, by accurately setting an object for measurement on the basis of a reference angle. CONSTITUTION: A reference angle supply apparatus(30) comprises a main body(300); pin gauges(310) protruded from the surface of an end of the main body, at portions set by X-axis coordinates and Y-axis coordinates, respectively. Each of pin gauges contacts surface of an object for measurement, and supplies a preset reference angle, to thereby correct the object by the preset reference angle. The apparatus further comprises a main body support(320) for supporting the main body, and which has a horizontal guide(320a) for moving the main body in a horizontal direction when pin gauges contact the object for measurement. The main body support has a surface which is processed to have a uniformity of 1 micron meter or smaller, such that the pin gauge is substantially parallel to a bottom of a chamber.

Abstract translation: 目的：提供一种参考角度供给装置，用于通过基于参考角准确地设定用于测量的物体来最小化由于装置的移动而引起的处理误差。 构成：参考角供给装置（30）包括主体（300）; 分别从X轴坐标和Y轴坐标设定的部分从主体的端部的表面突出的销量规（310）。 每个针规与物体的表面接触测量，并提供预设的参考角度，从而通过预设的参考角度校正物体。 该装置还包括用于支撑主体的主体支撑件（320），并且当销量与接触物体接触以进行测量时，该主体支撑件（320）具有用于沿水平方向移动主体的水平导向件（320a）。 主体支撑具有被加工成具有1微米或更小的均匀度的表面，使得销规与基座平行。