公开(公告)号：KR1020010036544A

公开(公告)日：2001-05-07

申请号：KR1019990043606

申请日：1999-10-09

Applicant: 삼성전자주식회사

Inventor： 이효범

IPC: H01L21/205

Abstract: PURPOSE: A vapor deposition system having a chamber alignment device is provided to simplify a chamber alignment process by changing a structure of a chamber alignment device. CONSTITUTION: A vapor deposition system having a chamber alignment device comprises a process chamber(10), a cryo pump(50), a system pump(60), a laughing valve(70), and a valve board(80). The cryo pump(50) and the system pump(60) control a vacuum degree of the process chamber(10). The laughing valve(70) is connected between the process chamber(10) and the system pump(60). The valve board(80) provides the air to the cryo pump(50) and the laughing valve(70). The first line connects the valve board(80) with the cryo pump(50). The second line connects the valve board(80) with the laughing valve(70). The third line is connected with the first and the second lines. A switch(150) is installed on the third line.

Abstract translation: 目的：提供具有室对准装置的气相沉积系统，以通过改变室对准装置的结构来简化室对准过程。 构成：具有室对准装置的气相沉积系统包括处理室（10），低温泵（50），系统泵（60），笑阀（70）和阀板（80）。 冷冻泵（50）和系统泵（60）控制处理室（10）的真空度。 笑阀（70）连接在处理室（10）和系统泵（60）之间。 阀板（80）为冷冻泵（50）和笑阀（70）提供空气。 第一行将阀板（80）与低温泵（50）连接。 第二管线将阀板（80）与滑阀（70）连接。 第三行与第一行和第二行连接。 开关（150）安装在第三线上。

公开(公告)号：KR1020050024682A

公开(公告)日：2005-03-11

申请号：KR1020030060764

申请日：2003-09-01

Applicant: 삼성전자주식회사

Inventor： 구경모 ,  엄현일 ,  정선혁 ,  이효범

IPC: H01L21/02

Abstract: PURPOSE: A process chamber for fabricating a semiconductor for sensing easily an internal temperature thereof is provided to detect accurately a temperature of a semiconductor wafer and display the sensed temperature by installing a temperature sensor in the inside of the process chamber. CONSTITUTION: A process chamber is used for processing a semiconductor wafer loaded in a limited reaction space. The process chamber includes a plurality of temperature sensors(210,220) which are installed in the limited reaction space to sense a temperature within the limited reaction space. A display device is used for displaying the temperature detected by the temperature sensors. The temperature sensors are formed with infrared cameras.

Abstract translation: 目的：提供用于制造用于容易地感测其内部温度的半导体的处理室，以通过在处理室的内部安装温度传感器来精确地检测半导体晶片的温度并显示感测的温度。 构成：处理室用于处理装载在有限反应空间中的半导体晶片。 处理室包括多个温度传感器（210,220），其安装在有限反应空间中以感测受限反应空间内的温度。 显示装置用于显示由温度传感器检测到的温度。 温度传感器由红外摄像机形成。

公开(公告)号：KR1020030060014A

公开(公告)日：2003-07-12

申请号：KR1020020000610

申请日：2002-01-05

Applicant: 삼성전자주식회사

Inventor： 이효범

IPC: H01R11/12

Abstract: PURPOSE: An electricity connection method using a power cable is provided to prevent a cable from being cut in a high temperature environment. CONSTITUTION: In the case that power is provided to two components in parallel, the end and middle points(310,330) of each of two cables(31,33) corresponding to two polarities of electricity are connected to corresponding electrodes(11,13) of one of the components. The cables are coated cables. Coat of the end and middle point of each cable is removed to expose a conducting wire of the cable. The point at which each cable is connected to the electrodes has a temperature higher than the melting temperature of solder.

Abstract translation: 目的：提供使用电力电缆的电力连接方法，以防止电缆在高温环境下被切断。 构成：在对两个部件并联提供电力的情况下，对应于两个极性电力的两个电缆（31,33）中的每个电缆的端点（310,330）连接到相应的电极（11,13） 其中的一个组件。 电缆是涂层电缆。 每根电缆的端点和中点的涂层被去除以露出电缆的导线。 每个电缆连接到电极的点的温度高于焊料的熔化温度。