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公开(公告)号：KR101313884B1
公开(公告)日：2013-10-01
申请号：KR1020060114283
申请日：2006-11-20
Applicant: 삼성전자주식회사
Inventor： 정동원
Abstract: 본 발명은 이더넷 시스템에서 트랜시버 제어 방법 및 장치에 관한 것으로서, 시스템 전원이 온 되면, 하드웨어 로직을 이용하여 상기 트랜시버 내의 물리 계층의 상태를 디스에이블(disable)로 유지시키는 과정과, 상기 시스템 전체가 초기화되어 동작가능한 상태가 되면, 소프트웨어 로직을 이용하여 상기 물리 계층의 상태를 인에이블(enable)로 변경시키는 과정을 포함하여, 시스템 전체가 초기화된 후에 상기 물리 계층을 인에이블 시킴으로써, 상기 시스템 전체가 초기화되기 전에 상기 물리 계층이 인에이블되어 상대 시스템으로부터 수신되는 데이터가 손실되는 것을 방지할 수 있으며, 상기 프로그램 가능 논리소자를 이용하여 트랜시버의 모듈 타입에 관계없이 상기 물리 계층을 제어할 수 있다.
이더넷, 100BASE-T, 트랜시버, PHY-
公开(公告)号：KR1020080045329A
公开(公告)日：2008-05-23
申请号：KR1020060114283
申请日：2006-11-20
Applicant: 삼성전자주식회사
Inventor： 정동원
CPC classification number: H04L49/352 , H04L12/10 , H04L25/40 , H04L69/323
Abstract: A method and an apparatus for controlling a transceiver in an Ethernet system are provided to prevent loss of received data by enabling a physical layer before resetting a system. A physical layer within a transceiver is maintained in a disabling state by using hardware logic when a system is in a power-on state(201,203). The physical layer is changed to an enabling state by using software logic when the system is entirely reset to form an operational state thereof(205,207). The disabling state of the physical layer is maintained by using a predetermined default value set in the hardware logic. A transceiver control unit includes a physical layer control part and a transceiver. The physical layer control part outputs a signal for changing the physical layer from the enabling state to the disabling state or from the disabling state to the enabling state. The transceiver changes the state of the physical layer according to an output signal of the physical layer control part.
Abstract translation: 提供一种用于控制以太网系统中的收发器的方法和装置，以防止在复位系统之前启用物理层来丢失所接收的数据。 当系统处于通电状态时，通过使用硬件逻辑将收发器内的物理层保持在禁用状态（201,203）。 当系统完全复位以形成其操作状态时，通过使用软件逻辑将物理层改变为使能状态（205,207）。 通过使用在硬件逻辑中设置的预定默认值来维持物理层的禁用状态。 收发器控制单元包括物理层控制部分和收发器。 物理层控制部分将用于将物理层从使能状态改变为禁止状态或从禁止状态到使能状态的信号。 收发器根据物理层控制部分的输出信号改变物理层的状态。
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公开(公告)号：KR100425442B1
公开(公告)日：2004-03-30
申请号：KR1020000018673
申请日：2000-04-10
Applicant: 삼성전자주식회사
IPC: G03F7/039
CPC classification number: G03F7/039 , C08G61/08 , G03F7/0045
Abstract: A photosensitive polymer which maintains transparency even when exposed to a short-wavelength light source of 193 nm or below, exhibits improved adhesiveness to a substrate, improved contrast and improved resistance to dry etching. The photosensitive polymer includes a first monomer which is alicyclic hydrocarbon carboxylate having an acid-labile C6 to C20 tertiary alicyclic hydrocarbon group as a substituent, and a second monomer which is capable of free radical polymerization.
Abstract translation: 即使暴露于193nm以下的短波长光源时也保持透明性的光敏聚合物表现出对基底的改进的粘附性，改善的对比度和改进的对干法刻蚀的抗性。 感光性聚合物包括具有酸不稳定性C6〜C20叔脂环式烃基作为取代基的脂环族烃羧酸酯和能够自由基聚合的第二单体的第一单体。
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公开(公告)号：KR100389912B1
公开(公告)日：2003-07-04
申请号：KR1019990055837
申请日：1999-12-08
Applicant: 삼성전자주식회사
IPC: G03F7/039
CPC classification number: G03F7/0395 , G03F7/0397
Abstract: There are provided a photosensitive polymer and a photoresist compositing containing the same. The photosensitive polymer is represented by the following formula:wherein R1 is an acid-labile tertiary alkyl ester group, R2 is hydrogen atom, methyl, ethyl, carboxyl, gamma-butyrolactone-2-yl ester, gamma-butyrolactone-3-yl ester, pantolactone-2-yl ester, mevalonic lactone ester, 3-tetrahydrofuranyl ester, 2,3-propylenecarbonate-1-yl ester, 3-methyl-gamma-butyrolactone-3-yl ester or C3 to C20 alicyclic hydrocarbon, a/(a+b+c) is 0.1~0.7, b/(a+b+c) is 0.1~0.8, c/(a+b+c) is 0.0~0.8, and n is an integer in the range of 0 to 2.
Abstract translation: 提供了一种光敏聚合物和含有其的光致抗蚀剂复合物。 光敏聚合物由下式表示：其中R1是酸不稳定叔烷基酯基，R2是氢原子，甲基，乙基，羧基，γ-丁内酯-2-基酯，γ-丁内酯-3-基酯 ，泛内酯-2-基酯，甲羟戊酸内酯酯，3-四氢呋喃基酯，2,3-亚丙基碳酸酯-1-基酯，3-甲基-γ-丁内酯-3-基酯或C3-C20脂环烃，α - （ a + b + c）为0.1-0.7，b /（a + b + c）为0.1-0.8，c /（a + b + c）为0.0-0.8，n为0〜 2。
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公开(公告)号：KR1020020087295A
公开(公告)日：2002-11-22
申请号：KR1020010026419
申请日：2001-05-15
Applicant: 삼성전자주식회사
IPC: G03F7/004
CPC classification number: G03F7/0392 , C08F216/1416 , C08F218/04 , C08F232/08 , G03F7/0045 , G03F7/0046 , G03F7/039 , G03F7/0395 , G03F7/0397 , G03F7/0758
Abstract: PURPOSE: A photoresist polymer and a resist composition containing the polymer are provided, to improve the resistance against the dry etching of resist, the adhesive property to under substrate and the stability to moisture. CONSTITUTION: The photoresist polymer comprises a copolymer of an alkyl vinyl ether and furanone, represented by the formula 1, wherein R1 and R2 are H or an alkyl group of C1-C3, respectively; and X is a linear alkyl vinyl ether represented by -CH(R3)-CH(OR4)- or a cyclic alkyl vinyl ether represented by the formula 2(wherein R3 is H or methyl group; R3 is a hydrocarbon group of C1-C20; y is an integer of 1-4; and R5 is H or an alkyl or alkoxy group of C1-C3). The resist composition comprises a photosensitive polymer which is obtained by copolymerizing the copolymer of an alkyl vinyl ether and furanone, and a comonomer having a substituent or polar functional group capable of being degraded by an acid; and a photoacid generator.
Abstract translation: 目的：提供含有聚合物的光致抗蚀剂聚合物和抗蚀剂组合物，以提高抗蚀剂的干蚀刻性能，对底材的粘合性能和对水分的稳定性。 构成：光致抗蚀剂聚合物包含由式1表示的烷基乙烯基醚和呋喃酮的共聚物，其中R1和R2分别为H或C1-C3的烷基; X是由-CH（R 3）-CH（OR 4） - 表示的直链烷基乙烯基醚或由式2表示的环状烷基乙烯基醚（其中R 3为H或甲基; R 3为C 1 -C 20烃基 ; y为1-4的整数; R5为H或C1-C3的烷基或烷氧基）。 抗蚀剂组合物包含通过使烷基乙烯基醚和呋喃酮的共聚物与具有可被酸分解的取代基或极性官能团的共聚单体共聚获得的感光性聚合物; 和光致酸发生器。
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Patent Agency Ranking
公开(公告)号：KR100207550B1
公开(公告)日：1999-07-15
申请号：KR1019970007257
申请日：1997-03-05
Applicant: 삼성전자주식회사
Inventor： 정동원
IPC: G01N30/00
Abstract: 가스 크로마토그래피 장치, 이의 제조방법 및 이를 이용한 고분자 혼합물의 분석 방법에 대해 개시한다. 본 발명에 의한 가스 크로마토그래피 장치는 고분자 물질을 걸러낼 수 있는 칼럼 기능을 하는 관이 주입부내부에 설치되어 고점도 고분자 물질이 분석용 칼럼으로 유입되는 것을 차단시켜 분석용 칼럼의 손상을 막을 수 있으며 고분자 혼합물내의 저분자 물질을 정확하게 분석할 수 있다.
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公开(公告)号：KR1020130059233A
公开(公告)日：2013-06-05
申请号：KR1020110125448
申请日：2011-11-28
Applicant: 삼성전자주식회사
CPC classification number: G09G3/00 , G06F1/1652 , G06F3/0487 , G06F2203/04803 , H04M1/0214 , H04M1/0268 , H04M1/72522
Abstract: PURPOSE: An application display device of a portable terminal and a method thereof are provided to simultaneously display a plurality of applications. CONSTITUTION: A screen of a flexible display unit(160) is divided according to the folding operations. A control unit(110) divides the screen of the flexible display unit according to the folding operations of the flexible display unit. The control unit controls the flexible display unit in order to display the applications on the divided screen. When the un-folding operations are generated for the flexible display unit, the control unit divides a screen of the flexible display unit according to one or more folding operations. The control unit controls the flexible display unit in order to individually display each application on the divided screen. [Reference numerals] (110) Control unit; (120) Data processing unit; (123) RF unit; (125) Audio processing unit; (127) Key input unit; (130) Memory; (140) Camera unit; (150) Image processing unit; (160) Flexible display unit; (170) Folding sensor unit of the flexible display unit; (AA) Synchronization signal; (BB) Data
Abstract translation: 目的：提供便携式终端的应用显示装置及其方法，以同时显示多个应用。 构成：根据折叠操作分割柔性显示单元（160）的屏幕。 控制单元（110）根据柔性显示单元的折叠操作来划分柔性显示单元的屏幕。 控制单元控制柔性显示单元以便在划分的屏幕上显示应用程序。 当为柔性显示单元生成解折叠操作时，控制单元根据一个或多个折叠操作来划分柔性显示单元的屏幕。 控制单元控制柔性显示单元，以便在划分的屏幕上单独显示每个应用程序。 （参考号）（110）控制单元; （120）数据处理单元; （123）RF单元; （125）音频处理单元; （127）键输入单元; （130）记忆; （140）相机单元; （150）图像处理单元; （160）柔性显示单元; （170）柔性显示单元的折叠传感器单元; （AA）同步信号; （BB）数据
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公开(公告)号：KR1020010020724A
公开(公告)日：2001-03-15
申请号：KR1020000018673
申请日：2000-04-10
Applicant: 삼성전자주식회사
IPC: G03F7/039
CPC classification number: G03F7/039 , C08G61/08 , G03F7/0045
Abstract: PURPOSE: Provided is a photosensitive polymer and a chemically amplified photoresist composition containing the same, wherein the photosensitive polymer can keep transparency under an exposure source of short wavelength and has an excellent adhesion to a substrate, a high contrast, and a high resistance against dry etching. CONSTITUTION: The photosensitive polymer is produced by polymerizing C8-C20 tertiary alicyclic hydrocarbon group substituted monomer which is hydrolyzed to alicyclic hydrocarbon carboxylate ester by an acid, and a monomer capable of performing a free radical polymerization, such as maleic anhydride. The alicyclic hydrocarbon carboxylate ester is norbornene carboxylate ester, and the C8-C20 tertiary alicyclic hydrocarbon group is 2-methyl-2-norbornyl, 2-methyl-2-isobornyl, 2-methyl-2-adamantyl, and etc. The chemically amplified photoresist composition contains the photosensitive polymer and 0.01-10 wt%(based on the photosensitive polymer) of an organic salt.
Abstract translation: 目的：提供一种光敏聚合物和含有该感光性聚合物的化学放大型光致抗蚀剂组合物，其中光敏聚合物可以在短波长的曝光源下保持透明性，并且对基材具有优异的粘附性，高对比度和高耐干性 蚀刻。 构成：感光性聚合物通过将通过酸水解成脂环族烃羧酸酯的C8-C20叔脂环式烃基取代单体和能够进行自由基聚合的单体如马来酸酐进行聚合来制造。 脂环烃羧酸酯是降冰片烯羧酸酯，C8-C20叔脂环族烃基是2-甲基-2-降冰片基，2-甲基-2-异冰片基，2-甲基-2-金刚烷基等。化学放大 光致抗蚀剂组合物含有光敏聚合物和0.01-10重量％（基于光敏聚合物）的有机盐。
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公开(公告)号：KR100281903B1
公开(公告)日：2001-03-02
申请号：KR1019980058045
申请日：1998-12-24
Applicant: 삼성전자주식회사
IPC: G03F7/031
Abstract: 백본이 환상구조를 가지는 감광성 폴리머 및 이를 포함하는 레지스트 조성물에 관하여 개시한다. 본 발명은 (a) 화학 증폭형 레지스트에 사용되는 다음 식을 가지는 감광성 폴리머와,
식중, R
1 은 C
7 ∼ C
20 의 지환식(脂環式) 지방족 탄화수소이고, R
2 및 R
4 는 각각 C
1 ∼ C
7 의 지방족 탄화수소이고, R
3 및 R
5 는 각각 수소 또는 메틸기이고, R
6 는 수소 또는 2-히드록시에틸기이고, p/(p+q+r+s) = 0.1∼0.5, q/(p+q+r+s) = 0.1∼0.5, r/(p+q+r+s) = 0.0∼0.5, s/(p+q+r+s) = 0.01∼0.5임.
(b) PAG(photoacid generator)로 구성되는 레지스트 조성물을 제공한다.-
公开(公告)号：KR1020010011606A
公开(公告)日：2001-02-15
申请号：KR1019990031060
申请日：1999-07-29
Applicant: 삼성전자주식회사
IPC: G03F7/039
CPC classification number: G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/115 , Y10S430/122
Abstract: PURPOSE: A photosensitive polymer as a copolymer of a norbornene ester substituted with a C1-20 aliphatic alcohol group and maleic anhydride as a basic monomer and chemically amplified photoresist composition containing the same are provided, which can expose with an ArF excimer laser and have high etching resistance and excellent adhesion to underlying layer. CONSTITUTION: A photosensitive polymer having a weight average molecular weight of 3,000 to 100,000 is prepared by copolymerizing a first monomer as a norbornene ester substituted with C1-20 aliphatic alcohol such as secondary propanol and a second monomer as maleic anhydride. A chemically amplified photoresist composition comprises the photosensitive polymer, 1 to 15% by weight of a photoacid generator, additionally 1 to 50% by weight of a solution inhibitor and 0.01 to 2.0% by weight of an organic base respectively based on the weight of the photosensitive polymer.
Abstract translation: 目的：提供作为碱性单体和C 20-20脂肪醇基取代的降冰片烯酯与马来酸酐的共聚物的感光性聚合物和含有该降冰片烯的化学放大型光致抗蚀剂组合物，其可以用ArF准分子激光曝光并具有高 耐蚀刻性和对底层的优异粘附性。 构成：重均分子量为3,000〜100,000的光敏性聚合物通过将作为降冰片烯酯的第一单体作为马来酸酐共聚而制备，所述降冰片烯酯是用C 1-20脂肪族醇如仲丙醇和第二单体取代的。 化学放大光致抗蚀剂组合物包含光敏聚合物，1至15重量％的光酸产生剂，另外1至50重量％的溶液抑制剂和0.01至2.0重量％的有机碱，分别基于 光敏聚合物。
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