公开(公告)号：KR100689680B1

公开(公告)日：2007-03-08

申请号：KR1020050052024

申请日：2005-06-16

Applicant: 삼성전자주식회사

Inventor： 박철우 ,  고용선 ,  윤병문 ,  김경현 ,  이광욱 ,  류창길 ,  하성호 ,  송우석 ,  전용명 ,  박승율

IPC: H01L27/108

CPC classification number: H01L21/02068 ,  H01L27/10817 ,  H01L27/10852 ,  H01L28/91

Abstract: 반도체 구조물의 표면을 처리하는 방법 및 이를 이용하여 반도체 커패시터를 제조하는 방법에 관한 것으로서, 실린더 타입의 하부 전극과 같이 폭에 비해 높은 높이의 종횡비를 가지면서 서로 인접하게 배치되는 패턴들을 포함하는 반도체 구조물을 세정할 때 물에 비해 표면 장력이 작은 용액을 사용한다. 그리고, 이소프로필알콜의 증기 분위기에서 상기 반도체 구조물을 건조시킨다. 따라서, 상기 패턴들 사이에 상기 용액이 접촉하여 표면 장력이 작용하여도 상기 패턴들은 거의 휘어지지 않는다.

公开(公告)号：KR100667833B1

公开(公告)日：2007-01-11

申请号：KR1020050108925

申请日：2005-11-15

Applicant: 삼성전자주식회사

Inventor： 하성호

IPC: G06F13/16 ,  G06F13/00

Abstract: A method and a device for allocating a memory in a multiple bus system are provided to realize real-time processing by minimizing time needed for obtaining a bus access right of the multiple bus system. A bus access frequency detector(320) detects an access frequency whenever hardware devices included in the multiple bus system access a memory connected to each bus. A memory allocator(330) allocates a memory area by selecting one memory among the memory connected to each bus based on the detected access frequency in case that the hardware included in the multiple bus system requests memory allocation. A database(370) stores information for indicating the allocation information for the memory connected to the buses. The allocator selects the memory having a storage space and connected to the bus having the smallest access frequency among the memories connected to each bus.

Abstract translation: 提供了一种用于在多总线系统中分配存储器的方法和装置，以通过最小化获得多总线系统的总线访问权限所需的时间来实现实时处理。 总线访问频率检测器（320）每当包括在多总线系统中的硬件设备访问连接到每个总线的存储器时检测访问频率。 存储器分配器（330）通过在包括在多总线系统中的硬件请求存储器分配的情况下基于检测到的存取频率在连接到每个总线的存储器中选择一个存储器来分配存储区域。 数据库（370）存储用于指示连接到总线的存储器的分配信息的信息。 分配器在连接到每个总线的存储器中选择具有存储空间并连接到具有最小访问频率的总线的存储器。

公开(公告)号：KR1020060131519A

公开(公告)日：2006-12-20

申请号：KR1020050052024

申请日：2005-06-16

Applicant: 삼성전자주식회사

Inventor： 박철우 ,  고용선 ,  윤병문 ,  김경현 ,  이광욱 ,  류창길 ,  하성호 ,  송우석 ,  전용명 ,  박승율

IPC: H01L27/108

CPC classification number: H01L21/02068 ,  H01L27/10817 ,  H01L27/10852 ,  H01L28/91

Abstract: A semiconductor structure processing method and a method for manufacturing a semiconductor capacitor using the same are provided to restrain the damage of a lower electrode and to reduce the contact between adjacent lower electrodes by performing a cleaning process using a predetermined solution with a relatively small surface tension compared to water. A cleaning process is performed on a semiconductor structure. The semiconductor structure includes predetermined patterns(56) spaced apart from each other. The predetermined pattern has a large aspect ratio. The cleaning process is performed by using a predetermined solution with a relatively small surface tension compared to water. A drying process is performed on the semiconductor structure under an isopropylalcohol vapor atmosphere. The predetermined solution of the cleaning process is made of one selected from a group consisting of isopropylalcohol, ethanol, diluted isopropylalcohol and diluted ethanol.

Abstract translation: 提供半导体结构处理方法和使用其的半导体电容器的制造方法，以通过使用具有相对小的表面张力的预定溶液进行清洁处理来抑制下部电极的损伤并减少相邻的下部电极之间的接触 与水相比。 对半导体结构进行清洁处理。 半导体结构包括彼此间隔开的预定图案（56）。 预定图案具有大的纵横比。 通过使用与水相比具有相对小的表面张力的预定溶液来进行清洁处理。 在异丙醇蒸汽气氛下对半导体结构进行干燥处理。 清洁过程的预定溶液由选自异丙醇，乙醇，稀释的异丙醇和稀释的乙醇的一种制成。