公开(公告)号：KR1020110088809A

公开(公告)日：2011-08-04

申请号：KR1020100008495

申请日：2010-01-29

Applicant: 삼성전자주식회사

Inventor： 윤효진 ,  김부득 ,  류진아 ,  김명선 ,  백세경 ,  김수경 ,  함지윤

IPC: G03F7/095 ,  H01L21/027

CPC classification number: G03F7/091 ,  G03F7/11 ,  H01L21/0276

Abstract: PURPOSE: A composition for forming a photosensitive type anti-reflective coating, a pattern forming method using the same, and a semiconductor device manufacturing method using the same are provided to form superior trench patterns based on little amount of exposed light. CONSTITUTION: A composition for forming a photosensitive type anti-reflective coating includes a photoacid generator containing onium salt and a photo-resist agent reacting with i-line light. The onium salt includes sulfonate. The sulfonate includes a sulfonate cation part represented by chemical formula 1 and a sulfonate anion part represented by chemical formula 2. In the chemical formula 1, the A, the B, and the C includes C1 to C20 alkyl group, C2 to C20 alkoxy group, C4 to C20 aryl group, C3 to C20 cyclo alkyl group, or C5 to C20 alkoxycyclo alkyl group. In the chemical formula 2, the n is 1 to 3. The X includes C4 to C10 cyclic group, alkyl group, cycloalkyl group, and other groups.

Abstract translation: 目的：提供一种用于形成感光型抗反射涂层的组合物，使用该组合物的图案形成方法和使用该组合物的半导体器件制造方法，以基于少量的曝光而形成优异的沟槽图案。 构成：用于形成感光型抗反射涂层的组合物包括含有鎓盐的光酸产生剂和与i线光反应的光致抗蚀剂。 鎓盐包括磺酸盐。 磺酸盐包括由化学式1表示的磺酸盐阳离子部分和由化学式2表示的磺酸根阴离子部分。在化学式1中，A，B和C包括C1〜C20烷基，C2〜C20烷氧基 C4〜C20芳基，C3〜C20环烷基或C5〜C20烷氧基环烷基。 在化学式2中，n为1〜3。X包括C 4〜C 10的环状基，烷基，环烷基等。

公开(公告)号：KR1020110135752A

公开(公告)日：2011-12-19

申请号：KR1020100055662

申请日：2010-06-11

Applicant: 삼성전자주식회사

Inventor： 윤효진 ,  김재호 ,  김영호 ,  김명선 ,  백세경 ,  김수경 ,  함지윤

IPC: G03F7/004

CPC classification number: G03F7/0045 ,  G03F7/004 ,  G03F7/0046 ,  G03F7/0047 ,  G03F7/029

Abstract: PURPOSE: A photo-resist composition for manufacturing a probe array and a method for manufacturing the probe array using the same are provided to include an onium salt-containing photoacid generating agent and a photo-sensitive agent reactive to i-line light. CONSTITUTION: A photo-resist composition for manufacturing a probe array includes an onium salt-containing photoacid generating agent and a photo-sensitive agent reactive to i-line light. The onium salt includes sulfonate cation part represented by chemical formula 1 and sulfonate anion part represented by chemical formula 2. In the chemical formula 1, the A, the B, and the C are respectively hydroxyl group, cyclo group, and cycloalkyl group. In the chemical formula 2, the n is between 1 and 3. The X includes C3 to C10 cyclogroup, adamantyl group, and oxygen containing cycloheptane group.

Abstract translation: 目的：提供用于制造探针阵列的光致抗蚀剂组合物和使用其的制造探针阵列的方法，以包括含鎓盐的光酸产生剂和对i线光无反应的光敏剂。 构成：用于制造探针阵列的光致抗蚀剂组合物包括含鎓盐的光酸产生剂和与i线光反应的光敏剂。 鎓盐包括由化学式1表示的磺酸盐阳离子部分和由化学式2表示的磺酸根阴离子部分。在化学式1中，A，B和C分别是羟基，环基和环烷基。 在化学式2中，n在1和3之间.X包括C 3至C 10环基，金刚烷基和含氧环庚烷基。

公开(公告)号：KR1020110111720A

公开(公告)日：2011-10-12

申请号：KR1020100030945

申请日：2010-04-05

Applicant: 삼성전자주식회사

Inventor： 김명선 ,  윤효진 ,  백세경 ,  김수경 ,  함지윤 ,  김영호

IPC: G01N33/48

CPC classification number: G03F7/165 ,  G01N33/487 ,  G03F7/0392 ,  G03F7/095 ,  G03F7/405

Abstract: 프로브 어레이의 제조 방법이 제공된다. 프로브 어레이의 제조 방법은, 표면에 아세탈기를 포함하고 하기 화학식 1로 표시되는 산분해성 보호기에 의해 보호되고, 프로브의 제1 모노머와 커플링할 수 있는 작용기를 가지는 기판을 제공하고, 광산발생제를 포함하는 포토레지스트를 기판 상에 제공하고, 포토레지스트를 선택적으로 노광하여 노광된 영역에 대응하는 산분해성 보호기를 탈보호하고, 포토레지스트를 제거하고, 산분해성 보호기와 결합된 제1 모노머를 탈보호된 작용기와 커플링하는 것을 포함한다.


(단, 상기 R1은 탄소수가 1 내지 5인 알킬기이고, 상기 R2는 수소, 또는 메틸기이고, Y는 모노머 또는 기판과 커플링되는 사이트이다.)

公开(公告)号：KR1020110094878A

公开(公告)日：2011-08-24

申请号：KR1020100014590

申请日：2010-02-18

Applicant: 삼성전자주식회사 ,  금호석유화학 주식회사

Inventor： 박주현 ,  윤효진 ,  주현상 ,  박란라 ,  백세경 ,  정성욱 ,  함지윤

IPC: C08G63/127 ,  C08G61/02 ,  C12Q1/68

CPC classification number: C40B50/14 ,  B01J19/0046 ,  B01J2219/00529 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00608 ,  B01J2219/00612 ,  B01J2219/00637 ,  B01J2219/00659 ,  B01J2219/00709 ,  B01J2219/00711 ,  B01J2219/00722 ,  B82Y30/00 ,  C08G63/127 ,  C08G61/02 ,  C12Q1/6834

Abstract: PURPOSE: A composition of forming an oligomer array is provided to ensure high sensitivity to the light and to form an oligomer array including bio molecules or analogs thereof at the predetermined location of a substrate without the damage of oligomers. CONSTITUTION: A composition of forming an oligomer array comprises: a polymer which includes a repeating unit represented by chemical formulas (1) and (2) and is stable to acids; a photoacid generator; and an organic solvent. In chemical formulas, R1 is stable to acids and represents hydrogen, C1-20 alkyl group, C3-20 cycloalkyl, C2-20 alkoxy alkyl, or C5-20 alkoxy cycloalkyl group; R2 is stable to acids and represents hydrogen, C1-20 alkyl group or C2-20 alkoxy alkyl group; and R3 is stable to acids and represents C3-20 cycloalkyl group or C3-20 lactone group.

Abstract translation: 目的：提供形成低聚物阵列的组合物以确保对光的高灵敏度，并且在基材的预定位置形成包含生物分子或其类似物的低聚物阵列，而不损害低聚物。 构成：形成低聚物阵列的组合物包括：包含由化学式（1）和（2）表示的重复单元并且对酸稳定的聚合物; 光致酸发生器; 和有机溶剂。 在化学式中，R1对酸稳定，代表氢，C1-20烷基，C3-20环烷基，C2-20烷氧基烷基或C5-20烷氧基环烷基; R2对酸稳定，代表氢，C1-20烷基或C2-20烷氧基烷基; R3对酸稳定，代表C3-20环烷基或C3-20内酯基。