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公开(公告)号：KR1020090097399A
公开(公告)日：2009-09-16
申请号：KR1020080022511
申请日：2008-03-11
Applicant: 삼성전자주식회사 , 재단법인서울대학교산학협력재단
IPC: H01P1/201
Abstract: A substrate is provided to perform a dispersive meta material by using diffraction between electromagnetic waves which pass a plurality of waveguides. A substrate(1) includes a first surface(10), a second surface(20), and a plurality of waveguides(30). An electromagnetic wave is incident on the first surface. The electromagnetic wave is emitted from the second surface. A plurality of waveguides is arranged according to a first axial direction and a second axial direction. The first axial direction is parallel to a polarizing direction of the electromagnetic wave. The second axial direction is vertical to the first axial direction. A plurality of waveguides generates diffraction of the electromagnetic wave by delivering the electromagnetic wave from the first surface to the second surface. A plurality of waveguides generates Fabry-Perot resonance of the electromagnetic wave.
Abstract translation: 提供衬底以通过使通过多个波导的电磁波之间的衍射来执行分散的间位材料。 基板（1）包括第一表面（10），第二表面（20）和多个波导（30）。 电磁波入射在第一表面上。 电磁波从第二表面发射。 多个波导根据第一轴向和第二轴向布置。 第一轴向平行于电磁波的偏振方向。 第二轴向垂直于第一轴向。 多个波导通过将电磁波从第一表面传递到第二表面而产生电磁波的衍射。 多个波导产生电磁波的法布里 - 珀罗共振。
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公开(公告)号：KR1020090120777A
公开(公告)日：2009-11-25
申请号：KR1020080046748
申请日：2008-05-20
Applicant: 삼성전자주식회사 , 재단법인서울대학교산학협력재단
Abstract: PURPOSE: An electron beam focusing electrode and an electron gun using the same are provided to focus the electron to an anode direction separated from a cathode by passing the electron through the penetration hole of the electron beam focusing electrode. CONSTITUTION: A cross section of a second surface(32) of a penetration hole(33) emitting the electron is larger than the cross section of a first surface(31) of the penetration hole. The cross section of the penetration hole is inclined to the progressing direction of the electron beam passing through the inside of the penetration hole. A protrusion(34) is formed in at least one side of the penetration hole. The orbit of the electrons passing through the inside of the penetration hole is controlled by the protrusion. The distortion of the electric field is decreased in an edge part of the electron beam. The uniformity of the electron beam from the electron gun is improved.
Abstract translation: 目的：提供电子束聚焦电极和使用该电子束聚焦电极的电子枪，以通过使电子通过电子束聚焦电极的穿透孔将电子聚焦到与阴极分离的阳极方向上。 构成：发射电子的穿透孔（33）的第二表面（32）的横截面大于穿透孔的第一表面（31）的横截面。 穿透孔的横截面向穿过穿透孔内部的电子束的前进方向倾斜。 突起（34）形成在贯通孔的至少一侧。 穿过穿透孔内部的电子的轨道由突起控制。 在电子束的边缘部分，电场的变形减小。 来自电子枪的电子束的均匀性得到改善。
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公开(公告)号：KR101420244B1
公开(公告)日：2014-07-21
申请号：KR1020080046748
申请日：2008-05-20
Applicant: 삼성전자주식회사 , 재단법인서울대학교산학협력재단
Abstract: 다각형 관통홀을 포함하는 플레이트; 및 상기 관통홀의 적어도 한 변에 형성된 돌출부를 포함하는 전자빔 집속 전극과 상기 전자빔 집속 전극을 이용한 전자총이 개시된다. 본 발명의 일 실시예에 따른 전자빔 집속 전극을 이용하면, 사각형 형상의 단면을 갖는 전자빔의 퍼짐 현상을 감소시킬 수 있으며, 전자총의 출력을 증가시키는 동시에 전자빔을 집속하는 것이 용이한 이점이 있다.
전자빔 집속 전극, BFE, 전자총, 사각형-
4.发明授权
公开(公告)号：KR100813273B1
公开(公告)日：2008-03-13
申请号：KR1020070001159
申请日：2007-01-04
Applicant: 삼성전자주식회사 , 재단법인서울대학교산학협력재단
IPC: H01L21/027
CPC classification number: G03F7/00 , G03F1/22 , G03F9/7053 , G03F9/7076 , G03F1/60
Abstract: A mask for use in an LIGA(Lithographie Galvanofomung Abformung) process, a method for manufacturing the same, and a method for manufacturing a micro structure using the LIGA process are provided to reduce an alignment error with respect to photoresist layers by inserting an aligning pin into aligning pin holes on the entire photoresist layers. A substrate(120) for a structure, a photoresist layer(152) comprised of a plating hole(155) and an aligning pin hole(157) formed on a position corresponding to the plating hole, an aligning pin capable of being inserted into the aligning pin hole are manufactured. Processes for laminating the photoresist layer on the substrate for a structure and forming a plating layer by plating a metal in the plating hole are repeated by the number of the photoresist layers. The alignment between the laminated photoresist layer and a photoresist layer to be laminated is accomplished by inserting the aligning pin into the aligning pin hole on the entire laminated photoresist layer.
Abstract translation: 提供了用于LIGA（Lithographie Galvanofomung Abformung）工艺的掩模，其制造方法和使用LIGA工艺制造微结构的方法，以通过将对准销插入来减少相对于光致抗蚀剂层的对准误差 在整个光致抗蚀剂层上对准针孔。 一种用于结构的衬底（120），由形成在与所述电镀孔相对应的位置上的电镀孔（155）和对准销孔（157）构成的光致抗蚀剂层（152），能够插入到所述电镀孔 制造对准销孔。 通过光致抗蚀剂层的数量重复用于层压用于结构的光致抗蚀剂层和通过在电镀孔中镀覆金属形成镀层的工艺。 层压的光致抗蚀剂层和要层压的光致抗蚀剂层之间的对准是通过将对准销插入整个层叠的光致抗蚀剂层上的对准销孔来实现的。
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