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公开(公告)号:KR100642201B1
公开(公告)日:2006-11-10
申请号:KR1020050098141
申请日:2005-10-18
Applicant: 성균관대학교산학협력단
Abstract: A method for manufacturing a flexible printed circuit board is provided to improve an adhesive property between a polyimide film and a metal thin film by depositing a metal seed layer by using a magnetron sputtering method. A cross-linking layer forming process is performed to form a cross-linking layer(110) on a surface of a polyimide film by using a magnetron sputtering device for colliding with high-energy ions and target metal ions. A copper thin film forming process is performed to form a copper thin film(120) by colliding with the metal ions and the cross-linking layer. A copper thick film forming process is performed to form a copper thick film(130) on the copper thin film by using a wet plating method.
Abstract translation: 提供了一种制造柔性印刷电路板的方法,以通过使用磁控溅射方法沉积金属种子层来提高聚酰亚胺膜和金属薄膜之间的粘附性能。 进行交联层形成过程以通过使用磁控溅射装置在聚酰亚胺膜的表面上形成交联层(110)以与高能离子和目标金属离子碰撞。 进行铜薄膜形成工艺以通过与金属离子和交联层碰撞形成铜薄膜(120)。 进行铜厚膜形成工艺以通过使用湿式镀覆法在铜薄膜上形成铜厚膜(130)。
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公开(公告)号:KR100675600B1
公开(公告)日:2007-01-30
申请号:KR1020050096251
申请日:2005-10-12
Applicant: 성균관대학교산학협력단
IPC: H05K3/16
Abstract: A method for manufacturing flexible printed circuit boards is provided to improve an adhesion property between a polyimide film and a metal thin film by using a magnetron sputtering method. A method for manufacturing flexible printed circuit boards includes the steps of: forming a cross-linking layer(110) by ions having high energy, wherein argon ions with high energy and metal ions from a target are collided and impinged into a surface of a polyimide film by a magnetron sputtering device; forming a copper thin film(120) by the metal ions and the sputtered metal neutron particles impinged into the cross-linking layer(110) formed at the above step; and depositing a copper thick layer(130) on the copper thin film(120) formed at the above step by using a sputtering method.
Abstract translation: 提供一种制造柔性印刷电路板的方法,以通过使用磁控溅射方法来提高聚酰亚胺膜和金属薄膜之间的粘附性能。 一种制造柔性印刷电路板的方法包括以下步骤:通过具有高能量的离子形成交联层(110),其中具有高能量的氩离子和来自靶的金属离子相撞并撞击到聚酰亚胺的表面 通过磁控溅射装置进行薄膜; 通过金属离子和溅射的金属中子粒子撞击在上述步骤中形成的交联层(110)形成铜薄膜(120) 以及通过使用溅射方法在上述步骤中形成的铜薄膜(120)上沉积铜厚层(130)。
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