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公开(公告)号:KR1020120090775A
公开(公告)日:2012-08-17
申请号:KR1020120001195
申请日:2012-01-04
Applicant: 소이텍
IPC: H01L27/12
CPC classification number: H01L21/76254 , H01L21/02032
Abstract: PURPOSE: A method for reproducing a supply substrate is provided to reduce the time, quality, and costs of a reproduction operation by easily removing a remaining material ring on a donor substrate. CONSTITUTION: A weak interface is generated(110). A supply substrate is contacted with a support substrate(120). The supply substrate is thermally processed(130). An electromagnetic wave is selectively irradiated to the supply substrate(210). The supply substrate is chemically and mechanically polished(220).
Abstract translation: 目的:提供用于再现供应基板的方法,通过容易地去除供体基板上的剩余材料环来减少再现操作的时间,质量和成本。 构成:生成弱接口(110)。 供应基板与支撑基板(120)接触。 供应基板被热处理(130)。 电磁波被选择性地照射到供给基板(210)。 供应基板经化学和机械抛光(220)。