公开(公告)号：KR100888080B1

公开(公告)日：2009-03-11

申请号：KR1020080037474

申请日：2008-04-22

Applicant: 이화여자대학교 산학협력단

Inventor： 박일흥 ,  박재형 ,  김민수 ,  전진아 ,  서정은

IPC: G02B26/08 ,  H01L21/77

CPC classification number: G02B26/0841 ,  B81B2201/04 ,  G02B6/357 ,  G02B17/002 ,  H01L21/77

Abstract: A method for manufacturing a micro-mirror array is provided to joint a mirror plate and a driving unit and form the driving unit while the driving unit and the mirror plate are joined, so a crack is not generated on the mirror plate. A micromirror array manufacturing method is comprised of the steps: forming a comb electrode(S10), a forming a mirror plate(S20), bonding a wafer(S30), finishing the comb electrode formation(S40), and separating the mirror plate(S50). The comb electrode is formed by using the multi-step etch height and the comb-electrode for the driving part is formed on the first wafer. The mirror plate is formed on the second wafer, and the first wafer and the second wafer are joined. The comb electrode is formed while first wafer and the second wafer are joined.

Abstract translation: 提供一种制造微反射镜阵列的方法，用于连接镜板和驱动单元，并在驱动单元和镜板接合的同时形成驱动单元，从而在镜板上不产生裂纹。 微镜阵列制造方法包括以下步骤：形成梳状电极（S10），形成镜板（S20），接合晶片（S30），完成梳状电极形成（S40），以及分离镜板（ S50）。 通过使用多步蚀刻高度形成梳状电极，并且用于驱动部分的梳状电极形成在第一晶片上。 镜板形成在第二晶片上，第一晶片和第二晶片接合。 在第一晶片和第二晶片接合时形成梳状电极。