초발수 필름 시트 제조방법
    8.
    发明授权
    초발수 필름 시트 제조방법 有权
    制造超级疏水薄膜的方法

    公开(公告)号:KR101166152B1

    公开(公告)日:2012-07-18

    申请号:KR1020110072945

    申请日:2011-07-22

    Abstract: PURPOSE: A method for manufacturing a super-hydrophobic sheet is provided to produce a structure which includes a protrusion having a super-hydrophobic effect by controlling hardening time and number of a photo-resist. CONSTITUTION: The surface of a silicon wafer is cleaned(S10). A photo-resist is coated on the upper side of the silicon wafer by using a spin coater(S20). The silicon wafer in which the photo-resist is coated is softly baked by using an oven. A structure is exposed by using a mask aligner(S30). The structure is developed by using a photo-resist developer(S40). A PDMS(Polydimethylsiloxane) molding process is executed to the upper side of the structure(S50). The photo-resist is eliminated by using acetone(S60).

    Abstract translation: 目的:提供一种制造超疏水性片材的方法,以通过控制硬化时间和光抗蚀剂数量来产生包括具有超疏水效果的突起的结构。 构成:清洁硅晶片的表面(S10)。 通过使用旋转涂布机在硅晶片的上侧涂布光致抗蚀剂(S20)。 通过使用烤箱将其中涂覆有光致抗蚀剂的硅晶片轻轻烘烤。 通过使用掩模对准器曝光结构(S30)。 通过使用光致抗蚀剂显影剂显影结构(S40)。 对结构的上侧执行PDMS(聚二甲基硅氧烷)成型工序(S50)。 使用丙酮消除光刻胶(S60)。

Patent Agency Ranking