Abstract:
The present invention relates to a complex sheet comprising a matrix having a reinforcement impregnated and having at least one part of one or more side among the upper side and lower side based on the thickness direction of the reinforcement exposed to the outside, and to a flexible display device comprising the same. Provided in the present invention is the complex sheet not needing an additional process for attachment of a material like a substrate and having excellent flexibility and curvature resistance, thereby being used for a flexible use.
Abstract:
The present invention relates to a composite sheet and a display device comprising the same and, more specifically, to a composite sheet having excellent heat resistance, almost no thermal decomposition at high temperature, and great transparent properties and a display device comprising the same. The present invention relates to the composite sheet and the display device comprising the same, which include a matrix and a reinforcing material impregnated in the matrix, wherein the matrix contains a cured material of a composition comprising an imide silicon-based copolymer.
Abstract:
The present invention relates to a composite sheet and a flexible display apparatus, which include a matrix on which a fibrous material containing a first single yarn and a second single yarn arranged to intersect at a constant angle of the first single yarn is impregnated, wherein the first single yarn and the second single yarn are configured of an angle of greater than 0° and less than 180 ° respectively to the first direction of the matrix.
Abstract:
PURPOSE: A transparent gas barrier film with inorganic composition slope gradient is provided to simply and cheaply obtain inorganic composition slope gradient only by treating with UV ray. CONSTITUTION: A transparent gas barrier film comprises a substrate containing silicon, with an organic-inorganic hybrid section with inorganic composition slope gradient. The surface of the substrate contains 70% or more inorganic. A method for preparing the film comprises: a step of preparing the substrate containing silicon; and a step of treating the surface with UV ray and ozone to form the inorganic composition slope gradient.