Abstract:
In the present invention, provided are a photosensitive resin composition of color filters and color filters using the same, the photosensitive resin composition of color filters comprising (A) fluorescent materials radiating lights whose the range of wavelength is between 550 and 660 nm; (B) an acrylic based binder resin; (C) a photopolymerization initiator; (D) a photopolymerization monomer; (E) a coloring agent; and (F) a solvent.
Abstract:
Provided are a photosensitive resin composition for a color filter which comprises (A) a colorant comprising at least one selected from a dye represented by chemical formula 1 and a dye represented by chemical formula 2; (B) an acrylic binder resin; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, and a color filter using the same. [Chemical formula 1] [Chemical formula 2] (In the chemical formula 1 and the chemical formula 2, each substituent is as defined in the specification.).
Abstract:
Provided are a photosensitive resin composition for a color filter including a coloring agent including a parylene dye represented by chemical formula 1, an acrylic binder resin, a photo-polymerizable monomer, a photopolymerization initiator, and a solvent, and a color filter using the same. In chemical formula 1, each substituent is defined in the specification.
Abstract:
PURPOSE: A photosensitive resin composition for color filters with excellent adhesion for materials, and a color filter using the same are provided to enhance heat resistance and chemical resistance. CONSTITUTION: A photosensitive resin composition for color filters with excellent adhesion for materials comprises an acrylic binder resin including a structure unit represented by chemical formula 1, an acryl based photopolymerization monomer, a photopolymerization initiator, a coloring agent, and a solvent. In the chemical formula 1, R1 indicates hydrogen, an alkyl group with 1-20 carbons, an aryl group with 6-20 carbons, an alkylaryl group with 7-20 carbons, a cyclo alkyl group with 3-20 carbons, or a multi cyclo alkyl group with 5-20 carbons. R2 and R3 independently indicates the alkyl group with 1-20 carbons, the aryl group with 6-20 carbons, the alkylaryl group with 7-20 carbons, the cyclo alkyl group with 3-20 carbons, or the multi cyclo alkyl group with 5-20 carbons. R4 indicates an alkylene group with 1-20 carbons, an arylene group with 6-20 carbons, an alkylenegroup with 7-20 carbons, a cyclo alkylene group with 3-20 carbons, or a multi cyclo alkylene group with 5-20 carbons.
Abstract:
PURPOSE: A chromophore containing dispersing agent, a pigment dispersing liquid composition for a color filter including the same, a photo-sensitive resin composition for the color filter including the same are provided to improve the contrast ratio and the brightness by improving the dispersability of yellow-based pigment. CONSTITUTION: A chromophore containing dispersing agent is represented by chemical formula 1. In the chemical formula 1, the A represents a chromophore derived from dye. The B represents the residue derived from a commercial dispersing agent. The dye is selected from yellow nickel complex dye, yellow isoindoline-based dye, yellow quinophthalone-based dye, or the combination of the same. The commercial dispersing agent includes an amine group.
Abstract:
본 발명은 리쏘그래픽 공정에 유용한 반사방지성을 갖는 하드마스크 조성물을 제공하기 위하여 하기 화학식 1로 표시되는 방향족 고리 (aromatic ring) 함유 공중합체 및 상기 공중합체를 포함하는 것을 특징으로 하는 하드마스크 조성물을 제공한다. [화학식 1]
(상기 식에서, 1≤m 0 는 -OH, 탄소수 1~7의 -C n H 2n OH 이고, R 1 는 중 어느 하나이며, R 2 는 -O-, 탄소수 1~7의 -C n H 2n O- 이고, R 3 은 수소 (-H), 히드록시기 (-OH), C 1-10 의 알킬기, C 6-10 의 아릴기, 알릴기 및 할로겐 원자 중 어느 하나이다.) 본 발명에 따른 조성물은 매우 우수한 광학적 특성, 기계적 특성을 제공하며, 동시에 스핀-온 도포 기법을 이용하여 도포 가능한 특성을 제공한다. 특히, 본 발명의 조성물은 드라이 에칭 내성이 매우 우수한 박막으로서 높은 에스펙트비를 갖는 패턴을 형성할 수 있는 패턴형성용 다층막 및 패턴형성방법을 제공한다. 리쏘그래픽, 반사방지성, 하드마스크, 방향족 고리, 드라이 에칭 내성, 카본 함량
Abstract:
본 발명은 리쏘그래픽 공정에 유용한 반사방지성을 갖는 하드마스크 조성물에 관한 것으로, 본 발명에 따른 조성물은 매우 우수한 광학적 특성, 기계적 특성을 제공하며, 동시에 스핀-온 도포 기법을 이용하여 도포 가능한 특성을 제공한다. 특히, 본 발명의 조성물은 드라이 에칭 내성이 매우 우수한 박막으로서 높은 에스펙트비를 갖는 패턴을 형성할수 있는 패턴형성용 다층막 및 패턴형성방법을 제공한다. 리쏘그래픽, 반사방지성, 하드마스크, 방향족 고리, 드라이 에칭 내성