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公开(公告)号：KR1020100008022A
公开(公告)日：2010-01-25
申请号：KR1020080068395
申请日：2008-07-15
Applicant: 포항공과대학교 산학협력단
Abstract: PURPOSE: A method for manufacturing a molecule monolayer including an alkyne compound is provided to form a molecule monolayer of an alkyne compound in a minute and precise level from a furoxan monolayer on the surface of a substrate using extreme ultraviolet rays. CONSTITUTION: A method for manufacturing a molecule monolayer including an alkyne compound comprises: a molecular layer formation step that forms a furoxan monolayer on the surface of a substrate; and a light irradiation step that irradiates extreme ultraviolet rays to the furoxan monolayer formed in the sample preparation step. A method for forming a molecule monolayer comprises the steps of: washing a substrate for forming the furoxan monolayer; forming an APDES((3-aminoproryl)diethoxymethylsilane) molecular monolayer on the surface of washed substrate; and forming the furoxan monolayer by reacting the furoxan compound on the APDES molecular monolayer.
Abstract translation: 目的：提供用于制造包含炔化合物的分子单层的方法，以使用极紫外线从基底表面上的呋喃糖单层以微细且精确的水平形成炔化合物的分子单层。 构成：制造包含炔化合物的分子单层的方法包括：分子层形成步骤，在基材表面上形成呋喃糖单层; 以及向样品制备工序中形成的呋喃糖单层照射极紫外线的光照射工序。 形成分子单层的方法包括以下步骤：洗涤形成呋喃糖单层的底物; 在洗涤的底物的表面上形成APDES（（3-氨基环戊基）二乙氧基甲基硅烷）分子单层; 并通过使呋喃糖化合物与APDES分子单层反应形成呋喃糖单层。
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公开(公告)号：KR101027513B1
公开(公告)日：2011-04-06
申请号：KR1020080068395
申请日：2008-07-15
Applicant: 포항공과대학교 산학협력단
Abstract: 본 발명은 퓨록산분자(furoxan molecule)를 이용한 알카인(alkyne)화합물의 단분자막형성방법에 관한 것으로, 본 발명에 따르면 극자외선을 사용하여 극자외선에 의한 퓨록산분자막의 변화를 유도하여 알카인(alkyne)화합물의 단분자막을 국소적으로 기판의 표면상에 형성시킬 수 있기 때문에 선택적으로 미세한 부분에 알카인(alkyne)화합물의 단분자막에 다른 화학분자를 반응시킬 수 있는 기초기술을 제공한다.
퓨록산, 극자외선, 자기조립분자막, 삼중결합
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