公开(公告)号：KR1020140104535A

公开(公告)日：2014-08-29

申请号：KR1020130017063

申请日：2013-02-18

Applicant: 한국과학기술연구원

Inventor： 전영민 ,  이석 ,  성하민 ,  조운조 ,  김용태 ,  우덕하 ,  김선호 ,  김재헌

IPC: G02B5/08 ,  G03F7/20

Abstract: The present invention relates to a mirror including a multilayer thin-film structure. The thin-film structure included in the mirror according to an embodiment of the present invention is formed by alternatively laminating a zirconium nitride (ZrN) layer and a silicon (Si) layer. The thickness of the Si layer is approximately 4.2 nm, and the thickness of the ZrN layer is approximately 2.66 nm.

Abstract translation: 本发明涉及一种包括多层薄膜结构的反射镜。 根据本发明的实施例的反射镜中包括的薄膜结构通过交替地层叠氮化锆（ZrN）层和硅（Si）层而形成。 Si层的厚度约为4.2nm，ZrN层的厚度约为2.66nm。