公开(公告)号：KR100784469B1

公开(公告)日：2007-12-11

申请号：KR1020070006232

申请日：2007-01-19

Applicant: 한국기계연구원

Inventor： 조성학 ,  임희원 ,  유병헌 ,  장원석 ,  김재구 ,  황경현 ,  손성향 ,  최경숙 ,  신상모

IPC: G01N33/48 ,  G01N21/33

Abstract: A device and a method for diagnosing normal cells or cancer cells are provided to prevent destruction of sample cells through an optical diagnosis technique, only require a single sample cell for the diagnosis and very accurately perform the cancer cell diagnosis. A device for diagnosing normal cells and cancer cells comprises a mount(110) in which a sample cell(10) to be diagnosed is mounted; a UV light source(120) which outputs UV light and applies the light through an objective lens(122) applied to the sample cell; a sensor portion(130) which measures a cell pass-through light source which is outputted after the UV light from the UV light source is applied to the sample cell and then passes through the sample cell; and a spectrum outputting portion(140) which outputs spectrum of the cell pass-through light source measured by the sensor portion. A method for diagnosing a normal cell or a cancer cell by using UV absorption spectrum comprises the steps of: (a) outputting UV light applied by a UV light source to a sample cell; (b) measuring a cell pass-through light source which is outputted by the UV light outputted from the UV light source being applied to the sample cell and then passing through the sample cell; and (c) outputting spectrum of the cell pass-through light source measured by the step(b).

Abstract translation: 提供用于诊断正常细胞或癌细胞的装置和方法以通过光学诊断技术来防止样品细胞的破坏，仅需要单个样品池进行诊断并非常准确地进行癌细胞诊断。 用于诊断正常细胞和癌细胞的装置包括其中安装有待诊断的样品池（10）的安装座（110） UV光源（120），其输出UV光并通过施加到样品池的物镜（122）施加光; 测量在来自UV光源的UV光之后输出的单元通过光源的传感器部分（130）被施加到样品池，然后通过样品池; 以及频谱输出部（140），其输出由所述传感器部测量的所述单元贯通光源的光谱。 通过使用紫外吸收光谱来诊断正常细胞或癌细胞的方法包括以下步骤：（a）将由UV光源施加的UV光输出到样品池; （b）测量从被施加到样品池的UV光源输出的UV光输出的单元通过光源，然后通过样品池; 和（c）输出由步骤（b）测量的单元通过光源的光谱。

公开(公告)号：KR100931001B1

公开(公告)日：2009-12-10

申请号：KR1020080042880

申请日：2008-05-08

Applicant: 한국기계연구원

Inventor： 조성학 ,  박정규 ,  유병헌 ,  장원석 ,  김재구 ,  최두선

IPC: H01L21/304 ,  H01L21/268

Abstract: PURPOSE: A dry cleaning method of a wafer by plasma formation induced is provided to remove a contaminant without damage to a substrate by outputting high peak output with low laser energy. CONSTITUTION: In a dry cleaning method of a wafer by plasma formation induced by a femtosecond laser, the femtosecond laser(110) is radiated to be parallel with a beam axis and a wafer surface so that the wafer surface(130) is cleaned. The beam of the femtosecond laser is implemented as a line plasma dot of self filament. The beam axis(A) of the femtosecond laser and the distance(D) of the wafer is 100~200um. A pulse width of the femtosecond laser is 100fs and the energy of the femtosecond laser is 3.0mJ. The femtosecond laser has a repetition rate of 1KHz, and an output of 1.15W, and a scan speed of 0.5nm.

Abstract translation: 目的：通过利用低激光能量输出高峰值输出，通过等离子体形成诱导的干式清洁方法提供去除污染物而不损坏基板。 本发明公开了一种飞秒激光器（110），通过由飞秒激光器引起的等离子体形成的干式清洁方法，发射与光束轴和晶片表面平行的飞秒激光器（110），从而清洁晶片表面（130）。 飞秒激光器的光束被实现为自丝灯的线等离子体点。 飞秒激光的光轴（A）与晶圆的距离（D）为100〜200um。 飞秒激光器的脉冲宽度为100fs，飞秒激光器的能量为3.0mJ。 飞秒激光器的重复频率为1KHz，输出功率为1.15W，扫描速度为0.5nm。

公开(公告)号：KR1020090117020A

公开(公告)日：2009-11-12

申请号：KR1020080042880

申请日：2008-05-08

Applicant: 한국기계연구원

Inventor： 조성학 ,  박정규 ,  유병헌 ,  장원석 ,  김재구 ,  최두선

IPC: H01L21/304 ,  H01L21/268

CPC classification number: H01L21/02098

Abstract: PURPOSE: A dry cleaning method of a wafer by plasma formation induced is provided to remove a contaminant without damage to a substrate by outputting high peak output with low laser energy. CONSTITUTION: In a dry cleaning method of a wafer by plasma formation induced by a femtosecond laser, the femtosecond laser(110) is radiated to be parallel with a beam axis and a wafer surface so that the wafer surface(130) is cleaned. The beam of the femtosecond laser is implemented as a line plasma dot of self filament. The beam axis(A) of the femtosecond laser and the distance(D) of the wafer is 100~200um. A pulse width of the femtosecond laser is 100fs and the energy of the femtosecond laser is 3.0mJ. The femtosecond laser has a repetition rate of 1KHz, and an output of 1.15W, and a scan speed of 0.5nm.

Abstract translation: 目的：提供通过等离子体形成诱导的晶片的干式清洗方法，通过以低激光能量输出高峰值输出来去除污染物而不损坏基板。 构成：在通过由飞秒激光引起的等离子体形成的晶片的干式清洗方法中，飞秒激光（110）被辐射以与光束轴和晶片表面平行，从而清洁晶片表面（130）。 飞秒激光的光束被实现为自细丝的线等离子体点。 飞秒激光的光束轴（A）和晶片的距离（D）为100〜200um。 飞秒激光的脉冲宽度为100fs，飞秒激光的能量为3.0mJ。 飞秒激光的重复频率为1KHz，输出为1.15W，扫描速度为0.5nm。

公开(公告)号：KR1020050026264A

公开(公告)日：2005-03-15

申请号：KR1020030063283

申请日：2003-09-09

Applicant: 한국기계연구원

Inventor： 신보성 ,  황경현 ,  장원석 ,  김재구 ,  유병헌

IPC: G01C3/06

Abstract: A laser range finder using a variable frequency principle is provided to reduce the size and the weight of the laser finder by using YAG laser. A laser range finder using a variable frequency principle includes a light emitting unit(30) and a light receiving unit(50). The light emitting unit(30) irradiates laser beams toward a target object to be measured by including a nonlinear optical crystal. The light receiving unit(50) receives laser beams reflected from the target object. The optical crystal includes an optical parametric oscillation crystal. The optical parametric oscillation crystal includes beta-barium borate(BBO). The light emitting unit(30) includes a Q-switch for sending laser having the strong pulse by using the optical parametric oscillation crystal.

Abstract translation: 提供使用可变频率原理的激光测距仪，通过使用YAG激光器来减小激光寻像器的尺寸和重量。 使用可变频率原理的激光测距仪包括发光单元（30）和光接收单元（50）。 发光单元（30）通过包括非线性光学晶体向待测对象物体照射激光束。 光接收单元（50）接收从目标物体反射的激光束。 光学晶体包括光学参量振荡晶体。 光参量振荡晶体包括硼酸钡 - 硼酸钡（BBO）。 发光单元（30）包括通过使用光学参量振荡晶体发送具有强脉冲的激光的Q开关。