반도체 패키지의 제조 방법

    公开(公告)号:KR102246076B1

    公开(公告)日:2021-05-03

    申请号:KR1020150161193

    申请日:2015-11-17

    Abstract: 본발명의반도체패키지의제조방법은패드를포함하는패키지기판을준비하는것, 상기패드상에솔더볼이배치되도록, 상기패키지기판상에상기솔더볼이부착된반도체칩을실장하는것, 상기패키지기판과상기반도체칩 사이에카복실기가포함된환원제를포함하는언더필수지를채우는것, 및상기반도체칩에레이저를조사하여상기솔더볼과상기패드를부착하는것을포함하되, 상기솔더볼과상기패드를부착하는것은조사된상기레이저에의해발생된열로인해상기패드및 상기솔더볼의표면들에형성된금속산화막이금속막으로바뀌는것을포함할수 있다.

    반도체 패키지 제조 방법
    4.
    发明公开
    반도체 패키지 제조 방법 审中-实审
    半导体封装制造方法

    公开(公告)号:KR1020170141108A

    公开(公告)日:2017-12-22

    申请号:KR1020170024973

    申请日:2017-02-24

    CPC classification number: H01L2924/15311 H01L2924/3511

    Abstract: 반도체패키지제조방법은하부패키지기판을제공하는것, 하부패키지기판상에제1 메탈로드를형성하는것, 및제1 메탈로드상에상부패키지기판을형성하는것을포함하되, 제1 메탈로드및 상부패키지기판을형성하는것은 3D 프린팅공정을포함하고, 상부패키지기판은제1 메탈로드의직경보다작은직경을갖는제1 도전성라인및 제1 도전성라인을둘러싸는절연층을포함하며, 제1 도전성라인은절연층을관통하여제1 메탈로드에전기적으로연결된다.

    Abstract translation: 一种制造半导体封装的方法包括提供下封装衬底,在下封装衬底上形成第一金属棒,以及在第一金属棒上形成上封装衬底,其中第一金属棒和上封装衬底 成形包括3D打印过程,其中顶部封装衬底包括具有比第一金属棒的直径小的直径的第一导线和围绕第一导线的绝缘层, 并电连接到第一金属棒。

    웨이퍼 레벨 패키지를 위한 웨이퍼 고정 장치
    6.
    发明公开
    웨이퍼 레벨 패키지를 위한 웨이퍼 고정 장치 审中-实审
    WAFER控制器用于水平包装

    公开(公告)号:KR1020140078143A

    公开(公告)日:2014-06-25

    申请号:KR1020120147164

    申请日:2012-12-17

    Inventor: 배현철

    CPC classification number: H01L21/6838 B25J15/0616 B25J15/0683 H01L21/67379

    Abstract: The present invention relates to a wafer holding apparatus which is provided to hold a wafer and to accurately align and print the wafer in a process of bonding and packaging wafers for a semiconductor device and a cap, and which comprises: a carrier provided with a mounting groove for mounting the wafer; a vacuum supply hole passing through the mounting groove and supplying vacuum force to attach the wafer; and a rail unit guiding the side of the carrier and moving the carrier.

    Abstract translation: 晶片保持装置技术领域本发明涉及一种晶片保持装置,其设置成在晶片的半导体器件和盖子的接合和封装的过程中精确地对准和打印晶片,并且包括:载体,其具有安装件 用于安装晶片的槽; 真空供给孔穿过安装槽并提供真空力以附着晶片; 以及轨道单元,引导载体的一侧并移动载体。

    하부 인덕터를 포함하는 실리콘 인터포저
    9.
    发明公开
    하부 인덕터를 포함하는 실리콘 인터포저 无效
    硅离子包括背电感器

    公开(公告)号:KR1020130037609A

    公开(公告)日:2013-04-16

    申请号:KR1020110102108

    申请日:2011-10-06

    Abstract: PURPOSE: A silicon interposer including a lower inductor is provided to form an inductor in the upper and the lower surface of a silicon substrate, thereby reducing the total area of a semiconductor package. CONSTITUTION: An upper inductor layer is formed in the upper part of a silicon substrate(201). The upper inductor layer includes a first upper insulating layer(203), a first upper metal layer(205), a second upper metal layer(207), a second upper insulating layer(209), and a first via(211). A lower inductor layer is formed in the lower part of the silicon substrate. The lower inductor layer includes a first lower insulating layer(213), a first lower metal layer(215), a second lower metal layer(217), a second lower insulating layer(219), and a second via(221). A through silicon via(301) electrically connects the upper inductor and the lower inductor.

    Abstract translation: 目的:提供包括下电感器的硅插入器以在硅衬底的上表面和下表面中形成电感器,从而减少半导体封装的总面积。 构成:在硅衬底(201)的上部形成上电感层。 上电感层包括第一上绝缘层(203),第一上金属层(205),第二上金属层(207),第二上绝缘层(209)和第一通孔(211)。 在硅衬底的下部形成有较低的电感层。 下电感层包括第一下绝缘层(213),第一下金属层(215),第二下金属层(217),第二下绝缘层(219)和第二通孔(221)。 贯通硅通孔(301)电连接上部电感器和下部电感器。

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