公开(公告)号：KR101429524B1

公开(公告)日：2014-08-14

申请号：KR1020130053757

申请日：2013-05-13

Applicant: 한양대학교 에리카산학협력단

Inventor： 박진구 ,  한동호 ,  하산하피즈 ,  류헌열 ,  조시형

IPC: H01L21/027

CPC classification number: H01L21/0274 ,  G03F7/004

Abstract: According to the present invention, a 3D fine structure forming method using diffuser lithography includes a step of applying a sensitizer onto a substrate; a step of forming a pattern of a mask; a step of emitting light; and a step of forming a 3D structure on the sensitizer by using a developer. In the light emitting step, light scattered from more than two kinds of diffusers is emitted to the sensitizer through the mask. According to another type of the present invention, the diffuser is a diffuser applied to the 3D fine structure forming method using diffuser lithography and is characterized in that two kinds of diffusers are overlapped with each other. With the present invention, various 3D structures, having a lower gradient and thinner thickness than existing diffuser lithography, are made by using complexly formed light. Moreover, the present invention forms a 3D fine structure having an inclined cross section through a simpler facility in comparison with the former technology. The present invention enables mass production by using a lithography process.

Abstract translation: 根据本发明，使用漫射光刻的3D精细结构形成方法包括将敏化剂施加到基底上的步骤; 形成掩模图案的步骤; 发光的一步; 以及通过使用显影剂在敏化剂上形成3D结构的步骤。 在发光步骤中，从两种扩散器散射的光通过掩模发射到敏化剂。 根据本发明的另一种类型，扩散器是应用于使用漫射光刻的3D精细结构形成方法的扩散器，其特征在于两种扩散器彼此重叠。 利用本发明，通过使用复合形成的光来制造具有比现有扩散器光刻更低的梯度和更薄的厚度的各种3D结构。 此外，与前述技术相比，本发明通过更简单的设备形成具有倾斜横截面的3D精细结构。 本发明可以通过使用光刻工艺进行批量生产。