Abstract:
Provided is a photosensitive composition employing, as a photopolymerization initiator, a compound useful as a highly-sensitive photopolymerization initiator that has excellent stability and low sublimability, and that efficiently absorbs and is activated by near-ultraviolet rays at, for example, 365 nm. A photosensitive composition includes a photopolymerization initiator including General Formula (I) below (A), and a polymerizable compound having an ethylenically unsaturated bond (B). Preferred, among compounds represented by General Formula (I), are compounds in which R 10 is a hydrogen atom, or a C 1-12 alkyl group that is not substituted or that is substituted by a hydroxyl group, a carboxyl group, a halogen atom, a cyano group, or a nitro group.
Abstract:
Provided is an ±-aminoalkylphenone compound that has good stability and low sublimability, efficiently generates radicals when irradiated with a bright line at 365 nm (i line) or the like, and is useful as a polymerization initiator to be used in a radically polymerizable composition. The ±-aminoalkylphenone compound is represented by Formula (I) mentioned below. In Formula (I) mentioned above, it is preferable that R 11 is a nitro group, an alkoxy group having 1 to 12 carbon atoms, or an alkoxycarbonyl group having 1 to 12 carbon atoms. The ±-aminoalkylphenone compound can be preferably used in a polymerization initiator.
Abstract:
Provided is an ±-aminoalkylphenone compound that has good stability and low sublimability, efficiently generates radicals when irradiated with a bright line at 365 nm (i line) or the like, and is useful as a polymerization initiator to be used in a radically polymerizable composition. The ±-aminoalkylphenone compound is represented by Formula (I) mentioned below. In Formula (I) mentioned above, it is preferable that R 11 is a nitro group, an alkoxy group having 1 to 12 carbon atoms, or an alkoxycarbonyl group having 1 to 12 carbon atoms. The ±-aminoalkylphenone compound can be preferably used in a polymerization initiator.
Abstract:
PROBLEM TO BE SOLVED: To provide a heat-resistive adhesive excellent in adhesivity and heat resistance, and having an exact positional selectivity by photocuring.SOLUTION: The heat-resistive adhesive essentially contains (1) an epoxy resin, (2) a radical curing resin, (3) a photoradical initiator, and (4) a latent epoxy curing agent obtained by reacting (a) an amine compound represented by formula (I), (b) a polyamine compound having two or more amino groups in the molecule, (c) an organic polyisocyanate compound and (d) an epoxy compound. In the formula, Rand Rare each independently a 1-8C alkyl group, or mutually bond to form an alkylene group, and the alkylene group may contain an oxygen atom or a nitrogen atom; and n is an integer of 1 to 6.
Abstract:
PROBLEM TO BE SOLVED: To provide a photocurable composition that is superior in sensitivity, heat resistance, application properties, solvent resistance and transferability.SOLUTION: A photocurable composition contains a bifunctional epoxy compound (A) represented by general formula (I), a novolak epoxy compound (B) and a photocationic polymerization initiator (C), where M is fluorene, indan, or a phenyl-substituted alkylene group, R, R, R, R, R, R, Rand Rrepresent independently a hydrogen atom or the like, and n is an integer of 0-10.
Abstract:
PROBLEM TO BE SOLVED: To provide a photocurable resin composition which excels in heat resistance and transparency, and can suppress yellowing at the time of curing, and to provide its cured product.SOLUTION: The photocurable resin composition includes (1) 100 pts.mass of a cationically polymerizable organic substance expressed by general formula (I) or the like, and (2) 0.001-10 pts.mass of an energy ray-sensitive cationically polymerizable initiator, and does not include an acrylate compound. In addition, a cured product which is obtained by curing the photocurable resin composition is disclosed. In the formula, Zdenotes a single bond or a 1-4C alkylene group, a methylene group in the alkylene group may be a straight chain, may have a branched chain, or may be annular, may be substituted by a methyl group, or may be interrupted by -CO-O- or -O-CO-, Rand Reach independently denote a halogen atom, a and b each independently denote the number of 0-10, and p denotes the number of 0-5.
Abstract:
PROBLEM TO BE SOLVED: To provide a photocurable resin composition which excels in heat resistance and transparency, and can suppress yellowing at the time of curing, and to provide its cured product.SOLUTION: The photocurable resin composition includes (1) 100 pts.mass of a cationically polymerizable organic substance expressed by general formula (I) or the like, and (2) 0.001-10 pts.mass of an energy ray-sensitive cationically polymerizable initiator, and does not include an acrylate compound. In addition, a cured product which is obtained by curing the photocurable resin composition is disclosed. In the formula, Z denotes a single bond or a 1-4C alkylene group, a methylene group in the alkylene group may be replaced with a methyl group or a halogen atom, R-Reach independently denote a hydrogen atom or a 1-4C alkyl group, and p and q each independently denote the number of 0-5.