公开(公告)号：AT547399T

公开(公告)日：2012-03-15

申请号：AT10015054

申请日：2010-11-26

Applicant: ADEKA CORP

Inventor： MURATA KIYOSHI ,  OISHI TAKEO ,  KIMIJIMA KOICHI

IPC: C07C323/47 ,  C07C251/66 ,  C07C251/68 ,  C07C323/65 ,  C07C391/02 ,  C07F9/50 ,  C08F2/50

Abstract: The invention provides a novel compound useful as a highly-sensitive photopolymerization initiator that has excellent stability, low sublimability, excellent developability, and high transmittance in the visible region and that efficiently absorbs, and is activated by, near-ultraviolet rays such as at 365 nm. Also provided are a photopolymerization initiator and a photosensitive composition using the above-described compound. Specifically, the invention provides an oxime ester compound represented by the following general formula (I), a photopolymerization initiator containing the same, and a photosensitive composition containing the photopolymerization initiator and a polymerizable compound having an ethylenically unsaturated bond: wherein, R 1 and R 2 each represent R 11 , COR 11 , CONR 12 R 13 , CN, etc.; R 11 , R 12 , and R 13 each represent a C 1-20 alkyl group, etc.; R 3 and R 4 each represent R 11 , OR 11 , COR 11 , CONR 12 R 13 , OCOR 11 , CN, a halogen atom, etc.; a and b each represent an integer of 0 to 4; X represents an oxygen atom, a sulfur atom, etc.; and R 5 represents OH, COOH, or a group represented by general formula (II).

公开(公告)号：EP2072500A4

公开(公告)日：2010-12-22

申请号：EP07851050

申请日：2007-12-21

Applicant: ADEKA CORP

Inventor： SAWAMOTO DAISUKE ,  KIMIJIMA KOICHI ,  MURATA KIYOSHI ,  KOZAKI YASUNORI ,  OISHI TAKEO

IPC: C07D209/88 ,  C08F2/50 ,  G03F7/004 ,  G03F7/031

CPC classification number: C08F2/50 ,  C07D209/88 ,  G03F7/0045 ,  G03F7/031

Abstract: An oxime ester compound represented by general formula (I): wherein R 1 , R 2 , and R 3 each independently represent R 11 , OR 11 , COR 11 , SR 11 , CONR 12 R 13 , or CN; R 11 , R 12 , and R 13 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms, R 4 and R 5 each independently represent R 11 , OR 11 , SR 11 , COR 11 , CONR 12 R 13 , NR 12 COR 11 , OCOR 11 , COOR 11 , SCOR 11 , OCSR 11 , COSR 11 , CSOR 11 , CN, a halogen atom, or a hydroxyl group; and a and b each independently represent 0 to 3.

公开(公告)号：EP3127898A4

公开(公告)日：2017-11-08

申请号：EP15773324

申请日：2015-03-30

Applicant: ADEKA CORP

Inventor： KOMIYAMA YOKO ,  OISHI TAKEO ,  ARIYOSHI TOMOYUKI ,  TAMACHI TOMOYA ,  IKAGA TAKAYUKI ,  SATO NAOMI

IPC: C07D209/14 ,  C08F2/50 ,  G03F7/004 ,  G03F7/027 ,  G03F7/031

CPC classification number: C07D487/06 ,  C07D209/14 ,  C07D209/56 ,  C07D209/60 ,  C07D401/04 ,  C07D405/04 ,  C07D409/04 ,  C07D409/10 ,  C07D471/04 ,  C08F2/50 ,  G03F7/031 ,  G03F7/032 ,  G03F7/0388

公开(公告)号：EP2829534A4

公开(公告)日：2015-12-30

申请号：EP13764684

申请日：2013-03-05

Applicant: ADEKA CORP

Inventor： OISHI TAKEO ,  KIMIJIMA KOICHI ,  TOMINAGA NOBUHIDE ,  SHINANO HIROKATSU ,  SAWAMOTO DAISUKE ,  MURATA KIYOSHI

IPC: C07D209/86 ,  C07D209/88 ,  C07D401/12 ,  C07D403/12 ,  G03F7/004 ,  G03F7/028 ,  G03F7/031 ,  G03F7/038

CPC classification number: G03F7/0045 ,  C07D209/86 ,  C07D209/88 ,  C07D211/70 ,  C07D233/06 ,  C07D241/06 ,  C07D401/12 ,  C07D403/12 ,  G03F7/038

Abstract: A novel compound having satisfactory sensitivity (base generating performance), a photosensitive resin composition containing the compound as a photo-initiator, and a cured product of the composition are provided. Specifically, a compound represented by general formula (1) (compound (1)), a photosensitive resin composition containing (A) a photo-initiator comprising at least one compound (1) and (B) a photosensitive resin are provided. Preferred are the compound (1) in which R 1 is an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, the compound (1) in which at least one of R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , and R 11 is nitro, and the compound (1) in which n is 0. The symbols in general formula (1) are as defined in the description.

公开(公告)号：JP2017078049A

公开(公告)日：2017-04-27

申请号：JP2015207948

申请日：2015-10-22

Applicant: 株式会社Adeka ,  Adeka Corp ,  株式会社Adeka

Inventor： OISHI TAKEO ,  MURATA SEI ,  SATO NAOMI

IPC: C07C251/66 ,  C07D307/12 ,  G02B5/20 ,  G03F7/031

Abstract: 【課題】低昇華性で、365nm等の近紫外光を吸収し活性化される高感度の重合開始剤として新規な化合物及び該化合物を用いた重合開始剤並びに感光性組成物の提供。【解決手段】式(I)で表される新規なオキシムエステル化合物及び該化合物を用いた重合開始剤。(R1はシクロペンチルメチル基等;R2はメチル基等;R3〜R6,R8,R9は夫々H等;R7はメトキシ基等)【選択図】なし

公开(公告)号：JP2011132215A

公开(公告)日：2011-07-07

申请号：JP2010225063

申请日：2010-10-04

Applicant: Adeka Corp ,  株式会社Adeka

Inventor： MURATA SEI ,  OISHI TAKEO ,  KIMIJIMA KOICHI

IPC: C07C321/30 ,  C07C319/20 ,  G02B5/20 ,  G03F7/004 ,  G03F7/031

CPC classification number: C08F2/50 ,  B33Y70/00 ,  C07C251/66 ,  C07C323/47 ,  C07C323/65 ,  C07C391/02 ,  C07C2601/14 ,  C07F9/5022 ,  G03F7/0042 ,  G03F7/0045 ,  G03F7/031 ,  G03F7/033 ,  G03F7/105 ,  Y10S430/114

Abstract: PROBLEM TO BE SOLVED: To provide a new compound excellent in stability, having a low sublimating property, excellent in developing property, having high transmittance in a visible light region and useful as a highly sensitive photopolymerization initiator activated by absorbing a near ultraviolet light at 365 nm etc., in a good efficiency, and a photopolymerization initiator and a photosensitive composition by using the same compound. SOLUTION: This oxime ester compound is expressed by general formula (I), and the photopolymerization initiator containing the compound and a photosensitive composition obtained by incorporating a polymerizable compound having an ethylenically unsaturated bond to the photopolymerization initiator are provided. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供稳定性优异的新型化合物，其显影性能优异，在可见光区域具有高透射率，并且可用作通过吸收近紫外线而被活化的高灵敏度光聚合引发剂 光照365nm等，效率高，光聚合引发剂和感光性组合物使用相同的化合物。 解决方案：该肟酯化合物由通式（I）表示，并且提供了含有化合物的光聚合引发剂和通过将具有烯键式不饱和键的聚合性化合物引入光聚合引发剂得到的感光性组合物。 版权所有（C）2011，JPO＆INPIT