Device with a charged beam
    1.
    发明专利

    公开(公告)号:DE4408523A1

    公开(公告)日:1994-09-29

    申请号:DE4408523

    申请日:1994-03-14

    Abstract: A device with a charged beam has the following features: a vacuum chamber with a motion mechanism on the inside and a sample chamber (compartment). The sample chamber used is placed in an ultrahigh vacuum atmosphere or a gas atmosphere, a flat surface being formed on that surface of the motion mechanism which points towards the sample chamber and a flange having a flat open surface being arranged between the vacuum chamber and the sample chamber such that the open surface is opposite the flat surface, and is specifically formed with a small slot between the open surface and the flat surface to permit vacuum ventilation without any restrictions being placed on the motion mechanism, as a result of which the device operates without restricting the effect of the motion mechanism.

    2.
    发明专利
    未知

    公开(公告)号:NL194745B

    公开(公告)日:2002-09-02

    申请号:NL9400393

    申请日:1994-03-11

    Abstract: A charged beam apparatus comprising a vacuum chamber having a moving mechanism inside and a sample chamber, the sample chamber being used placed in an ultra-high vacuum atmosphere or a gas atmosphere, wherein a flat surface is formed on that surface of the moving mechanism which faces the sample chamber, and a flange having a flat open surface is mounted between the vacuum chamber and the sample chamber such that the open surface is opposed to the flat surface with a tiny gap being formed between the open surface and the flat surface for permitting vacuum venting without imposing any restrictions on the moving mechanism, whereby the apparatus operates without restricting the action of the moving mechanism.

    3.
    发明专利
    未知

    公开(公告)号:DE4408523C2

    公开(公告)日:2002-11-28

    申请号:DE4408523

    申请日:1994-03-14

    Abstract: A charged beam apparatus comprising a vacuum chamber having a moving mechanism inside and a sample chamber, the sample chamber being used placed in an ultra-high vacuum atmosphere or a gas atmosphere, wherein a flat surface is formed on that surface of the moving mechanism which faces the sample chamber, and a flange having a flat open surface is mounted between the vacuum chamber and the sample chamber such that the open surface is opposed to the flat surface with a tiny gap being formed between the open surface and the flat surface for permitting vacuum venting without imposing any restrictions on the moving mechanism, whereby the apparatus operates without restricting the action of the moving mechanism.

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