公开(公告)号：DE4408523C2

公开(公告)日：2002-11-28

申请号：DE4408523

申请日：1994-03-14

Applicant: AGENCY IND SCIENCE TECHN

Inventor： OKAYAMA SHIGEO ,  OGURA MUTSUO ,  KOMURO MASANORI ,  HIROSHIMA HIROSHI

IPC: H01J37/18 ,  H01J37/20 ,  H01J37/28 ,  H01J37/305 ,  H01L21/027

Abstract: A charged beam apparatus comprising a vacuum chamber having a moving mechanism inside and a sample chamber, the sample chamber being used placed in an ultra-high vacuum atmosphere or a gas atmosphere, wherein a flat surface is formed on that surface of the moving mechanism which faces the sample chamber, and a flange having a flat open surface is mounted between the vacuum chamber and the sample chamber such that the open surface is opposed to the flat surface with a tiny gap being formed between the open surface and the flat surface for permitting vacuum venting without imposing any restrictions on the moving mechanism, whereby the apparatus operates without restricting the action of the moving mechanism.

公开(公告)号：DE4408523A1

公开(公告)日：1994-09-29

申请号：DE4408523

申请日：1994-03-14

Applicant: AGENCY IND SCIENCE TECHN

Inventor： OKAYAMA SHIGEO ,  OGURA MUTSUO ,  KOMURO MASANORI ,  HIROSHIMA HIROSHI

IPC: H01J37/18 ,  H01J37/20 ,  H01J37/28 ,  H01J37/305 ,  H01L21/027 ,  H01J37/30 ,  G01N27/62

Abstract: A device with a charged beam has the following features: a vacuum chamber with a motion mechanism on the inside and a sample chamber (compartment). The sample chamber used is placed in an ultrahigh vacuum atmosphere or a gas atmosphere, a flat surface being formed on that surface of the motion mechanism which points towards the sample chamber and a flange having a flat open surface being arranged between the vacuum chamber and the sample chamber such that the open surface is opposite the flat surface, and is specifically formed with a small slot between the open surface and the flat surface to permit vacuum ventilation without any restrictions being placed on the motion mechanism, as a result of which the device operates without restricting the effect of the motion mechanism.

公开(公告)号：NL194745C

公开(公告)日：2003-01-07

申请号：NL9400393

申请日：1994-03-11

Applicant: AGENCY IND SCIENCE TECHN

Inventor： OKAYAMA SHIGEO ,  OGURA MUTSUO ,  KOMURO MASANORI ,  HIROSHIMA HIROSHI

IPC: H01J37/18 ,  H01J37/20 ,  H01J37/28 ,  H01J37/305 ,  H01L21/027

公开(公告)号：NL194745B

公开(公告)日：2002-09-02

申请号：NL9400393

申请日：1994-03-11

Applicant: AGENCY IND SCIENCE TECHN

Inventor： OKAYAMA SHIGEO ,  OGURA MUTSUO ,  KOMURO MASANORI ,  HIROSHIMA HIROSHI

IPC: H01J37/18 ,  H01J37/20 ,  H01J37/28 ,  H01J37/305 ,  H01L21/027

Abstract: A charged beam apparatus comprising a vacuum chamber having a moving mechanism inside and a sample chamber, the sample chamber being used placed in an ultra-high vacuum atmosphere or a gas atmosphere, wherein a flat surface is formed on that surface of the moving mechanism which faces the sample chamber, and a flange having a flat open surface is mounted between the vacuum chamber and the sample chamber such that the open surface is opposed to the flat surface with a tiny gap being formed between the open surface and the flat surface for permitting vacuum venting without imposing any restrictions on the moving mechanism, whereby the apparatus operates without restricting the action of the moving mechanism.

公开(公告)号：JPS62229742A

公开(公告)日：1987-10-08

申请号：JP7385686

申请日：1986-03-31

Applicant: AGENCY IND SCIENCE TECHN

Inventor： KOMURO MASANORI ,  TAMURA YOSHIHIRO

IPC: H01J37/12 ,  G06F17/50 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To make it possible to judge merits and demerits of a systematic property while shortening calculation time by analytically finding a change of a lens property to an analogous change of a geometric size. CONSTITUTION:As an independent parameter, in addition to an analogous ratio (g) of a geometrical size in a form of a certain lens electrode, two of four of lens excitation (a rtio of lens impression voltage to changed particle source impression voltage), a lens magnification, a distance between the image surface and the lens, a distance between the object surface and the lens are taken for calculating potential distribution and orbit in a certain one value of (g) to find a relation of a lens property to lens excitation. Then, a lens form is optimized by calculating the lens property to a change of the value of (g) in the value specified of two independent parameters. Thereby, calculation time can be shortened to judge merits and demerits of a systematic property.

公开(公告)号：JPH05129245A

公开(公告)日：1993-05-25

申请号：JP10218992

申请日：1992-03-27

Applicant: AGENCY IND SCIENCE TECHN

Inventor： KOMIYA YOSHIO ,  KOMURO MASANORI

IPC: H01L21/268 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065

Abstract: PURPOSE:To put forward a technique which enables more efficient various processes when a pattern is directly drawn on a substrate using an ion beam. CONSTITUTION:An ion beam 1 with a pattern data is irradiated substantially at right angle to a substrate 3 housed in a reacting chamber 7. At the same time, a light energy beam 13 is irradiated through optical means 14, 15, 16, 17 and 18 to the substrate at an inclination relative to the direction of irradiation of the ion beam. Only areas corresponding to the pattern data are subject to variations of substance resulting from a reaction effect between the ion beam 1 and the light energy beam 13.

公开(公告)号：JPH03215389A

公开(公告)日：1991-09-20

申请号：JP952290

申请日：1990-01-19

Applicant: AGENCY IND SCIENCE TECHN

Inventor： OGURA MUTSURO ,  KOMURO MASANORI ,  SHIMIZU KEIZO

IPC: C30B23/08 ,  H01L21/203 ,  H01L21/285

Abstract: PURPOSE:To deposit a metal film or semiconductor film to a substrate in a high revolution at a high speed by holding the substrate in a vacuum chamber, taking out an ionic source material with an electrostatic force in a cluster state and scanning the cluster ions in a specific state. CONSTITUTION:A substrate is held in a vacuum-adjustable chamber in a heated state. A liquid compound depositing to the substrate as a metal film or semiconductor film when thermally decomposed on the heated substrate is taken out as an ion source material in a cluster ion state with an electrostatic force. The taken cluster ion beam is collected with a collection system and with a polarization system using a cluster ion source device. The cluster ion beam is scanned with the polarization system of the cluster ion source device according to a prescribed pattern to selectively deposit a metal film or semiconductor film having a plain shape corresponding to the pattern to the substrate.

公开(公告)号：JPH1062347A

公开(公告)日：1998-03-06

申请号：JP21620796

申请日：1996-08-16

Applicant: AGENCY IND SCIENCE TECHN

Inventor： TANI TOSHIAKI ,  KOMURO MASANORI ,  ITO JUNJI ,  MAACHIN BATSUHA

IPC: G01N21/64 ,  G01N21/01 ,  G01N21/03

Abstract: PROBLEM TO BE SOLVED: To provide an extremely small-sized single molecular fine optical device which is easily and stably operable with hardly having a regulating part, and enhance the converging efficiency o/f signal light to realize the accumulation of necessary functions basically with one optical element. SOLUTION: An excited light is emitted to a sample through a cover glass 4, and the signal light from the sample is taken as parallel beams through a rod type lens 1 and sent to a light detector. Tungsten is evaporated on one end surface of the rod type lens 1 (pitch 0,.25) as a thin film 2 of 0.5μm thick, an aperture about 4μm in diameter is formed in the center of the thin film by use of focused ion beam method using divalent gold ion, the cover glass 4 of 0.15μmm thick is put on the aperture to form a sample space 3, and the sample is put in the sample space 3, whereby a single molecular spectrometric device is constituted. When a single mode pigment laser in the wavelength range of 570nm is used as an excitation light source, and the wavelength is scanned to measure the excited spectrum, a single spectrum is provided.

公开(公告)号：JPH024959A

公开(公告)日：1990-01-09

申请号：JP15348688

申请日：1988-06-23

Applicant: AGENCY IND SCIENCE TECHN ,  TOSHIBA CORP

Inventor： TOKUMOTO HIROSHI ,  OKAYAMA SHIGEO ,  KOMURO MASANORI

IPC: C23C14/22 ,  C23C14/54 ,  G01Q60/10 ,  G01Q80/00 ,  H01L21/285 ,  H01L21/3205

Abstract: PURPOSE:To keep the width of the deposited metallic material constant irrespective of the shape of the tip of an electrode by alternately carrying out the control of the distance between the surface of a substrate and the electrode tip and the emission of metal atom to accurately control the distance in the title device wherein the metal atom is emitted from the electrode tip. CONSTITUTION:DC power sources 25 and 26 are connected between an electrode 21 and a substrate 12 through a transfer switch 24, one of the power sources 25 and 26 is selected by the changeover of the switch 24, and a voltage is impressed between the electrode and substrate. The power source 25 is used to emit metal atom from the tip of the electrode 21, and the power source 26 is used to detect the tunnel current between the electrode 21 and the substrate 12. An amperemeter 27 is connected to the power source 26 in series to detect the tunnel current, and the detected tunnel current is supplied to a driving power source 23, a fine adjustment mechanism 22 is adjusted to keep the tunnel current constant, and the distance between the electrode tip and the substrate surface is kept constant.

公开(公告)号：JPH06283124A

公开(公告)日：1994-10-07

申请号：JP9079293

申请日：1993-03-25

Applicant: AGENCY IND SCIENCE TECHN

Inventor： OKAYAMA SHIGEO ,  OGURA MUTSURO ,  KOMURO MASANORI ,  HIROSHIMA HIROSHI

IPC: H01J37/18 ,  H01J37/20 ,  H01J37/28 ,  H01J37/305 ,  H01L21/027

Abstract: PURPOSE:To keep chambers having different degrees of vacuum at the desired degrees of vacuum and drive a structure having a high function by forming a gap made of a concentric plane between a sample chamber and a vacuum chamber. CONSTITUTION:When the diameter of the sample moving shaft of an actuator 45 is set to 20mm and the driving range of a sample moving mechanism 51 is set to + or -1 inch in the X, Y-axis directions, the fine gap between an opening flange 43 and a moving mechanism flange 56 can be adjusted by about 0.15mm. When the width of the gap is set to 10mm, the exhaust conductance of this portion becomes about C=0.33 1/sec. A sample chamber 4 can be used within the range from the ultrahigh vacuum of 10 Pa or below to the gas introduction of about 10 Pa while the degree of vacuum of a stage chamber 5 including the mechanism 51 is kept at about 4X10 Pa. A sample stage and a laser interference mirror section are heat-insulated, and they can be driven with high precision.