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    Shutter member, lithographic apparatus and device manufacturing method
    3.
    发明专利
    Shutter member, lithographic apparatus and device manufacturing method 有权
    SHUTTER会员，LITHOGRAPHIC设备和设备制造方法

    公开(公告)号：JP2011061199A

    公开(公告)日：2011-03-24

    申请号：JP2010199597

    申请日：2010-09-07

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KANEKO TAKESHI ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  DZIOMKINA NINA VLADIMIROVNA ,  KRUIZINGA MATTHIAS

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70733

    Abstract: PROBLEM TO BE SOLVED: To reduce the risk of an interference with a positioning system of an immersion liquid. SOLUTION: An immersion lithographic apparatus contains a substrate table, a fluid handling structure and a swap table. The substrate table is configured to support a substrate. The fluid handling structure is configured to supply and confine the immersion liquid to a space demarcated between a projection system and the substrate table, between the projection system and the substrate, or the both. The swap table includes, for example, a shutter surface configured to be under the fluid handling structure during swapping of the substrate on the substrate table. When used, a transfer surface between the surface of the substrate table and the surface of the swap table is moved under the fluid handling structure to contribute to inhibit leakage of the immersion liquid. A shutter member and the method are also disclosed. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：减少与浸没液体的定位系统的干扰的风险。 解决方案：浸没式光刻设备包含基板台，流体处理结构和互换台。 衬底台被配置为支撑衬底。 流体处理结构构造成将浸没液体供应并限制在投影系统和基板台之间，投影系统和基板之间或两者之间划分的空间。 交换台包括例如在基板在基板台上交换期间构造成处于流体处理结构下方的快门表面。 当使用时，衬底台的表面和互换台的表面之间的转印面在流体处理结构下移动以有助于抑制浸没液体的泄漏。 还公开了一种快门构件和方法。 版权所有（C）2011，JPO＆INPIT

    Lithographic apparatus provided with swap bridge
    4.
    发明专利
    Lithographic apparatus provided with swap bridge 有权
    提供交流桥的平面设备

    公开(公告)号：JP2010123960A

    公开(公告)日：2010-06-03

    申请号：JP2009261452

    申请日：2009-11-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KRUIZINGA MATTHIAS ,  AUER FRANK ,  FRANSICUS MATHIJS JACOBS ,  HENSEN RONNIE HERMAN ANNA

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70733

    Abstract: PROBLEM TO BE SOLVED: To prevent position precision from being reduced when a table etc., is moved. SOLUTION: A lithographic apparatus includes two stages that are each configured to hold a substrate, wherein each stage is provided with a short stroke module to move a table with a substrate and a long stroke module to move the short stroke module of that stage. The lithographic apparatus includes a swap bridge to couple the stages, and wherein, in use, in a first configuration, the stages are moveable with respect to each other, and wherein, in use, in a second configuration, the stages are coupled via the swap bridge to make a joint movement. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：当移动桌子等时，防止位置精度降低。 解决方案：光刻设备包括两个各自被配置为保持基板的阶段，其中每个阶段设置有短行程模块以便移动具有基板的台面和长行程模块以移动该行程模块 阶段。 光刻设备包括用于耦合级的交换桥，并且其中在使用中，在第一配置中，所述级可相对于彼此移动，并且其中，在使用中，在第二配置中，所述级经由 互换桥联合运动。 版权所有（C）2010，JPO＆INPIT

    MASK ASSEMBLY AND ASSOCIATED METHODS
    5.
    发明申请
    MASK ASSEMBLY AND ASSOCIATED METHODS 审中-公开
    面罩组件和相关方法

    公开(公告)号：WO2016124536A3

    公开(公告)日：2016-10-06

    申请号：PCT/EP2016052055

    申请日：2016-02-01

    Applicant: ASML NETHERLANDS BV

    Inventor： BROUNS DERK SERVATIUS GERTRUDA ,  DE GRAAF DENNIS ,  DE KRUIF ROBERTUS CORNELIS MARTINUS ,  JANSSEN PAUL ,  KRUIZINGA MATTHIAS ,  NOTENBOOM ARNOUD WILLEM ,  SMITH DANIEL ANDREW ,  VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN ,  WILEY JAMES NORMAN

    IPC: G03F1/00 ,  G03F1/62 ,  G03F1/66 ,  G03F1/84

    CPC classification number: G03F1/62 ,  G03F1/66 ,  G03F1/84

    Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

    Abstract translation: 一种方法，包括以下步骤：接收包括掩模和由薄膜框架保持的可移除EUV透明薄膜的掩模组件，使用检查工具从掩模移除薄膜框架和EUV透明薄膜，以检查掩模上的掩模图案， 随后将由EUV透明薄膜保持在薄膜框架上的面罩附着在面罩上。 所述方法还可以包括以下步骤：在从所述掩模移除所述薄膜框架和所述EUV透明薄膜之后，将替代的薄膜框架附接到所述掩模，所述薄膜框架保持由对所述检查工具的检查梁基本上透明的材料形成的替代薄膜 ; 并且在使用检查工具检查掩模上的掩模图案之后，从掩模去除由替代薄膜框架保持的替代薄膜，以便将由薄膜框架保持的EUV透明薄膜附着到掩模。

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