公开(公告)号：US20170205704A1

公开(公告)日：2017-07-20

申请号：US15320749

申请日：2015-07-02

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Vadim Yevgenyevich BANINE ,  Jozef Petrus Henricus BENSCHOP ,  Arjen BOOGAARD ,  Florian Didier Albin DHALLUIN ,  Alexey Sergeevich KUZNETSOV ,  Mária PÉTER ,  Luigi SCACCABAROZZI ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Andrei Mikhailovich YAKUNIN

IPC: G03F1/62 ,  G02B5/20 ,  G03F1/38 ,  G02B5/18 ,  G03F1/24 ,  G03F7/20

CPC classification number: G03F1/62 ,  G02B5/1838 ,  G02B5/208 ,  G03F1/24 ,  G03F1/38 ,  G03F7/70191 ,  G03F7/70316 ,  G03F7/70575 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983

Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.

公开(公告)号：US20220035239A1

公开(公告)日：2022-02-03

申请号：US17278356

申请日：2019-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter-Jan VAN ZWOL ,  Sander BALTUSSEN ,  Dennis DE GRAAF ,  Johannes Christiaan Leonardus FRANKEN ,  Adrianus Johannes Maria GIESBERS ,  Alexander Ludwig KLEIN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Alexey Sergeevich KUZNETSOV ,  Arnoud Willem NOTENBOOM ,  Mahdiar VALEFI ,  Marcus Adrianus VAN DE KERKHOF ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Ties Wouter VAN DER WOORD ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64 ,  G03F7/20

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

公开(公告)号：US20160012929A1

公开(公告)日：2016-01-14

申请号：US14765367

申请日：2014-01-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexey Sergeevich KUZNETSOV ,  Arjen BOOGAARD ,  Jeroen Marcel HUIJBREGTSE ,  Andrey NIKIPELOV ,  Maarten VAN KAMPEN

IPC: G21K1/06 ,  G03F7/20 ,  C23C28/00 ,  H05G2/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  C23C28/34 ,  G03F1/24 ,  G03F7/70033 ,  G21K2201/067 ,  H05G2/008

Abstract: A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.

Abstract translation: 一种制造多层反射镜的方法，其包括第一材料和硅的交替层对的多层堆叠，所述方法包括沉积所述第一材料和硅层的交替层对，所述堆叠为 由衬底支撑并且用掺杂剂材料掺杂至少第一材料的第一层。