公开(公告)号：WO2007057673A1

公开(公告)日：2007-05-24

申请号：PCT/GB2006/004275

申请日：2006-11-16

Applicant: ASML NETHERLANDS B.V. ,  LEEMING, John, Gerard ,  OTTENS, Joost, Jeroen ,  TEN KATE, Nicolaas ,  KEMPER, Nicolaas, Rudolf ,  LEENDERS, Martinus, Hendrikus, Antonius ,  SMEULERS, Johannes, Petrus, Maria ,  BECKERS, Marcel ,  SHULEPOV, Sergel ,  RIEPEN, Michel

Inventor： OTTENS, Joost, Jeroen ,  TEN KATE, Nicolaas ,  KEMPER, Nicolaas, Rudolf ,  LEENDERS, Martinus, Hendrikus, Antonius ,  SMEULERS, Johannes, Petrus, Maria ,  BECKERS, Marcel ,  SHULEPOV, Sergel ,  RIEPEN, Michel

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A barrier member (10) is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly (70) on a bottom surface configured to face the substrate (W) . The extractor assembly includes a plate (200) configured to split the space between a liquid removal device and the substrate in two such that a meniscus (310) is formed in an upper channel (220) between the liquid removal device and the plate and such that a meniscus (320) is formed in a lower channel (230) below the plate between the plate and the substrate.

Abstract translation: 公开了一种用于浸没式光刻中的阻挡构件（10）。 阻挡构件包括在被配置为面向衬底（W）的底表面上的抽出器组件（70）。 提取器组件包括板（200），其被配置为将液体移除装置和基板之间的空间分成两部分，使得在液体移除装置和板之间的上部通道（220）中形成弯月面（310），并且 在板和基板之间的板下方的下通道（230）中形成弯液面（320）。

公开(公告)号：WO2015185269A1

公开(公告)日：2015-12-10

申请号：PCT/EP2015/058870

申请日：2015-04-24

Applicant: ASML NETHERLANDS B.V.

Inventor： BERENDSEN, Christianus, Wilhelmus, Johannes ,  BECKERS, Marcel ,  CASTELIJNS, Henricus, Jozef ,  GERAETS, Hubertus, Antonius ,  KOEVOETS, Adrianus, Hendrik ,  LEVASIER, Leon, Martin ,  SCHAAP, Peter ,  STREEFKERK, Bob ,  TROMP, Siegfried, Alexander

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70033 ,  G03F7/70625 ,  G03F7/70783 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70941

Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

Abstract translation: 一种用于补偿包括衬底台的光刻设备的曝光过程中的曝光误差的方法，所述方法包括：获得表示达到衬底水平的IR辐射的剂量的剂量测量，其中所述剂量测量可以用于 计算在曝光过程中由光刻设备中的物体吸收的IR辐射的量; 并且使用剂量测量来控制曝光过程，以便补偿在曝光过程期间被物体吸收的IR辐射相关的曝光误差。

公开(公告)号：EP1955114A1

公开(公告)日：2008-08-13

申请号：EP06808564.6

申请日：2006-11-16

Applicant: ASML Netherlands B.V.

Inventor： OTTENS, Joost, Jeroen ,  TEN KATE, Nicolaas ,  KEMPER, Nicolaas, Rudolf ,  LEENDERS, Martinus, Hendrikus, Antonius ,  SMEULERS, Johannes, Petrus, Maria ,  BECKERS, Marcel ,  SHULEPOV, Sergel ,  RIEPEN, Michel

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A barrier member (10) is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly (70) on a bottom surface configured to face the substrate (W) . The extractor assembly includes a plate (200) configured to split the space between a liquid removal device and the substrate in two such that a meniscus (310) is formed in an upper channel (220) between the liquid removal device and the plate and such that a meniscus (320) is formed in a lower channel (230) below the plate between the plate and the substrate.

公开(公告)号：EP3152622A1

公开(公告)日：2017-04-12

申请号：EP15720652.5

申请日：2015-04-24

Applicant: ASML Netherlands B.V.

Inventor： BERENDSEN, Christianus Wilhelmus Johannes ,  BECKERS, Marcel ,  CASTELIJNS, Henricus Jozef ,  GERAETS, Hubertus Antonius ,  KOEVOETS, Adrianus Hendrik ,  LEVASIER, Leon Martin ,  SCHAAP, Peter ,  STREEFKERK, Bob ,  TROMP, Siegfried Alexander

IPC: G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70033 ,  G03F7/70625 ,  G03F7/70783 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70941

Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

Abstract translation: 一种用于补偿包括衬底台的光刻设备的曝光过程中的曝光误差的方法，所述方法包括：获得表示达到衬底水平的IR辐射剂量的剂量测量，其中所述剂量测量可用于 计算在曝光过程中由光刻设备中的物体吸收的IR辐射的量; 并且使用剂量测量来控制曝光过程，以补偿在曝光过程期间由物体吸收的IR辐射相关的曝光误差。

公开(公告)号：EP1955114B1

公开(公告)日：2011-01-05

申请号：EP06808564.6

申请日：2006-11-16

Applicant: ASML Netherlands B.V.

Inventor： OTTENS, Joost, Jeroen ,  TEN KATE, Nicolaas ,  KEMPER, Nicolaas, Rudolf ,  LEENDERS, Martinus, Hendrikus, Antonius ,  SMEULERS, Johannes, Petrus, Maria ,  BECKERS, Marcel ,  SHULEPOV, Sergel ,  RIEPEN, Michel

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A barrier member (10) is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly (70) on a bottom surface configured to face the substrate (W) . The extractor assembly includes a plate (200) configured to split the space between a liquid removal device and the substrate in two such that a meniscus (310) is formed in an upper channel (220) between the liquid removal device and the plate and such that a meniscus (320) is formed in a lower channel (230) below the plate between the plate and the substrate.