-
公开(公告)号：WO2016169758A1
公开(公告)日：2016-10-27
申请号：PCT/EP2016/057349
申请日：2016-04-04
Applicant: ASML NETHERLANDS B.V.
Inventor： KOEVOETS, Adrianus, Hendrik , ARLEMARK, Erik, Johan , DERKS, Sander, Catharina, Reinier , DONDERS, Sjoerd, Nicolaas, Lambertus , ENDENDIJK, Wilfred, Edward , JANSSEN, Franciscus, Johannes, Joseph , LAFARRE, Raymond, Wilhelmus, Louis , LEVASIER, Leon, Martin , OVERKAMP, Jim, Vincent , TEN KATE, Nicolaas , VAN DER SANDEN, Jacobus, Cornelis, Gerardus
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/2041 , G03F7/70258 , G03F7/70783 , H01L21/67098 , H01L21/683
Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
Abstract translation: 一种光刻设备，包括投影系统，该投影系统配置成投影图案化的辐射束以在保持在基板台上的基板上形成曝光区域，所述光刻设备还包括用于冷却所述基板的冷却设备（40），其中所述冷却设备包括 冷却元件（42,44），其位于所述衬底台的上方并且与所述曝光区域相邻，所述冷却元件构造成从所述衬底移除热量。
-
公开(公告)号：WO2022144144A1
公开(公告)日：2022-07-07
申请号：PCT/EP2021/084066
申请日：2021-12-02
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor： ALIKHAN, Abdullah , UITTERDIJK, Tammo , ENGELEN, Johannes, Bernardus, Charles , KAMIENIECKI, Daniel , VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus , POIESZ, Thomas , LEVASIER, Leon, Martin , OVERKAMP, Jim, Vincent , PIJNENBURG, Johannes, Adrianus, Cornelis, Maria , VAN BERKEL, Koos , DIGUIDO, Gregory, James , SOCCI, JR., Anthony, C. , SIGAL, Iliya , LOMANS, Bram, Antonius, Gerardus , HABETS, Michel, Ben, Isel
IPC: G03F7/20 , H01L21/683 , H01L21/687
Abstract: Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.
-
3.发明申请
公开(公告)号：WO2008111839A1
公开(公告)日：2008-09-18
申请号：PCT/NL2008/050146
申请日：2008-03-14
Applicant: ASML NETHERLANDS B.V. , OUDSHOORN, Alex , BLOK, Roland , LOOPSTRA, Erik, Roelof , LEVASIER, Leon, Martin
Inventor： OUDSHOORN, Alex , BLOK, Roland , LOOPSTRA, Erik, Roelof , LEVASIER, Leon, Martin
IPC: G03F7/20
CPC classification number: G03F7/70725 , G03F9/7003 , G03F9/7026 , G03F9/7034
Abstract: The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.
Abstract translation: 本发明涉及一种器件制造方法，包括用安装在可移位标线片平台上的掩模版形成的图案化的辐射束暴露衬底，其中该方法包括以下步骤：确定近似高度和倾斜轮廓的非线性函数 的标线片表面，并且根据非线性函数控制在衬底曝光期间标线片台的位移。 本发明还涉及光刻设备和计算机程序。
-
公开(公告)号：WO2023001478A1
公开(公告)日：2023-01-26
申请号：PCT/EP2022/067091
申请日：2022-06-23
Applicant: ASML NETHERLANDS B.V.
Abstract: A deformable mirror system (300, 400, 500), comprising a monolithic support structure (310, 410, 510), comprising a first side (311) configured to receive a mirror (350, 450, 550); and a second side (312) configured to receive a plurality of actuators (460, 560) such that the actuators are positioned to enable selective deformation of a reflective surface (351, 451, 551) of the mirror.
-
公开(公告)号：WO2018149553A1
公开(公告)日：2018-08-23
申请号：PCT/EP2018/050135
申请日：2018-01-03
Applicant: ASML NETHERLANDS B.V.
Inventor： SCHMITT-WEAVER, Emil, Peter , BHATTACHARYYA, Kaustuve , TEL, Wim, Tjibbo , STAALS, Frank , LEVASIER, Leon, Martin
Abstract: Disclosed is a method for monitoring a lithographic process, and associated lithographic apparatus. The method comprises obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.
-
Patent Agency Ranking
公开(公告)号：WO2015185269A1
公开(公告)日：2015-12-10
申请号：PCT/EP2015/058870
申请日：2015-04-24
Applicant: ASML NETHERLANDS B.V.
Inventor： BERENDSEN, Christianus, Wilhelmus, Johannes , BECKERS, Marcel , CASTELIJNS, Henricus, Jozef , GERAETS, Hubertus, Antonius , KOEVOETS, Adrianus, Hendrik , LEVASIER, Leon, Martin , SCHAAP, Peter , STREEFKERK, Bob , TROMP, Siegfried, Alexander
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70033 , G03F7/70625 , G03F7/70783 , G03F7/70875 , G03F7/70891 , G03F7/70941
Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.
Abstract translation: 一种用于补偿包括衬底台的光刻设备的曝光过程中的曝光误差的方法，所述方法包括：获得表示达到衬底水平的IR辐射的剂量的剂量测量，其中所述剂量测量可以用于 计算在曝光过程中由光刻设备中的物体吸收的IR辐射的量; 并且使用剂量测量来控制曝光过程，以便补偿在曝光过程期间被物体吸收的IR辐射相关的曝光误差。
-
公开(公告)号：EP4318132A1
公开(公告)日：2024-02-07
申请号：EP22188166.7
申请日：2022-08-01
Applicant: ASML Netherlands B.V.
Inventor： CARBONE, Ludovico , DREISSEN, Mante , LEVASIER, Leon, Martin
Abstract: A method of determining contamination of an optical sensor in a lithographic apparatus, the method comprising illuminating a pattern on a patterning device using EUV radiation, projecting patterned reflected EUV radiation towards the optical sensor and thereby forming an aerial image of the pattern, and moving the optical sensor relative to the patterned reflected EUV radiation such that an intensity of EUV radiation measured by the optical sensor varies as a function of the position of the optical sensor, wherein the intensity measured by the optical sensor passes through a minimum, and wherein the method further comprises using the measured intensity to measure contamination of the optical sensor.
-
公开(公告)号：EP4374227A1
公开(公告)日：2024-05-29
申请号：EP22738560.6
申请日：2022-06-23
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70266 , G03F7/70825 , G03F7/7095 , G02B26/0825 , G02B7/182
-
公开(公告)号：EP4123380A1
公开(公告)日：2023-01-25
申请号：EP21187258.5
申请日：2021-07-22
Applicant: ASML Netherlands B.V.
Abstract: A deformable mirror system (300, 400, 500), comprising a monolithic support structure (310, 410, 510), comprising a first side (311) configured to receive a mirror (350, 450, 550); and a second side (312) configured to receive a plurality of actuators (460, 560) such that the actuators are positioned to enable selective deformation of a reflective surface (351, 451, 551) of the mirror.
-
公开(公告)号：EP3583467A1
公开(公告)日：2019-12-25
申请号：EP18700091.4
申请日：2018-01-03
Applicant: ASML Netherlands B.V.
-
-
-
-
-
-
-
-
-
Search Results
11
records
(took 0.026 seconds)
