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    PROJECTION SYSTEM
    2.
    发明申请
    PROJECTION SYSTEM 审中-公开
    投影系统

    公开(公告)号：WO2016087177A1

    公开(公告)日：2016-06-09

    申请号：PCT/EP2015/076637

    申请日：2015-11-16

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BUTLER, Hans ,  KNOPS, Raoul, Maarten, Simon ,  STREEFKERK, Bob ,  VALENTIN, Christiaan, Louis ,  VAN SCHOOT, Jan, Bernard, Plechelmus ,  SIMONS, Wilhelmus, Franciscus, Johannes ,  MERKX, Leon, Leonardus, Franciscus ,  DE JONGH, Robertus, Johannes, Marinus ,  MERRY, Roel, Johannes, Elisabeth ,  YPMA, Michael, Frederik

    IPC: G03F7/20

    CPC classification number: G03F7/70258 ,  G03F7/705 ,  G03F7/706

    Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1 - S4); one or more actuators (A1 - A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1 - M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.

    Abstract translation: 用于光刻设备的投影系统（PS1）包括：光路（100）; 多个传感器（S1-S4）; 一个或多个致动器（A1-A4）; 和控制器（CN）。 光路可操作以接收输入辐射束（Bin）并将输出辐射束（Bout）投影到衬底上以形成图像。 光路包括：多个光学元件（M1-M4），所述多个光学元件包括：第一组至少两个光学元件（M1，M4）和第二组至少一个光学元件（M2， M3）。 每个传感器与多个光学元件中的一个相关联，并且可操作以确定该光学元件的位置。 每个致动器与第二组光学元件中的一个相关联，并且可操作以调节该光学元件。 控制器可操作以使用一个或多个致动器来根据所确定的第一组光学元件的位置来调整第二组光学元件，以便至少部分地补偿光学像差和/或视线 由第一组光学元件的位置引起的误差。

    LITHOGRAPHIC APPARATUS AND METHOD
    5.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
    LITHOGRAPHIC设备和方法

    公开(公告)号：WO2010124903A1

    公开(公告)日：2010-11-04

    申请号：PCT/EP2010/053506

    申请日：2010-03-18

    Applicant: ASML NETHERLANDS B.V. ,  STREEFKERK, Bob ,  DE JONGH, Robertus

    Inventor： STREEFKERK, Bob ,  DE JONGH, Robertus

    IPC: G03F7/20

    CPC classification number: G03F7/70333 ,  G03F7/70233 ,  G03F7/70266

    Abstract: A method of projecting a patterned beam onto a substrate using an EUV lithographic apparatus having a projection system (PS) including a plurality of mirrors (12-16). The method includes the following steps. Using the projection system (PS) to project the patterned beam onto the substrate (W) while moving a final mirror (16) of the projection system (PS) in a direction substantially perpendicular to the surface of the substrate (W). Rotating the final mirror (16) to substantially compensate for unwanted translation of the projected patterned radiation beam on the substrate due to the movement of the mirror.

    Abstract translation: 使用具有包括多个反射镜（12-16）的投影系统（PS）的EUV光刻设备将图案化光束投影到基板上的方法。 该方法包括以下步骤。 使用投影系统（PS）将图案化的光束投影到衬底（W）上，同时沿着基本上垂直于衬底（W）的表面的方向移动投影系统（PS）的最终镜（16）。 旋转最后的反射镜（16）以基本上补偿由于反射镜的移动而导致的图案化辐射束在基板上的不期望的平移。

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