公开(公告)号：WO2022048897A1

公开(公告)日：2022-03-10

申请号：PCT/EP2021/072714

申请日：2021-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： MARTINEZ NEGRETE GASQUE, Diego ,  BEUGIN, Vincent, Claude ,  YIN, Weihua

IPC: H01J37/09 ,  H01J37/141 ,  H01J37/28

Abstract: A charged particle system (400) generates a charged particle multi beam along a multi beam path (406, 408). The charged particle system comprises an aperture array (430), a beam limit array (421) and a condenser lens (410). In the aperture array are an array of apertures (432) to generate from an up-beam charged particle source (401) charged particle paths (406) down-beam of the aperture array. The beam-limit array is down-beam of the aperture array. Defined in the beam-limit array is an array of beam-limit apertures (422) for shaping the charged particle multi beam path. The condenser lens system is between the aperture array and the beam-limit array. The condenser lens system selectively operates different of rotation settings that define different ranges of beam paths (406) between the aperture array and the beam-limit array. At each rotation setting of the condenser lens system, each beam-limit aperture of the beam-limit array lies on a beam path down-beam of the aperture array.

公开(公告)号：WO2022048896A1

公开(公告)日：2022-03-10

申请号：PCT/EP2021/072713

申请日：2021-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： BEUGIN, Vincent, Claude ,  STEENBRINK, Stijn, Wilem, Herman, Karel ,  EBERT, Martin ,  MARTINEZ NEGRETE GASQUE, Diego ,  MOOK, Hindrik, Willem ,  MANGNUS, Albertus, Victor, Gerardus

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/12 ,  H01J37/147 ,  H01J37/28

Abstract: Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising: at least one aperture array comprising at least two different aperture patterns; and a rotator configured to rotate the aperture array between the different aperture patterns.

公开(公告)号：EP3982390A1

公开(公告)日：2022-04-13

申请号：EP20200743.1

申请日：2020-10-08

Applicant: ASML Netherlands B.V.

Inventor： MARTINEZ NEGRETE GASQUE, Diego ,  BEUGIN, Vincent, Claude ,  YIN, Weihua

IPC: H01J37/09 ,  H01J37/141 ,  H01J37/28

Abstract: A charged particle system 400 generates a charged particle multi beam along a multi beam path 406,408. The charged particle system comprises an aperture array 430, a beam limit array 421 and a condenser lens 410. In the aperture array are an array of apertures 432 to generate from an up-beam charged particle source 401 charged particle paths 406 down-beam of the aperture array. The beam-limit array is down-beam of the aperture array. Defined in the beam-limit array is an array of beam-limit apertures 422 for shaping the charged particle multi beam path. The condenser lens system is between the aperture array and the beam-limit array. The condenser lens system selectively operates different of rotation settings that define different ranges of beam paths 406 between the aperture array and the beam-limit array. At each rotation setting of the condenser lens system, each beam-limit aperture of the beam-limit array lies on a beam path down-beam of the aperture array.

公开(公告)号：EP4457851A1

公开(公告)日：2024-11-06

申请号：EP22822186.7

申请日：2022-11-29

Applicant: ASML Netherlands B.V.

Inventor： AKSENOV, German ,  BEUGIN, Vincent, Claude ,  BRANDT, Pieter, Lucas

IPC: H01J37/12

公开(公告)号：EP3982392A1

公开(公告)日：2022-04-13

申请号：EP20200741.5

申请日：2020-10-08

Applicant: ASML Netherlands B.V.

Inventor： BEUGIN, Vincent, Claude ,  STEENBRINK, Stijn, Wilem, Herman, Karel ,  EBERT, Martin ,  MARTINEZ NEGRETE GASQUE, Diego ,  MOOK, Hindrik, Willem ,  MANGNUS, Albertus, Victor, Gerardus

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/12 ,  H01J37/147 ,  H01J37/28

Abstract: Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising: at least one aperture array comprising at least two different aperture patterns; and a rotator configured to rotate the aperture array between the different aperture patterns.